摘要:
A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要:
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要:
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要:
A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
摘要:
The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要:
The present invention relates to a scanning electron microscope employing a deceleration field forming technology (retarding), more particularly a scanning electron microscope which separates and detects secondary electrons at high efficiency. The object of the present invention is accomplished by providing an electron source, a lens for condensing the primary electron beam which is emitted from said electron source, a detector for detecting electrons which are generated by radiation of the primary electron beam onto a specimen, a first deceleration means for decelerating the primary electron beam which is radiated onto said specimen, a second deceleration means for decelerating electrons which are generated on the specimen, and a deflector for deflecting said electrons which are decelerated by said second decelerating means.
摘要:
A scanning electron microscope in the present invention, by employing a retarding method and suppressing interferences between an electron beam and secondary electrons or back scattered electrons, makes it possible to obtain a clearer SEM image with a higher resolution. In the scanning electron microscope in the present invention, a shield electrode 117 is provided for shielding the electron beam 104 from electric fields of an energy analyzer 118 and a detector 121, and the energy analyzer 118 and the detector 121 are located in contact with an electron beam aperture 115 and the shield electrode 117.
摘要:
A scanning electron microscope comprising an objective lens for forming lens magnetic field on the sample side, and observing the image of the sample after detecting the secondary electrons from the sample on the upper side of the objective lens is disclosed. The accelerating electrode is arranged along the electron beam passage of the objective lens, and an positive potential is applied thereto. The electric field correction electrode is disposed outside the accelerating electrode or to the sample side. A negative potential is applied to the electric field correction electrode. An image observation with high resolution also is realized even when the sample is inclined.
摘要:
A device enables high resolution observation even when a sample is tiled. A deflecting electrode device for generating an electric field having a component in the direction perpendicular to the center axis (optical axis) of an objective lens is provided between the objective lens and the sample. A voltage applied to the deflecting electrode device is controlled in accordance with the tilting of a sample stage. A lateral electric field component generated on the optical axis when the sample stage is tiled is corrected by a deflected electric field generated by the deflecting electrode device. This is effective to suppress generation of astigmatism, and to allows effective arrival of an secondary electron at a secondary electron detector disposed at a position nearer the electron source side than the objective lens.
摘要:
An ion beam having a good converging property and a good quality is provided by satisfying the limitations controlling both angle of dispersion and the width of beam at the same time. The voltage 12d of a repeller electrode 1f in an ion source of electron bombardment type is input to an ion source state monitor 11 and the ion source state monitor 11 output a predicted value 12e of the voltage applied to an extractor electrode 1g to an extractor power source 9. As for the extractor electrode system, the width of a slit in the acceleration electrode 1b is made larger than the width of a slit of the extractor electrode 1g, and the extractor electrode 1g is set in a position apart from the acceleration electrode 1b by the distance nearly equal to the distance between the acceleration electrode 1b and the ion generating region 2a. By doing so, the electric field leaked from the slit of the acceleration electrode 1b to the inside of the ionization chamber 1a expands to the vicinity of the ion generating region. As the result, the ion beam 2 is effectively extracted to pass through the slits in the acceleration electrode 1b and the extractor 1g. The amount of the current passing through the slits is measured with an ion current monitor 8a and the voltage 12f of a converging electrode 1d is adjusted so that the value of the current becomes the maximum.