公开(公告)号：US10276347B2

公开(公告)日：2019-04-30

申请号：US16167429

申请日：2018-10-22

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20190057837A1

公开(公告)日：2019-02-21

申请号：US16167429

申请日：2018-10-22

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20170125202A1

公开(公告)日：2017-05-04

申请号：US15404440

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20160284505A1

公开(公告)日：2016-09-29

申请号：US15078369

申请日：2016-03-23

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/06 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/2806 ,  H01J2237/2813

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

Abstract translation: 提出了一种用于以倾斜照明观察样品的多光束装置。 在该装置中，新的源转换单元将单个电子源改变为倾斜的虚拟多源阵列，初级投影成像系统投射该阵列以在倾斜照明下在样本上形成多个探测点，并且聚光透镜调整 多个探针点的电流。 在源转换单元中，图像形成装置不仅形成倾斜虚拟多源阵列，而且还补偿多个探测点的离轴像差。 该装置可以提供样品的暗场图像和/或亮场图像。

公开(公告)号：US20160217968A1

公开(公告)日：2016-07-28

申请号：US15007873

申请日：2016-01-27

Applicant: Hermes-Microvision, Inc.

Inventor： Shuai Li ,  Zhongwei Chen

IPC: H01J37/145 ,  H01J37/20 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

Abstract translation: 该装置包括用于产生电子束的光束源，穿过物镜的光束引导管，用于在样本附近产生磁场以将粒子束的颗粒聚焦在样本上的物镜，控制 电极，其具有为样品附近的粒子束提供延迟场的能力，以当束与样本碰撞时降低粒子束的能量;偏转系统，包括沿着光轴定位的多个偏转单元，用于偏转粒子 光束，以允许在具有大面积的扫描样本上，至少一个偏转单元位于光束的延迟场中，其余偏转单元位于物镜的中心孔内，以及检测单元捕获次级 电子（SE）和背散射电子（BSE）。

公开(公告)号：US20160163502A1

公开(公告)日：2016-06-09

申请号：US14964316

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/05 ,  H01J37/222 ,  H01J37/265 ,  H01J37/285 ,  H01J2237/2449 ,  H01J2237/2817

Abstract: The present invention provides an improved electron-optical apparatus for the inspection and review of the specimen, and for the defect inspection, an inspection mode of operation is performed to generate inspection data, wherein the large beam current is formed by a magnetic immersion lens to scan the specimen, and preferably the objective lens system, a swing objective retarding immersion lens, focuses the beam current and generates the large scanning field, and for the defect review, the review mode of operation is performed to analyze the defects, wherein the large beam current is abandoned and the small beam current is adopted to examine the specimen without a large scanning field, and in order to properly select and detect signal charged particles excited from the specimen, a first Wien filter is utilized to select the acquired signal particles and a second Wien filter is used to compensate the aberrations induced when the signal particles pass through the first Wien filter.

Abstract translation: 本发明提供了一种用于检查和检查样本的改进的电子光学装置，并且为了进行缺陷检查，执行检查操作模式以产生检查数据，其中大的光束电流由磁性浸没透镜形成 扫描样本，优选物镜系统，摆动物镜延迟浸没透镜，聚焦光束电流并产生大扫描场，为了进行缺陷检查，执行审查操作模式以分析缺陷，其中大 射束电流被放弃，采用小束电流检测样本，而没有大的扫描场，为了适当地选择和检测从样品激发的信号带电粒子，使用第一维恩滤波器来选择所获取的信号粒子， 第二维恩滤波器用于补偿信号粒子通过第一维恩滤波器时所引起的像差。

公开(公告)号：US09000395B2

公开(公告)日：2015-04-07

申请号：US14276000

申请日：2014-05-13

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/12 ,  H01J37/05 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract translation: 本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束 被发现在潜在的障碍之上。 该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。 在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。 本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

公开(公告)号：US20140284476A1

公开(公告)日：2014-09-25

申请号：US14276000

申请日：2014-05-13

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

Abstract translation: 本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束 被发现在潜在的障碍物上。 该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。 在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。 本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

公开(公告)号：US11837431B2

公开(公告)日：2023-12-05

申请号：US16018008

申请日：2018-06-25

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US10236156B2

公开(公告)日：2019-03-19

申请号：US15078369

申请日：2016-03-23

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/22 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.