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公开(公告)号：US09429853B2
公开(公告)日：2016-08-30
申请号：US14664360
申请日：2015-03-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.
Abstract translation: 一种光刻设备，包括可移动台，配置成将图案化辐射束投影到基板上的投影系统以及被配置为向投影系统的最终元件和台之间的空间提供液体的液体供应系统，液体供应 系统，其包括被配置为向该空间提供液体的入口，入口包括位于最终元件的底表面下方的入口孔阵列，并被配置为从其提供基本上水平的液体流，沿着一侧延伸的入口孔阵列 所述图案化辐射束的曝光区域以及被配置为从所述空间移除液体的提取器，所述提取器包括至少部分地沿水平方向延伸的出口孔的二维阵列，通过所述出口孔可以从 空间。
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22.发明申请THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权热调节单元，平面设备和设备制造方法公开(公告)号：US20150070666A1
公开(公告)日：2015-03-12
申请号：US14395461
申请日：2013-04-16
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/707 , G03F7/70716 , G03F7/70783 , G03F7/70816 , G03F7/70891 , G03F7/7095 , H01L21/67103
Abstract: A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.
Abstract translation: 一种用于对基材进行热调节的热调节单元，所述热调节单元包括：热调节元件，其在使用中具有面向所述基板的第一层，并且包括具有100W / mK以上的导热率的材料，第二层 和位于第一和第二层之间的传热部件; 以及加热构件，其比所述热调节元件更硬，并且构造成支撑所述热调节元件，以便减小其机械变形，其中所述热调节元件与所述加强构件热隔离。
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公开(公告)号：US20230273533A1
公开(公告)日：2023-08-31
申请号：US18300094
申请日：2023-04-13
Applicant: ASML NETHERLANDS B.V.
Inventor： NICOLAAS TEN KATE , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/00
CPC classification number: G03F7/70875 , G03F7/7085
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20190072863A1
公开(公告)日：2019-03-07
申请号：US16177585
申请日：2018-11-01
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10209629B2
公开(公告)日：2019-02-19
申请号：US15824686
申请日：2017-11-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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Patent Agency Ranking
公开(公告)号：US10191377B2
公开(公告)日：2019-01-29
申请号：US15482526
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20 , G03F7/30 , H01L21/027 , H01L21/67
Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US09971254B2
公开(公告)日：2018-05-15
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert-Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US09785055B2
公开(公告)日：2017-10-10
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US09753382B2
公开(公告)日：2017-09-05
申请号：US14397126
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Haico Victor Kok , Yuri Johannes Gabriël Van De Vijver , Johannes Antonius Maria Van De Wal , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Jan Steven Christiaan Westerlaken , Johannes Hubertus Antonius Van De Rijdt , Allard Eelco Kooiker , Wilhelmina Margareta Jozef Hurkens-Mertens , Yohann Bruno Yvon Teillet
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US20160370713A1
公开(公告)日：2016-12-22
申请号：US15250658
申请日：2016-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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