公开(公告)号：US20240304410A1

公开(公告)日：2024-09-12

申请号：US18600212

申请日：2024-03-08

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Erik Essers

IPC: H01J37/26 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/26 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244 ,  H01J2237/049 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2443

Abstract: An electron beam microscope comprises an electron beam source, a beam tube, a magnetic objective lens, an object holder, a scintillator arrangement, a detector arrangement and a potential supply system. The power supply system supplies: i) the object holder with a potential U1; ii) the beam tube with a potential U2; iii) a pole end of the objective lens with a potential U3; iv) a scintillator body of the scintillator arrangement with a potential; and v) a light detector of the detector arrangement with a potential U5, such that:






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公开(公告)号：US11985756B2

公开(公告)日：2024-05-14

申请号：US17505977

申请日：2021-10-20

Applicant: Applied Materials, Inc.

Inventor： Robert B. Vopat ,  Charles T. Carlson

IPC: H05H7/22 ,  H01J37/317 ,  H05H9/00

CPC classification number: H05H7/22 ,  H01J37/3171 ,  H05H9/00 ,  H01J2237/0473 ,  H01J2237/141 ,  H01J2237/31701

Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter, wherein the linear accelerator includes a jacketed resonator coil. In some embodiments, a linear accelerator assembly may include a first fluid conduit and a coil resonator coupled to the first fluid conduit, wherein the coil resonator is operable to receive a first fluid via the first fluid conduit, wherein the coil resonator comprises a first coil conduit adjacent a second coil conduit, and wherein a first fluid channel defined by the first coil conduit is operable to receive the first fluid.

公开(公告)号：US10083813B2

公开(公告)日：2018-09-25

申请号：US15461829

申请日：2017-03-17

Applicant: INTEL CORPORATION

Inventor： Masaki Kurokawa ,  Takamasa Sato ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J3/14 ,  H01J37/147 ,  H01J37/317 ,  H01J37/24

CPC classification number: H01J37/147 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/141 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/20285

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

公开(公告)号：US20170125203A1

公开(公告)日：2017-05-04

申请号：US15404618

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20160042911A1

公开(公告)日：2016-02-11

申请号：US14534815

申请日：2014-11-06

Applicant: NATIONAL TSING HUA UNIVERSITY

Inventor： WEI-YU CHANG ,  FU-RONG CHEN ,  TE-HUI LEE ,  TSU-WEI HUANG

IPC: H01J37/141 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/14 ,  H01J37/141 ,  H01J37/1413 ,  H01J37/145 ,  H01J37/26 ,  H01J2237/141 ,  H01J2237/1415

Abstract: A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.

Abstract translation: 组合的圆形多极磁性透镜包括线圈支架，第一极靴和第二极靴。 线圈支撑件上的第一极靴的至少第一极靴和线圈支撑件下方的第二极靴的至少第二极靴分别朝向中心轴线延伸。 第一极靴和第二极靴根据中心轴对称，或第一极靴和第二极靴分别对称布置，第一极靴和相邻的第二极靴之间的角度差为360 / 2N度。 在第一极靴和相邻的第二极靴之间形成磁路间隙，用于产生多极的磁场分布并减小电源的体积和数量。

公开(公告)号：US20150294833A1

公开(公告)日：2015-10-15

申请号：US14439628

申请日：2013-10-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Akira Ikegami ,  Hideto Dohi ,  Momoyo Enyama ,  Tomoyasu Shojo

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/1478 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1506 ,  H01J2237/2801

Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

Abstract translation: 为了提供能够以任何倾斜角对样品进行高分辨率测量的带电粒子束装置，用于检测通过用一次带电粒子束（114）照射样品（114）而产生的二次带电粒子（115）的带电粒子束装置 110）设置有光束倾斜透镜（113），其具有：一个磁轭磁路部件（132）和一个用于将一次带电粒子束（110）聚焦在样本（114）上的透镜线圈; 以及螺线管线圈（133），其配置为将所述上端配置在所述磁轭磁路部件（132）的侧面，并将所述磁轭磁路部件（132）的极片的前端部与所述磁轭部件 样品（114），以便任意倾斜样品（114）上的初级带电粒子束（110）。

公开(公告)号：US07888660B2

公开(公告)日：2011-02-15

申请号：US11341838

申请日：2006-01-27

Applicant: Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

IPC: G21K5/04

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US20070187619A1

公开(公告)日：2007-08-16

申请号：US11276128

申请日：2006-02-15

Applicant: Peter Kellerman ,  Keneth Purser

Inventor： Peter Kellerman ,  Keneth Purser

IPC: H01J37/317 ,  H01J37/141

CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/057 ,  H01J2237/141 ,  H01J2237/142 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Abstract translation: 公开了一种包括活性场容纳的电磁体和相关离子注入机系统。 电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。 在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流 电线定位成绕过第一和第二相对侧的每个开口。

公开(公告)号：US20060169924A1

公开(公告)日：2006-08-03

申请号：US11341839

申请日：2006-01-27

Applicant: Kenneth Purser ,  Harald Enge ,  Norman Turner

Inventor： Kenneth Purser ,  Harald Enge ,  Norman Turner

IPC: H01J37/08

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

Abstract translation: 一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。 在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。 此外，该方法和装置可用于沿着光束线引入四极场。

公开(公告)号：US20060151698A1

公开(公告)日：2006-07-13

申请号：US11311278

申请日：2005-12-20

Applicant: Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

Inventor： Yuko Sasaki ,  Yasuhiro Gunji ,  Zhaohui Cheng

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/265 ,  H01J2237/141 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/2817

Abstract: A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.

Abstract translation: 提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。 该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性 在高分辨率和广域的观察视野之间。