Optical system polarizer calibration
    21.
    发明授权
    Optical system polarizer calibration 有权
    光学系统偏光镜校准

    公开(公告)号:US08570514B2

    公开(公告)日:2013-10-29

    申请号:US13164130

    申请日:2011-06-20

    CPC classification number: G01N21/21 G01J3/504 G01N21/274

    Abstract: A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer.

    Abstract translation: 一种通过提供校准装置来校准偏振光学系统中任何入射角的偏振器的方法,通过提供校准装置,该校准装置包括具有设置在其表面上的偏振器的衬底, 用于指示偏振器的偏振取向的衬底,将校准装置装载在具有指示器的期望位置的偏振光学系统中,确定极化取向和偏振光学系统的基准之间的初始角度,使用偏振光 光学系统以偏振方向和偏振光学系统的基准之间的多个已知角度,使用光谱绘制指示偏振器在偏振光学系统中的角度的曲线,以及当偏振器的角度在 期望的范围,调节偏振器的角度,并重复以下步骤 获取光谱,并绘制一个指示偏振片角度的曲线。

    Spreading thermoelectric coolers
    23.
    发明授权
    Spreading thermoelectric coolers 有权
    散布热电冷却器

    公开(公告)号:US07825324B2

    公开(公告)日:2010-11-02

    申请号:US11618056

    申请日:2006-12-29

    Abstract: An apparatus includes a thermoelectric cooler having a first set of one or more metal electrodes, a second set of one or more metal electrodes, and one or more doped semiconductor members. Each member physically joins a corresponding one electrode of the first set to a corresponding one electrode of the second set. Each member has a cross-sectional area that increases along a path from the one metal electrode of the first set to the one metal electrode of the second set.

    Abstract translation: 一种装置包括具有第一组一个或多个金属电极的热电冷却器,一个或多个金属电极的第二组和一个或多个掺杂的半导体部件。 每个构件将第一组的对应的一个电极物理地连接到第二组的对应的一个电极。 每个构件具有沿着从第一组的一个金属电极到第二组的一个金属电极的路径增加的横截面面积。

    METHOD AND APPARATUS FOR LOCATING LOAD-BALANCED FACILITIES
    24.
    发明申请
    METHOD AND APPARATUS FOR LOCATING LOAD-BALANCED FACILITIES 有权
    用于定位负荷平衡设备的方法和装置

    公开(公告)号:US20100169891A1

    公开(公告)日:2010-07-01

    申请号:US12347810

    申请日:2008-12-31

    Inventor: Shankar Krishnan

    CPC classification number: G06F9/5072 G06F9/5027 H04L41/145

    Abstract: A method and apparatus for providing a facility location plan for a network with a V-shaped facility cost are disclosed. For example, the method receives an event from a queue, wherein the event comprises an open event or a tight event. The method connects a plurality of adjacent clients to a facility, if the event comprises the open event, and adds a new client-facility edge to a graph comprising a plurality of client-facility edges, if the event comprises the tight event.

    Abstract translation: 公开了一种用于提供具有V形设备成本的网络的设施位置计划的方法和装置。 例如,该方法从队列接收事件,其中事件包括打开事件或紧急事件。 如果事件包括打开事件,则该方法将多个相邻客户端连接到设施,并且如果事件包括紧密事件,则将新的客户机设施边缘添加到包括多个客户机设施边缘的图形中。

    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system
    25.
    发明授权
    Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system 失效
    测量系统被配置为执行被配置成为测量系统提供照明的样本和照明子系统的测量

    公开(公告)号:US07408641B1

    公开(公告)日:2008-08-05

    申请号:US11058153

    申请日:2005-02-14

    Abstract: An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

    Abstract translation: 被配置为为测量系统提供照明的照明子系统包括被配置为产生用于不同波长方案中的测量的光的第一和第二光源。 照明子系统还包括被配置为移入和移出从第一和第二光源到测量系统的光路的TIR棱镜。 如果TIR棱镜位于光路外,则仅沿着光路引导来自第一光源的光。 如果TIR棱镜位于光路中,则仅沿着光路引导来自第二光源的光。 还提供了各种测量系统。 一个测量系统包括光学子系统,该光学子系统被配置为使用沿着公共光路引导的不同波长方式的光来对样本进行测量。 不同的波长方案包括真空紫外线,紫外线,可见光和近红外波长方案。

    Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
    26.
    发明申请
    Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals 有权
    使用对称和反对称散射测量信号测量覆盖层和轮廓不对称

    公开(公告)号:US20060274310A1

    公开(公告)日:2006-12-07

    申请号:US11325872

    申请日:2006-01-04

    CPC classification number: G01N21/211 G01N21/9501 G01N21/956 G03F7/70633

    Abstract: Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.

    Abstract translation: 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中,不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中,测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus
    27.
    发明授权
    Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus 有权
    用于在普通设备中集成薄膜电阻测量和薄膜反射测量的方法和装置

    公开(公告)号:US07050160B1

    公开(公告)日:2006-05-23

    申请号:US10407669

    申请日:2003-04-03

    CPC classification number: G01N21/8422 G01B7/06 G01B11/0625 G01N21/55

    Abstract: A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially. By deriving the resistivity of the thin film from the measured reflectance at any particular region of the thin film surface, the thickness of the thin film, at that region of the film, may be obtained by dividing the derived resistivity by the measured sheet resistance for that same region.

    Abstract translation: 用于在公共装置中测量诸如金属膜或掺杂半导体的薄膜的反射率和薄层电阻的方法包括:将来自辐射源的辐射束引导到公共装置上的表面的一部分上 感测从薄膜表面反射的辐射量,并且在薄膜表面的与或相邻的薄膜的表面的一部分处的薄膜电阻测量装置接触薄膜表面 到由辐射束接触的薄膜的部分以测量薄膜的薄层电阻。 作为示例,薄层电阻测量装置可以包括4点探针或涡流测量装置。 相应的测量可以同时或顺序地进行。 通过从薄膜表面的任何特定区域处的测量的反射率导出薄膜的电阻率,可以通过将导电电阻率除以测得的薄层电阻值来获得薄膜的该薄膜的该区域的厚度 同一地区。

    Method and apparatus to simultaneously measure emissivities and
thermodynamic temperatures of remote objects
    28.
    发明授权
    Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects 失效
    同时测量远程物体的发射率和热力学温度的方法和装置

    公开(公告)号:US5011295A

    公开(公告)日:1991-04-30

    申请号:US422644

    申请日:1989-10-17

    Abstract: Method and apparatus for accurately and instantaneously determining the thermodynamic temperature of remote objects by continuous determination of the emissivity, the reflectivity, and optical constants, as well as the apparent or brightness temperature of the sample with a single instrument. The emissivity measurement is preferably made by a complex polarimeter including a laser that generates polarized light, which is reflected from the sample into a detector system. The detector system includes a beamsplitter, polarization analyzers, and four detectors to measure independently the four Stokes vectors of the reflected radiation. The same detectors, or a separate detector in the same instrument, is used to measure brightness temperature. Thus, the instrument is capable of measuring both the change in polarization upon reflection as well as the degree of depolarization and hence diffuseness. This enables correction for surface roughness of the sample and background radiation, which could otherwise introduce errors in temperature measurement.

    Abstract translation: 通过用单个仪器连续测定样品的发射率,反射率和光学常数以及样品的表观或亮度温度来准确和瞬时地确定远程物体的热力学温度的方法和设备。 发射率测量优选由包括产生偏振光的激光器的复合旋光计来进行,该偏振光从样品反射到检测器系统中。 检测器系统包括分束器,偏振分析器和四个检测器,以独立地测量反射辐射的四个斯托克斯矢量。 相同的检测器或相同仪器中的单独检测器用于测量亮度温度。 因此,该仪器能够测量反射时的极化的变化以及去极化的程度,从而测量扩散度。 这样可以校正样品的表面粗糙度和背景辐射,否则会导致温度测量误差。

    Light source tracking in optical metrology system
    29.
    发明授权
    Light source tracking in optical metrology system 有权
    光学测量系统中的光源跟踪

    公开(公告)号:US09146156B2

    公开(公告)日:2015-09-29

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
    30.
    发明申请
    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 有权
    光学系统系统中的光源跟踪

    公开(公告)号:US20130033704A1

    公开(公告)日:2013-02-07

    申请号:US13285712

    申请日:2011-10-31

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上,将来自设置在多轴平台上的照明源的光聚焦到诊断样本上,利用检测器收集从诊断样品的表面反射的一部分光,其中 照明源和检测器通过光学系统光学直接耦合,获取指示来自诊断样本的照明源位置漂移的一组诊断参数,通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合,确定照明源位置漂移的方向; 以及提供照明源位置调整参数,其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

Patent Agency Ranking