公开(公告)号：US09312102B2

公开(公告)日：2016-04-12

申请号：US13315567

申请日：2011-12-09

申请人： Yasushi Kamiya ,  Einstein Noel Abarra ,  Yuta Konno

发明人： Yasushi Kamiya ,  Einstein Noel Abarra ,  Yuta Konno

IPC分类号： H01J37/302 ,  H01J37/305

CPC分类号： H01J37/302 ,  G05B15/02 ,  H01J37/3053 ,  H01J2237/0044 ,  H01J2237/043 ,  H01J2237/334

摘要： A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.

摘要翻译： 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。

公开(公告)号：US08016537B2

公开(公告)日：2011-09-13

申请号：US12750955

申请日：2010-03-31

申请人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

发明人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

IPC分类号： H01L21/677

CPC分类号： H01L21/67184 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67207 ,  Y10S414/137

摘要： A structure is provided in which a load lock chamber (51) for carrying in an unprocessed wafer from outside and carrying out a processed wafer to outside, a first end conveyance chamber (54a) to be connected to the load lock chamber, at least one intermediate conveyance chamber (54b), a plurality of sets of a pair of process modules (52a, 52b) provided adjacent to each other and capable of independent processing, and a second end conveyance chamber (54c) disposed at the end part on the opposite side of the load lock chamber are connected in series. Each set of process modules (52a, 52b, 52c and 52d) is arranged one by one between the first end conveyance chamber and the intermediate conveyance chamber, between the intermediate conveyance chambers, and between the intermediate conveyance chamber and the second end conveyance chamber, respectively.

摘要翻译： 提供了一种结构，其中用于从外部携带未加工的晶片并将经处理的晶片运送到外部的负载锁定室（51），要连接到负载锁定室的第一端部输送室（54a），至少一个 中间传送室（54b），彼此相邻设置并且能够独立处理的多组一对处理模块（52a，52b）和设置在相对的端部的第二端部传送室（54c） 负载锁定室的一侧串联连接。 每组处理模块（52a，52b，52c和52d）在第一端部输送室和中间输送室之间，中间输送室之间以及中间输送室和第二端部输送室之间一个接一个地布置， 分别。

公开(公告)号：US20120145535A1

公开(公告)日：2012-06-14

申请号：US13315567

申请日：2011-12-09

申请人： Yasushi KAMIYA ,  Einstein Noel Abarra ,  Yuta Konno

发明人： Yasushi KAMIYA ,  Einstein Noel Abarra ,  Yuta Konno

IPC分类号： H01L21/02 ,  B44C1/22 ,  C23C14/34

CPC分类号： H01J37/302 ,  G05B15/02 ,  H01J37/3053 ,  H01J2237/0044 ,  H01J2237/043 ,  H01J2237/334

摘要： A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.

摘要翻译： 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。

公开(公告)号：US08053747B2

公开(公告)日：2011-11-08

申请号：US12579636

申请日：2009-10-15

申请人： Einstein Noel Abarra ,  Masahiro Shibamoto

发明人： Einstein Noel Abarra ,  Masahiro Shibamoto

IPC分类号： H01L21/00

CPC分类号： H01J37/317 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/0822 ,  H01J2237/3156 ,  H01J2237/316

摘要： A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator.

摘要翻译： 一种清洗基板处理装置的方法，其中第一离子束发生器和第二离子束发生器彼此相对布置以夹持其上放置基板的平面，并且处理基板的两个表面，包括 从第一离子束发生器和第二离子束发生器之间的位置退回衬底的步骤，以及通过从第一离子束发生器向第二离子束发生器发射离子束来清洁第二离子束发生器。

公开(公告)号：US20100215460A1

公开(公告)日：2010-08-26

申请号：US12750955

申请日：2010-03-31

申请人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

发明人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

IPC分类号： H01L21/677

CPC分类号： H01L21/67184 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67207 ,  Y10S414/137

摘要： A structure is provided in which a load lock chamber (51) for carrying in an unprocessed wafer from outside and carrying out a processed wafer to outside, a first end conveyance chamber (54a) to be connected to the load lock chamber, at least one intermediate conveyance chamber (54b), a plurality of sets of a pair of process modules (52a, 52b) provided adjacent to each other and capable of independent processing, and a second end conveyance chamber (54c) disposed at the end part on the opposite side of the load lock chamber are connected in series. Each set of process modules (52a, 52b, 52c and 52d) is arranged one by one between the first end conveyance chamber and the intermediate conveyance chamber, between the intermediate conveyance chambers, and between the intermediate conveyance chamber and the second end conveyance chamber, respectively.

摘要翻译： 提供了一种结构，其中用于从外部携带未加工的晶片并将经处理的晶片运送到外部的负载锁定室（51），要连接到负载锁定室的第一端部输送室（54a），至少一个 中间传送室（54b），彼此相邻设置并且能够独立处理的多组一对处理模块（52a，52b）和设置在相对的端部的第二端部传送室（54c） 负载锁定室的一侧串联连接。 每组处理模块（52a，52b，52c和52d）在第一端部输送室和中间输送室之间，中间输送室之间以及中间输送室和第二端部输送室之间一个接一个地布置， 分别。

公开(公告)号：US08092139B2

公开(公告)日：2012-01-10

申请号：US12728588

申请日：2010-03-22

申请人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

发明人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67745 ,  H01L21/67748 ,  Y10S414/139

摘要： There are comprised a load chamber (51) for carrying in a wafer from outside, an unload chamber (53) for carrying out a wafer to outside, and a plurality of conveyance chambers (54a, 54b, 54c) and a plurality of process modules (52a, 52b) connected in series between the load chamber and the unload chamber. The conveyance chambers and the process modules are connected alternately and the plurality of conveyance chambers includes a first end conveyance chamber (54a) connected to the load chamber, a second end conveyance chamber (54c) connected to the unload chamber, and another one or a plurality of intermediate conveyance chambers (54b).

摘要翻译： 包括用于从外部承载晶片的负载室（51），用于将晶片运送到外部的卸载室（53）和多个输送室（54a，54b，54c）和多个处理模块 （52a，52b）串联连接在负载室和卸载室之间。 传送室和处理模块交替连接，多个传送室包括连接到装载室的第一端部传送室（54a），连接到卸载室的第二端部传送室（54c），以及另一个或 多个中间输送室（54b）。

公开(公告)号：US20100239394A1

公开(公告)日：2010-09-23

申请号：US12728588

申请日：2010-03-22

申请人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

发明人： Naoki Watanabe ,  Einstein Noel Abarra ,  David Djulianto Djayaprawira ,  Yasumi Kurematsu

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67745 ,  H01L21/67748 ,  Y10S414/139

摘要： There are comprised a load chamber (51) for carrying in a wafer from outside, an unload chamber (53) for carrying out a wafer to outside, and a plurality of conveyance chambers (54a, 54b, 54c) and a plurality of process modules (52a, 52b) connected in series between the load chamber and the unload chamber. The conveyance chambers and the process modules are connected alternately and the plurality of conveyance chambers includes a first end conveyance chamber (54a) connected to the load chamber, a second end conveyance chamber (54c) connected to the unload chamber, and another one or a plurality of intermediate conveyance chambers (54b).

摘要翻译： 包括用于从外部承载晶片的负载室（51），用于将晶片输送到外部的卸载室（53）和多个输送室（54a，54b，54c）和多个处理模块 （52a，52b）串联连接在负载室和卸载室之间。 传送室和处理模块交替连接，多个传送室包括连接到装载室的第一端部传送室（54a），连接到卸载室的第二端部传送室（54c），以及另一个或 多个中间输送室（54b）。

公开(公告)号：US08536539B2

公开(公告)日：2013-09-17

申请号：US12956086

申请日：2010-11-30

申请人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

发明人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

IPC分类号： G21K5/04

CPC分类号： H01J27/024 ,  H01J37/30 ,  H01J2237/083 ,  H01J2237/3142 ,  H01J2237/3151

摘要： An ion beam generator includes a discharge tank for generating plasma that includes ions. A lead-out electrode has an annular grid portion provided with openings for leading out the ions generated in the discharge tank, while accelerating the generated ions as an annular ion beam. A deflecting electrode deflects the annular ion beam, which is led out of the lead-out electrode, in an annular center direction.

摘要翻译： 离子束发生器包括用于产生包括离子的等离子体的放电槽。 引出电极具有环形栅格部分，其设置有用于引出在放电槽中产生的离子的开口，同时加速产生的离子作为环形离子束。 偏转电极将从引出电极引出的环形离子束沿环形中心方向偏转。

公开(公告)号：US20120104274A1

公开(公告)日：2012-05-03

申请号：US13382002

申请日：2010-07-13

申请人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

发明人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

IPC分类号： G21K5/00 ,  B01J19/08 ,  H01J27/02

CPC分类号： H01J37/08 ,  B82Y10/00 ,  C23C14/46 ,  G11B5/743 ,  G11B5/855 ,  H01J27/024 ,  H01J27/16 ,  H01J37/147 ,  H01J37/30 ,  H01J37/32422 ,  H01J2237/024 ,  H01J2237/061 ,  H01J2237/3151 ,  H01J2237/316 ,  H01J2237/3165

摘要： There is provided an ion beam generating apparatus capable of reducing power consumption and obtain highly-accurate uniformity in a substrate process without providing a mechanism to rotate a substrate. Each of ion beam generating apparatuses 1a and 1b includes a discharging tank for generating plasma, an extraction electrode including an inclined portion arranged so as to be inclined with respect to an irradiated surface for extracting an ion generated in the discharging tank, a rotating driving unit 30 provided out of the discharging tank for rotating the extraction electrode, and a rotation supporting member 31 for coupling the rotating driving unit 30 and the extraction electrode 7, wherein an insulator block 34 arranged around the rotation supporting member 31 is included in the discharging tank.

摘要翻译： 提供了一种离子束发生装置，其能够降低功耗并获得基板工艺中的高精度均匀性，而不提供旋转基板的机构。 离子束产生装置1a和1b中的每一个包括用于产生等离子体的排出槽，提取电极包括相对于用于提取在排放箱中产生的离子的照射表面倾斜布置的倾斜部分，旋转驱动单元 设置在用于使引出电极旋转的排放槽中的30;以及用于联接旋转驱动单元30和提取电极7的旋转支撑构件31，其中布置在旋转支撑构件31周围的绝缘体块34包括在排出槽 。

公开(公告)号：US20110147200A1

公开(公告)日：2011-06-23

申请号：US12956086

申请日：2010-11-30

申请人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

发明人： Hirohisa Hirayanagi ,  Ayumu Miyoshi ,  Einstein Noel Abarra

IPC分类号： H01J27/00 ,  H01J37/147 ,  H01J3/28 ,  H01J37/305

CPC分类号： H01J27/024 ,  H01J37/30 ,  H01J2237/083 ,  H01J2237/3142 ,  H01J2237/3151

摘要： An ion beam generator generates plasma in a discharge tank 2, leads out an annular ion beam by a lead-out electrode 7, and deflects the ion beam in an annular center direction by a deflecting electrode 30 to enter a substrate W from the inclined direction to provide uniformity of the incident ion beam to the substrate without increasing the size of the whole apparatus.

摘要翻译： 离子束发生器在放电槽2中产生等离子体，通过引出电极7引出环形离子束，并通过偏转电极30使离子束在环形中心方向偏转，从倾斜方向进入衬底W 以提供入射离子束的均匀性而不增加整个装置的尺寸。