Abstract:
The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.
Abstract:
Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.
Abstract:
Provided are an ion beam control apparatus and a control method for controlling an ion beam energy expansion level and an ion beam size in a radial direction. An ion beam control apparatus Sa is provided with an ion beam generating unit 2, and an ion beam control unit 1a in which a generated ion beam (IB) is input and controlled to be output with the prescribed level of energy expansion and the prescribed diameter in the radial direction. In the ion beam control unit 1a, phase rotation by a radio frequency electric field that increases existing probability with the prescribed level of energy is at least used.
Abstract:
The adjustment of the strobe and data voltages to the array gates that drive each of the modulators in an ionographic printing device, in particular the lowering of the data voltage level below the strobe voltage level for each of the array gates. The lower limit on the data voltage level is the voltage level where the generated ions are not shut off completely at the modulating electrode.
Abstract:
An electron beam instrument having an objective lens coil 14 and stigmator coils 18 has its astigmatism corrected for by measurement of the contrast in the final image. The currents through the objective lens and the stigmator coils are adjusted in sequence iteratively to optimize the contrast.The optimum contrast may be either a maximum contrast or a minimum contrast depending on the nature of the instrument and its mode of operation. Measurement of contrast may be made by measuring the magnitudes of successive points of an image and calculating the variance. Alternatively two measurements of magnitude at each point of an image may be made and the covariance calculated.
Abstract:
An electron beam apparatus comprises an electron gun having a cathode consisting of single-crystal lanthanum hexaboride and a plurality of electron lenses for projecting the cross-over image of an electron beam emitted from the electron gun as a reduced-scale image onto a sample. It further comprises a circuit for measuring the brightness and shape of the cross-over image projected onto the sample and the emission pattern of the electron beam emitted from the electron gun, and a circuit for applying a bias voltage, with which the cross-over image has a desired brightness and is round and the emission pattern is anisotropic, to the electron gun.
Abstract:
Variable-focus solenoidal lenses for charged particle beams with integrated emittance filtering are disclosed. The emittance may be controlled via selection of collimating irises. The focal length may be changed by altering the spacing between two permanent ring magnets.
Abstract:
Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
Abstract:
A method of bunch length compression method for a free electron laser (FEL) that avoids parasitic compressions by 1) applying acceleration on the falling portion of the RF waveform, 2) compressing using a positive momentum compaction (R56>0), and 3) compensating for aberration by using nonlinear magnets in the compressor beam line.