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公开(公告)号：US10539886B2
公开(公告)日：2020-01-21
申请号：US15526639
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kesters , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
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公开(公告)号：US10241418B2
公开(公告)日：2019-03-26
申请号：US15527645
申请日：2015-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Marc Hauptmann , Dylan John David Davies , Paul Janssen , Naoko Tsugama , Richard Joseph Bruls , Kornelis Tijmen Hoekerd , Edwin Johannes Maria Janssen , Petrus Johannes Van Den Oever , Ronald Van Der Wilk , Antonius Hubertus Van Schijndel , Jorge Alberto Vieyra Salas
Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.
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公开(公告)号：US09740113B2
公开(公告)日：2017-08-22
申请号：US15029565
申请日：2015-06-03
Applicant: ASML Netherlands B.V.
Inventor： Paul Janssen , Richard Joseph Bruls , Petrus Jacobus Maria Van Gils
IPC: G03B27/58 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/70866 , G03F7/70916 , H01L21/6831 , H01L21/6875
Abstract: A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.
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公开(公告)号：US11977326B2
公开(公告)日：2024-05-07
申请号：US17048875
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Dennis De Graaf , Richard Beaudry , Maxime Biron , Paul Janssen , Thijs Kater , Kevin Kornelsen , Michael Alfred Josephus Kuijken , Jan Hendrik Willem Kuntzel , Stephane Martel , Maxim Aleksandrovich Nasalevich , Guido Salmaso , Pieter-Jan Van Zwol
CPC classification number: G03F1/64 , G03F1/62 , G03F7/70983
Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.
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公开(公告)号：US11086213B2
公开(公告)日：2021-08-10
申请号：US16798688
申请日：2020-02-24
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Amoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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Patent Agency Ranking
公开(公告)号：US11036128B2
公开(公告)日：2021-06-15
申请号：US16060837
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Derk Servatius Gertruda Brouns , Paul Janssen , Mohammad Reza Kamali , Mária Péter , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , David Ferdinand Vles , Willem-Pieter Voorthuijzen
Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：US11029595B2
公开(公告)日：2021-06-08
申请号：US16707201
申请日：2019-12-09
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US10969701B2
公开(公告)日：2021-04-06
申请号：US16572156
申请日：2019-09-16
Applicant: ASML Netherlands B.V.
Inventor： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kester , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US10571800B2
公开(公告)日：2020-02-25
申请号：US15545390
申请日：2016-02-01
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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30.发明申请公开(公告)号：US20190219929A1
公开(公告)日：2019-07-18
申请号：US16362754
申请日：2019-03-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Marc Hauptmann , Dylan John David Davies , Paul Janssen , Naoko Tsugama , Richard Joseph Bruls , Kornelis Tijmen Hoekerd , Edwin Johannes Maria Janssen , Petrus Johannes Van Den Oever , Ronald Van Der Wilk , Antonius Hubertus Van Schijndel , Jorge Alberto Vieyra Salas
CPC classification number: G03F7/70616 , G01N21/9501 , G01N27/61 , G01N2021/95676 , G03F1/84 , G03F7/70508 , G03F7/70783 , H01L22/12 , H01L22/20
Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.
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