Invention Grant
- Patent Title: Lithographic apparatus, device manufacturing method and method of clamping an object
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Application No.: US15029565Application Date: 2015-06-03
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Publication No.: US09740113B2Publication Date: 2017-08-22
- Inventor: Paul Janssen , Richard Joseph Bruls , Petrus Jacobus Maria Van Gils
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14175411 20140702
- International Application: PCT/EP2015/062351 WO 20150603
- International Announcement: WO2016/192785 WO 20161208
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H01L21/683
Abstract:
A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.
Public/Granted literature
- US20170131643A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND METHOD OF CLAMPING AN OBJECT Public/Granted day:2017-05-11
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