Abstract:
The present invention is an apparatus and multi-unit assembly which is able to achieve two different and highly desirable functions: A focusing of a charged particle beam; and a mass separation of desired ion species from unwanted ion species in traveling ion beams. The apparatus is a simply organized and easily manufactured article; is relatively light-weight and less expensive to make; and is easier to install, align, and operate than conventionally available devices.
Abstract:
A high-energy ion implanter includes a beam generation unit that includes an ion source and a mass analyzer, a high-energy multi-stage linear acceleration unit, a high-energy beam deflection unit that changes the direction of a high-energy ion beam toward a wafer, and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The beam transportation unit includes a beam shaper, a high-energy beam scanner, a high-energy beam collimator, and a high-energy final energy filter. Further, the high-energy beam collimator is an electric field type beam collimator that collimates a scan beam while performing the acceleration and the deceleration of a high-energy beam by an electric field.
Abstract:
Provided is a technique to automatize a synthesis function of signal charged particles having different energies. A charged particle beam apparatus includes: a charged particle source configured to irradiate a sample with a primary charged particle ray; a first detector configured to detect a first signal electron having first energy from signal charged particles generated from the sample; a second detector configured to detect a second signal electron having second energy from signal charged particles generated from the sample; a first operation part configured to change a synthesis ratio of a signal intensity of the first signal electron and a signal intensity of the second signal electron and to generate a detected image corresponding to each synthesis ratio; a second operation part configured to calculate a ratio of signal intensities corresponding to predetermined two areas of the detected image generated for each synthesis ratio; and a third operation part configured to determine a mixture ratio to be used for acquisition of the detected image on a basis of a change of the ratio of signal intensities.
Abstract:
A broadband ion beam analyzer, used for isolating required ions from a broadband ion beam, comprises an upper magnetic pole (1), a lower magnetic pole (2), an upper excitation coil (3), a lower excitation coil (4), an analysis grating (7), and a magnetic yoke (5 and 6). The upper magnetic pole (1) and the lower magnetic pole (2) are both provided with a camber-shaped incident-end boundary (101) and a camber-shaped emergence side boundary (102). The camber radii (Rb) of the incident-end boundary (101) and of the emergence-end boundary (102) are equal to the deflection radius (R) of the required ions in the magnetic field. The required ions in the broadband ion beam are allowed to focus ideally at the mid-section of the magnetic field, to acquire an ideal focal spot having a size that equals to zero. This allows for acquisition of the optimal resolution by selecting an appropriate width for a minimal analysis gap (701), thus implementing complete isolation of the required ions from other ions in the broadband ion beam.
Abstract:
An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.
Abstract:
An ExB Wien mass filter providing a method and structure for mechanically adjusting the magnetic field distributions at the mass filter entrance and exit end caps. The reluctance of the flux return path may be modified by configuring pluralities of magnetic shims within slots at the outer diameters of the entrance and exit end caps, and also by configuring pluralities of magnetic plug shims within circular flux dams surrounding the entrance and exit apertures. Advantages of purely mechanical adjustment for the magnetic fields of the present invention, compared with prior art electromagnet adjustment methods include greater reliability, simplicity, lower cost, and lack of power dissipation. The invention may employ either permanent magnets or electromagnets for generation of the mass-separation magnetic field.
Abstract:
An ion beam bending magnet provides a curved path through the magnet for bending a ribbon-shaped ion beam having its major cross-sectional dimension normal to the bending plane of the magnet. The magnet comprises a ferromagnetic yoke surrounding the beam path and having an internal profile in cross-section formed of four angled sides. These sides are angled to the major dimension of the ribbon beam passing through the magnet, so that the internal profile of the yoke is relatively wide in the center of the ribbon beam and relatively narrow near the top and bottom edges of the ribbon beam. Electrical conductors against the internal surfaces of the yoke provide a uniform distribution of electrical current per unit length along the angled sides of the profile, providing a substantially uniform magnetic bending field within the magnet yoke.
Abstract:
Provided is a charged particle beam device to improve energy solution of its energy filter. In one embodiment, a charged particle beam device includes a deflector to deflect charged particles emitted from a sample to an energy filter, and a change in brightness value with the change of voltage applied to the energy filter is found for each of a plurality of deflection conditions for the deflector, and a deflection condition such that a change in the brightness value satisfies a predetermined condition is set as the deflection condition for the deflector.
Abstract:
One embodiment relates to a method of inspecting a site location on a target substrate. Contours are obtained, the contours having been generated from a reference image using a design clip. A target image of the site location is acquired. The contours are aligned to the target image, and contrast values are computed for pixels on the contours. A threshold is applied to the contrast values to determine contour-based defect blobs. Another embodiment relates to a method of generating contours for use in inspecting a site location for defects. Other embodiments, aspects and features are also disclosed.
Abstract:
A transmission electron microscope comprises a high-voltage source for outputting a high voltage at two high-voltage outputs and outputting a control signal at a controller output; a focusing lens for focusing a beam; a monochromator which allows only those particles of the particle beam to pass whose kinetic energy is within an adjustable energy interval; an energy-dispersive component which deflects particles of different kinetic energies differently; a detector; and a controller connected to the controller output, which controls a beam deflector, arranged between the energy-dispersive component and the detector, the monochromator, or the energy-dispersive component in dependence on the control signal, or superposes plural of intensity distributions detected by the detector with an offset relative to one another, which offset is set in dependence on the control signal.