公开(公告)号：US11237475B2

公开(公告)日：2022-02-01

申请号：US16758250

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Chaitanya Krishna Ande ,  Dennis De Graaf ,  Thijs Kater ,  Michael Alfred Josephus Kuijken ,  Mahdiar Valefi

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US11977326B2

公开(公告)日：2024-05-07

申请号：US17048875

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis De Graaf ,  Richard Beaudry ,  Maxime Biron ,  Paul Janssen ,  Thijs Kater ,  Kevin Kornelsen ,  Michael Alfred Josephus Kuijken ,  Jan Hendrik Willem Kuntzel ,  Stephane Martel ,  Maxim Aleksandrovich Nasalevich ,  Guido Salmaso ,  Pieter-Jan Van Zwol

IPC: G03F1/64 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70983

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US11567399B2

公开(公告)日：2023-01-31

申请号：US17566764

申请日：2021-12-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Chaitanya Krishna Ande ,  Dennis De Graaf ,  Thijs Kater ,  Michael Alfred Josephus Kuijken ,  Mahdiar Valefi

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.