公开(公告)号：US10712656B2

公开(公告)日：2020-07-14

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Eric Willem Felix Casimiri ,  Tamara Druzhinina ,  Paul Janssen ,  Michael Alfred Josephus Kuijken ,  Martinus Hendrikus Antonius Leenders ,  Sicco Oosterhoff ,  Mária Péter ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/62 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

公开(公告)号：US11567399B2

公开(公告)日：2023-01-31

申请号：US17566764

申请日：2021-12-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Chaitanya Krishna Ande ,  Dennis De Graaf ,  Thijs Kater ,  Michael Alfred Josephus Kuijken ,  Mahdiar Valefi

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：US11237475B2

公开(公告)日：2022-02-01

申请号：US16758250

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester Houweling ,  Chaitanya Krishna Ande ,  Dennis De Graaf ,  Thijs Kater ,  Michael Alfred Josephus Kuijken ,  Mahdiar Valefi

IPC: G03F1/62

Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.