Charged particle optical system, drawing apparatus, and method of manufacturing article
    31.
    发明授权
    Charged particle optical system, drawing apparatus, and method of manufacturing article 失效
    带电粒子光学系统,拉丝装置和制造方法

    公开(公告)号:US08716672B2

    公开(公告)日:2014-05-06

    申请号:US13835154

    申请日:2013-03-15

    Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

    Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统,该系统包括静电透镜,以及沿着静电透镜的光轴与静电透镜相对的栅格电极,并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

    Cross-section processing and observation apparatus
    32.
    发明授权
    Cross-section processing and observation apparatus 有权
    横截面加工和观察装置

    公开(公告)号:US08637819B2

    公开(公告)日:2014-01-28

    申请号:US13842404

    申请日:2013-03-15

    Abstract: Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.

    Abstract translation: 本发明提供一种横截面处理和观察装置,包括用于重复执行包括通过离子束进行切片处理的处理的控制部分和通过由切片处理形成的横截面发射的二次电子获取SIM图像的控制部分, 所述控制部将观察图像分割为多个区域,并且当在所述多个区域的一个区域中的图像与对应于所述一个区域的区域中的图像之间发生变化时,完成所述处理 通过该过程获得的另一横截面的观察图像。

    ION BEAM CONTROL APPARATUS AND METHOD
    33.
    发明申请
    ION BEAM CONTROL APPARATUS AND METHOD 失效
    离子束控制装置和方法

    公开(公告)号:US20100133445A1

    公开(公告)日:2010-06-03

    申请号:US12600540

    申请日:2008-05-20

    CPC classification number: G21K1/087 A61N2005/1087 A61N2005/1088 H05H7/12

    Abstract: Provided are an ion beam control apparatus and a control method for controlling an ion beam energy expansion level and an ion beam size in a radial direction. An ion beam control apparatus Sa is provided with an ion beam generating unit 2, and an ion beam control unit 1a in which a generated ion beam (IB) is input and controlled to be output with the prescribed level of energy expansion and the prescribed diameter in the radial direction. In the ion beam control unit 1a, phase rotation by a radio frequency electric field that increases existing probability with the prescribed level of energy is at least used.

    Abstract translation: 提供了一种用于控制离子束能量膨胀水平和离子束尺寸在径向方向上的离子束控制装置和控制方法。 离子束控制装置Sa设置有离子束产生单元2和离子束控制单元1a,其中生成的离子束(IB)被输入并被控制为以规定的能量膨胀水平和规定的直径输出 在径向方向。 在离子束控制单元1a中,至少使用通过以规定的能量水平增加现有概率的射频电场的相位旋转。

    Vertical line width control ionographic system
    34.
    发明授权
    Vertical line width control ionographic system 失效
    垂直线宽度控制离子体系统

    公开(公告)号:US4794412A

    公开(公告)日:1988-12-27

    申请号:US194238

    申请日:1988-05-16

    CPC classification number: G03G15/323

    Abstract: The adjustment of the strobe and data voltages to the array gates that drive each of the modulators in an ionographic printing device, in particular the lowering of the data voltage level below the strobe voltage level for each of the array gates. The lower limit on the data voltage level is the voltage level where the generated ions are not shut off completely at the modulating electrode.

    Abstract translation: 将频闪和数据电压调整到驱动离子印刷装置中的每个调制器的阵列栅极,特别是降低每个阵列栅极的选通电压电平以下的数据电压电平。 数据电压电平的下限是产生的离子在调制电极处不完全截止的电压电平。

    Correction of astigmatism in electron beam instruments
    35.
    发明授权
    Correction of astigmatism in electron beam instruments 失效
    电子束仪器散光校正

    公开(公告)号:US4567369A

    公开(公告)日:1986-01-28

    申请号:US504947

    申请日:1983-06-16

    CPC classification number: H01J37/153

    Abstract: An electron beam instrument having an objective lens coil 14 and stigmator coils 18 has its astigmatism corrected for by measurement of the contrast in the final image. The currents through the objective lens and the stigmator coils are adjusted in sequence iteratively to optimize the contrast.The optimum contrast may be either a maximum contrast or a minimum contrast depending on the nature of the instrument and its mode of operation. Measurement of contrast may be made by measuring the magnitudes of successive points of an image and calculating the variance. Alternatively two measurements of magnitude at each point of an image may be made and the covariance calculated.

    Abstract translation: 具有物镜线圈14和柱状线圈18的电子束仪器通过测量最终图像中的对比度来校正其散光。 通过物镜和柱状器线圈的电流迭代地进行调整以优化对比度。 取决于仪器的性质及其操作模式,最佳对比度可以是最大对比度或最小对比度。 可以通过测量图像的连续点的大小并计算方差来进行对比度的测量。 或者可以进行图像的每个点处的两个幅度的测量,并且计算协方差。

    Electron beam apparatus
    36.
    发明授权
    Electron beam apparatus 失效
    电子束装置

    公开(公告)号:US4424448A

    公开(公告)日:1984-01-03

    申请号:US216948

    申请日:1980-12-16

    CPC classification number: H01J37/06 H01J37/265 H01J37/304

    Abstract: An electron beam apparatus comprises an electron gun having a cathode consisting of single-crystal lanthanum hexaboride and a plurality of electron lenses for projecting the cross-over image of an electron beam emitted from the electron gun as a reduced-scale image onto a sample. It further comprises a circuit for measuring the brightness and shape of the cross-over image projected onto the sample and the emission pattern of the electron beam emitted from the electron gun, and a circuit for applying a bias voltage, with which the cross-over image has a desired brightness and is round and the emission pattern is anisotropic, to the electron gun.

    Abstract translation: 电子束装置包括具有由单晶镧六硼化物构成的阴极和多个电子透镜的电子枪,用于将从电子枪发射的电子束的交叉图像作为缩小图像投射到样品上。 它还包括一个电路,用于测量投射到样品上的交叉图像的亮度和形状以及从电子枪发射的电子束的发射图案,以及一个施加偏置电压的电路,与之交叉 图像具有期望的亮度,并且是圆形的,并且发射图案是各向异性的,对于电子枪。

    Charged-Particle-Beam Device
    39.
    发明申请
    Charged-Particle-Beam Device 有权
    带电粒子束装置

    公开(公告)号:US20160300690A1

    公开(公告)日:2016-10-13

    申请号:US15035265

    申请日:2014-11-05

    Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

    Abstract translation: 提供一种带电粒子束装置,其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。 带电粒子束装置设有像差产生透镜,用于产生由于穿过离轴的带电粒子束造成的像差,以及校正透镜,用于使带电粒子束的轨迹会聚在 物镜不管带电粒子束的能量如何。 校正透镜的主表面设置在交叉位置,在该交叉位置处,具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

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