公开(公告)号：US20120061583A1

公开(公告)日：2012-03-15

申请号：US13304427

申请日：2011-11-25

Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

Abstract translation: 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

公开(公告)号：US08044351B2

公开(公告)日：2011-10-25

申请号：US11915679

申请日：2006-05-29

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: G21K5/04

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

Abstract translation: 本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。 具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。 此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。

公开(公告)号：US07960695B1

公开(公告)日：2011-06-14

申请号：US11383356

申请日：2006-05-15

Applicant: Victor B. Kley

Inventor： Victor B. Kley

IPC: G01N13/16

CPC classification number: G01Q30/02 ,  G01Q60/38 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1503 ,  H01J2237/2583 ,  H01J2237/2803

Abstract: An e-beam or ion beam imaging and exposure system is built into the end of an AFM cantilever which images using the scanning capabilities built into the AFM. In one embodiment, a boron doped diamond cold cathode is formed into the cantilever with an associated accelerating electrode and secondary electron collection electrode. The assembly is brought within a few nanometers of the object to be imaged or exposed using the AFM. One or more gas channels built into the cantilever assembly provide a positive pressure of inert gas to prevent oxidative erosion of the cold cathode and can bleed any surface charge build up on the sample surface. After secondaries are collected the cantilever is moved to the next area to be exposed.

Abstract translation: 电子束或离子束成像和曝光系统内置在AFM悬臂的末端，使用内置于AFM中的扫描功能的图像。 在一个实施例中，硼掺杂的金刚石冷阴极与相关联的加速电极和二次电子收集电极形成为悬臂。 使用AFM将组件置于要成像或暴露的物体的几纳米内。 内置在悬臂组件中的一个或多个气体通道提供惰性气体的正压力，以防止冷阴极的氧化侵蚀，并且可能导致在样品表面上积累的任何表面电荷。 收集次级后，将悬臂移至下一个要暴露的区域。

公开(公告)号：US07750295B2

公开(公告)日：2010-07-06

申请号：US10538284

申请日：2003-12-30

Applicant: Ho Soeb Kim ,  Seung Joon Ahn ,  Dae Wook Kim

Inventor： Ho Soeb Kim ,  Seung Joon Ahn ,  Dae Wook Kim

IPC: H01J37/352

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of the alignment.

Abstract translation: 本发明提供了用于微柱的新提取器和提取器的孔径和用于微柱的电子发射器的对准方法。 此外，本发明提供了使用对准原理的测量系统，测量方法和对准方法。

公开(公告)号：US20100148086A1

公开(公告)日：2010-06-17

申请号：US12600266

申请日：2008-05-15

Applicant: Ho Seob Kim ,  Young Chul Kim

Inventor： Ho Seob Kim ,  Young Chul Kim

IPC: H01J3/26 ,  H01F7/00

CPC classification number: H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/152 ,  H01J2237/1532

Abstract: The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).

Abstract translation: 本发明一般涉及用于产生电子束的微柱偏转器，更具体地，涉及一种能够扫描或移动电子束或用作使用磁场的标称器的偏转器。 根据本发明的偏转器（100）包括一个或多个偏转器电极。 每个偏转器电极包括由导体或半导体制成的芯体（12）和缠绕在芯部（12）上的线圈（11）。

公开(公告)号：US20090261267A1

公开(公告)日：2009-10-22

申请号：US12393050

申请日：2009-02-26

Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J3/14

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。 投影透镜系统以等于板孔直径的1至3倍的间距布置，并且每个投影透镜系统用于将一个或多个带电粒子子束放大并聚焦到目标平面上，每个 投影透镜系统具有在俯仰的约1至5倍的范围内的有效焦距，并且将带电粒子子束减小至少25倍。

公开(公告)号：US20090224650A1

公开(公告)日：2009-09-10

申请号：US12278219

申请日：2007-02-02

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: H01J33/00

CPC classification number: H01J37/18 ,  H01J2237/1205 ,  H01J2237/188

Abstract: Disclosed is a device for sustaining different vacuum degrees for an electron column, including an electron emitter, a lens part, and a housing for securing them, to maintain the electron column and a sample under different vacuum degrees. The device comprises a column housing coupling part coupled to the housing to isolate a vacuum; a hollow part defined through the center portion of the device to allow an electron beam emitted from the electron column to pass therethrough; and a vacuum isolation part having a structure of a gasket for vacuum coupling, wherein a difference of no less than 10 torr in a vacuum degree is maintained between both sides of the device by selecting an appropriate diameter of a lens electrode layer which is finally positioned in a path along which the electron beam is emitted or by using the hollow part.

Abstract translation: 公开了一种用于维持用于电子柱的不同真空度的装置，包括电子发射器，透镜部分和用于固定它们的壳体，以保持电子柱和样品处于不同的真空度。 该装置包括一个联接到壳体上的柱壳体联接部分以隔离真空; 通过装置的中心部分限定出允许从电子塔发射的电子束通过的中空部分; 以及具有用于真空联接的衬垫的结构的真空隔离部分，其中通过选择最终定位的透镜电极层的适当直径，在装置的两侧之间保持真空度不小于10托的差异 在发射电子束的路径中或通过使用中空部分。

公开(公告)号：US20080277584A1

公开(公告)日：2008-11-13

申请号：US12064076

申请日：2006-08-18

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: G01N23/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J2237/06375 ,  H01J2237/1205 ,  H01J2237/28

Abstract: The present invention relates to a method of effectively changing the energy of an electron beam in an electron column for generating an electron beam. This includes the step of additionally applying voltage to an electrode such that the electron beam finally has the desired energy so as to freely control the energy when the electron beam reaches a sample.

Abstract translation: 本发明涉及一种有效地改变用于产生电子束的电子束中的电子束的能量的方法。 这包括向电极附加施加电压的步骤，使得电子束最终具有期望的能量，以便当电子束到达样品时自由地控制能量。

公开(公告)号：US07375351B2

公开(公告)日：2008-05-20

申请号：US11257244

申请日：2005-10-24

Applicant: Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

Inventor： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

IPC: G21G5/00

CPC classification number: H01J37/067 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1502 ,  H01J2237/2818

Abstract: Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens module can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module that is mounted over the base, supports the electron beam source tip module at a central portion thereof, and includes a three-coupling pan spring plate portion including first through third spring units that are coupled to the electron beam source tip module in three directions on a plane perpendicular to the vertical axis, which vertically passes the center of the electron beam source tip module, to elastically support the electron beam source tip module in three directions; a first piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a first axis perpendicular to the vertical axis; and a second piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a second axis perpendicular to the vertical axis and the first axis.

Abstract translation: 本发明提供一种微柱电子束装置，包括：基底; 电子透镜支架，其上可以固定电子透镜模块，安装在基座的中心部分; 垂直设置在电子透镜模块上的电子束源头模块; 安装在基座上方的平板弹簧板台模块在其中心部分处支撑电子束源头模块，并且包括三联盘盘弹簧板部分，其包括耦合到电子束源的第一至第三弹簧单元 尖端模块在垂直于垂直轴线的平面上垂直通过电子束源头模块的中心，在三个方向弹性支撑电子束源头模块; 第一压电致动器，其联接到所述盘簧板模块以沿着垂直于所述垂直轴线的第一轴线移动所述电子束源尖端模块; 以及耦合到盘簧级模块的第二压电致动器，用于沿垂直于垂直轴线和第一轴线的第二轴线移动电子束源尖端模块。

公开(公告)号：US07341393B2

公开(公告)日：2008-03-11

申请号：US11155633

申请日：2005-06-20

Applicant: Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

Inventor： Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

IPC: F16C11/00 ,  F16D1/12

CPC classification number: H01J37/3007 ,  H01J9/18 ,  H01J37/04 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/166 ,  H01J2237/31774 ,  Y10T403/32713

Abstract: A mechanism for connecting first and second members through a sealing member sandwiched therebetween includes a position adjustment portion which adjusts a position of the first member in a direction substantially perpendicular to a surface of the second member with respect to the sealing member arranged on the second member, a reference portion which is provided to the second member and has a reference surface substantially perpendicular to the surface of the second member, and a pressing portion which presses the first member in a direction substantially parallel to the surface of the second member against the reference surface of the reference portion. A positioning member is provided to the first member and comes into contact with the reference surface of the reference portion, with the positioning member being position-adjustable with respect to a reference position of the first member. The first member, while being separated from the sealing member by the position adjustment portion, is positioned by the reference portion and pressing portion in the direction substantially parallel to the surface of the second member, and is thereafter moved by the position adjustment portion in the direction substantially perpendicular to the surface of the second member to deform the sealing member.

Abstract translation: 用于通过夹在其间的密封构件连接第一和第二构件的机构包括位置调整部分，其相对于布置在第二构件上的密封构件调节第一构件在基本上垂直于第二构件的表面的方向上的位置 设置在第二构件上并且具有基本上垂直于第二构件的表面的基准表面的参考部分，以及按照基本平行于第二构件的表面的方向按压第一构件的按压部分， 参考部分的表面。 定位构件设置到第一构件并与基准部分的基准表面接触，定位构件相对于第一构件的基准位置可位置调节。 第一构件在通过位置调节部分与密封构件分离的同时，通过基准部分和按压部分在基本上平行于第二构件的表面的方向上定位，然后通过位置调整部分 方向基本上垂直于第二构件的表面以使密封构件变形。