公开(公告)号：US09740113B2

公开(公告)日：2017-08-22

申请号：US15029565

申请日：2015-06-03

Applicant: ASML Netherlands B.V.

Inventor： Paul Janssen ,  Richard Joseph Bruls ,  Petrus Jacobus Maria Van Gils

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70916 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.