公开(公告)号：US10539886B2

公开(公告)日：2020-01-21

申请号：US15526639

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kesters ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

公开(公告)号：US20200012204A1

公开(公告)日：2020-01-09

申请号：US16572156

申请日：2019-09-16

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm, Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kesters ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.