公开(公告)号：US11276546B2

公开(公告)日：2022-03-15

申请号：US16492677

申请日：2017-03-16

Applicant: NIKON CORPORATION

Inventor： Takehisa Yahiro

IPC: H01J37/141 ,  G03F7/20 ,  H01J37/09 ,  H01J37/317 ,  H01L21/027

Abstract: A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.

公开(公告)号：US11257654B2

公开(公告)日：2022-02-22

申请号：US16316289

申请日：2016-07-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kengo Asai ,  Hiroyasu Shichi ,  Toru Iwaya ,  Hisayuki Takasu

IPC: H01J37/08 ,  H01J37/305 ,  H01J37/09

Abstract: To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.

公开(公告)号：US20220013327A1

公开(公告)日：2022-01-13

申请号：US17320435

申请日：2021-05-14

Applicant: NuFlare Technology, Inc.

Inventor： Shinji SUGIHARA

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/09 ,  G06T7/00 ,  G06T7/73

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes a circuit configured to perform, for each direction, filter processing on the image, using a plurality of two-dimensional spatial filter functions with different orientations; a circuit configured to extract a plurality of pixels each having a predetermined value larger than a first threshold, in pixel values each for the each direction of after the filter processing, as a plurality of outline pixel candidates through which an outline of the figure pattern passes; and a circuit configured to extract a plurality of outline pixels from the plurality of outline pixel candidates by excluding outline pixel candidates each of which has a differential value, greater than or equal to a second threshold, obtained by differentiating a pixel value of before the filter processing in a second direction orthogonal to a first direction corresponding to the predetermined value.

公开(公告)号：US11139140B2

公开(公告)日：2021-10-05

申请号：US12804507

申请日：2010-07-22

Applicant: Dirk Preikszas ,  Michael Albiez

Inventor： Dirk Preikszas ,  Michael Albiez

IPC: H01J37/09 ,  H01J37/141 ,  H01J37/15 ,  H01J37/28 ,  H01J37/26

Abstract: A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.

公开(公告)号：US20210296080A1

公开(公告)日：2021-09-23

申请号：US17207184

申请日：2021-03-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hiroshi OBA ,  Yasuhiko SUGIYAMA ,  Yoshitomo NAKAGAWA ,  Koji NAGAHARA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/09 ,  H01J37/317 ,  H01J37/08 ,  H01J37/21

Abstract: Provided is a focused ion beam processing apparatus including: an ion source; a sample stage a condenser lens; an aperture having a slit in a straight line shape; a projection lens and the sample stage, wherein, in a transfer mode, by Köhler illumination, with an applied voltage of the condenser lens when a focused ion beam is focused on a main surface of the projection lens scaled to be 100, the applied voltage is set to be less than 100 and greater than or equal to 80; a position of the aperture is set such that the focused ion beam is masked by the aperture with the one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam; and the shape of the slit is transferred onto the sample.

公开(公告)号：US11087948B2

公开(公告)日：2021-08-10

申请号：US16940863

申请日：2020-07-28

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke ,  Joerg Jacobi

IPC: H01J37/10 ,  H01J37/09 ,  H01J37/28

Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.

公开(公告)号：US11051390B2

公开(公告)日：2021-06-29

申请号：US16496136

申请日：2018-03-09

Applicant: Japan Atomic Energy Agency ,  PESCO Co., Ltd.

Inventor： Natsuko Fujita ,  Akihiro Matsubara

IPC: H01J37/09 ,  H05H5/06 ,  H05H5/02 ,  H01J37/08

Abstract: To provide a functional membrane for ion beam transmission capable of enhancing ion beam transmittance and improving beam emittance. A functional membrane for ion beam transmission according to the present invention is used in a beam line device through which an ion beam traveling in one direction passes and has a channel. The axis of the channel is substantially parallel to the travel direction of the ion beam.

公开(公告)号：US20210151282A1

公开(公告)日：2021-05-20

申请号：US17118456

申请日：2020-12-10

Applicant: Peter Paul HEMPENIUS ,  Sven Antoin, Johan HOL ,  Maarten Frans, Janus KREMERS ,  Henricus Martinus, Johannes VAN DE GROES ,  Niels Johannes, Maria BOSCH ,  Marcel Koenraad, Marie BAGGEN

Inventor： Peter Paul HEMPENIUS ,  Sven Antoin, Johan HOL ,  Maarten Frans, Janus KREMERS ,  Henricus Martinus, Johannes VAN DE GROES ,  Niels Johannes, Maria BOSCH ,  Marcel Koenraad, Marie BAGGEN

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/317

Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

公开(公告)号：US11011344B2

公开(公告)日：2021-05-18

申请号：US16787662

申请日：2020-02-11

Applicant: HITACHI, LTD. ,  RIKEN

Inventor： Toshiaki Tanigaki ,  Tetsuya Akashi ,  Ken Harada

IPC: H01J37/141 ,  H01J37/26 ,  H01J37/09 ,  H01J37/147 ,  H01J37/295

Abstract: An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

公开(公告)号：US10978270B2

公开(公告)日：2021-04-13

申请号：US16225405

申请日：2018-12-19

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Dieter Winkler ,  Thomas Jasinski

IPC: H01J37/20 ,  H01J37/09

Abstract: A charged particle beam device, comprising a charged particle source configured to emit a charged particle beam; a movable stage comprising an assembly of aperture arrays having at least a first aperture array and a second aperture array, the movable stage is configured to align the assembly of aperture arrays with the charged particle beam, and at least one aperture array comprises a shielding tube coupled to the movable stage.