公开(公告)号：US08653489B2

公开(公告)日：2014-02-18

申请号：US13082361

申请日：2011-04-07

Applicant: Steven Thomas Coyle ,  John Andrew Hunt

Inventor： Steven Thomas Coyle ,  John Andrew Hunt

IPC: G21K5/10

CPC classification number: G01N1/32 ,  H01J37/31 ,  H01J2237/026 ,  H01J2237/2007 ,  H01J2237/3118

Abstract: Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. Additionally, apparatus kits are disclosed that enable the use of the same shields in the observation of prepared samples.

Abstract translation: 公开了用于使用实施例的离子束样品制备装置和方法的实施方案。 该装置包括在真空室中的离子束照射装置，其可以将离子定向到样品，阻挡部分朝向样品的离子的屏蔽件，以及具有屏蔽保持装置的屏蔽保持台，该屏蔽保持装置可替换地和可移除地将屏蔽保持在 一个位置。 当屏蔽保持在屏蔽保持阶段时，屏蔽具有与屏蔽保持平台上的辅助基准特征相交的基准特征。 屏蔽件具有能够将样品耐久地粘附到屏蔽件的特征，以用离子束处理样品。 屏蔽和屏蔽保持阶段的补充基准特征使得样品能够准确和可重复地定位在用于样品处理和再处理的设备中。 此外，公开了能够在观察制备的样品时使用相同屏蔽的装置套件。

公开(公告)号：US08563927B2

公开(公告)日：2013-10-22

申请号：US13196778

申请日：2011-08-02

Applicant: Dieter Winkler ,  Stefan Lanio

Inventor： Dieter Winkler ,  Stefan Lanio

IPC: G21K7/00 ,  G01N23/04

CPC classification number: H01J37/09 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/28

Abstract: A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 106 Ωcm to about 1012 Ωcm.

Abstract translation: 带电粒子束装置的屏蔽构件包括导电基板; 以及延伸穿过导电基板的通孔。 导电衬底由具有约106Ω·cm至约1012Ω·cm范围内的特定电阻率的材料构成。

公开(公告)号：US20130164684A1

公开(公告)日：2013-06-27

申请号：US13727710

申请日：2012-12-27

Applicant: CANON KABUSHIKI KAISHA

Inventor： Toshiro Yamanaka

IPC: G21K5/04

CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/026 ,  H01J2237/0435 ,  H01J2237/31794

Abstract: A lithography apparatus performs writing on a substrate with a plurality of charged particle beams and includes a blanking deflector array for blanking the plurality of charged particle beams; an aperture array configured to block a charged particle beam deflected by the blanking deflector array; and a sealing mechanism configured to seal an opening of at least one of the blanking deflector array and the aperture array with a shielding material that shields a charged particle beam.

Abstract translation: 光刻设备利用多个带电粒子束在基板上进行写入，并且包括用于对多个带电粒子束进行消隐的消隐偏转器阵列; 孔径阵列，其构造成阻挡由消隐偏转器阵列偏转的带电粒子束; 以及密封机构，其构造成用遮蔽带电粒子束的屏蔽材料来密封消隐偏转器阵列和孔径阵列中的至少一个的开口。

公开(公告)号：US20110186747A1

公开(公告)日：2011-08-04

申请号：US13028188

申请日：2011-02-15

Applicant: John Ruffell

Inventor： John Ruffell

IPC: H01J3/32 ,  H01J3/30 ,  H01J3/34

CPC classification number: H01L21/68764 ,  H01J37/1474 ,  H01J37/3171 ,  H01J2237/026 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/1503 ,  H01J2237/20207 ,  H01J2237/30472 ,  H01L21/68771

Abstract: Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.

Abstract translation: 离子注入装置的系统和方法包括用于沿入射束轴产生离子束的离子源。 离子注入装置包括耦合到旋转机构的光束偏转组件，其使射束偏转组件围绕入射光束轴线旋转并偏转离子束。 至少一个晶片保持器保持目标晶片，并且旋转机构操作以将离子束引导至至少一个晶片保持器中的一个，其也旋转以保持恒定的注入角度。

公开(公告)号：US07772567B2

公开(公告)日：2010-08-10

申请号：US11699066

申请日：2007-01-29

Applicant: Susumu Kato

Inventor： Susumu Kato

IPC: G01F23/00 ,  G21K5/08 ,  G21K5/10

CPC classification number: G01N23/04 ,  H01J37/09 ,  H01J37/185 ,  H01J37/20 ,  H01J2237/026 ,  H01J2237/204 ,  H01L21/68742 ,  H01L21/6875

Abstract: A specimen holding device has a plurality of electrodes, and a moving mechanism for moving upward and downward a part of the plurality of electrodes. Further, the moving mechanism moves the part of the plurality of electrodes downward to evacuate from a path through which a specimen is introduced. Further, the specimen holding device has a positioning member for the specimen so that the specimen is positioned after being mounted.

Abstract translation: 试样保持装置具有多个电极和用于使多个电极的一部分上下移动的移动机构。 此外，移动机构将多个电极的一部分向下移动，以从被引入样本的路径排出。 此外，试样保持装置具有用于试样的定位构件，使得试样在安装之后定位。

公开(公告)号：US20090057573A1

公开(公告)日：2009-03-05

申请号：US11847139

申请日：2007-08-29

Applicant: Russell John LOW ,  Piotr R. Lubicki ,  Jeffrey D. Lischer ,  Steve Krause ,  Eric Hermanson ,  Joseph C. Olson ,  Kasegn D. Tekletsadik

Inventor： Russell John LOW ,  Piotr R. Lubicki ,  Jeffrey D. Lischer ,  Steve Krause ,  Eric Hermanson ,  Joseph C. Olson ,  Kasegn D. Tekletsadik

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J37/09 ,  H01J37/16 ,  H01J37/248 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/2001

Abstract: Techniques for terminal insulation for an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an ion implanter comprising a terminal structure defining a terminal cavity. The ion implanter may also comprise a grounded enclosure defining a grounded cavity and the terminal structure may be at least partially disposed within the grounded cavity. The ion implanter may further comprise an intermediate terminal structure disposed proximate an exterior portion of the terminal structure and at least partially disposed within the grounded cavity.

Abstract translation: 公开了用于离子注入机的端子绝缘的技术。 在一个特定的示例性实施例中，可以将技术实现为包括限定端子腔的端子结构的离子注入机。 离子注入机还可以包括限定接地腔的接地外壳，并且端子结构可以至少部分地设置在接地空腔内。 离子注入机还可以包括设置在端子结构的外部部分附近并且至少部分地设置在接地腔内的中间端子结构。

公开(公告)号：US07078710B2

公开(公告)日：2006-07-18

申请号：US10710051

申请日：2004-06-15

Applicant: Tushar Desai ,  Ellis C. Hayford ,  Nicholas Mone, Jr.

Inventor： Tushar Desai ,  Ellis C. Hayford ,  Nicholas Mone, Jr.

IPC: H01J37/36

CPC classification number: H01J37/02 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/16 ,  H01J2237/31701

Abstract: A method of reducing foreign material contamination of a substrate in an ion beam system and an ion beam system. The system, including: a vacuum chamber having an ion beam axis; a substrate chamber free to tilt about a tilt axis, the tilt axis orthogonal to and intersecting the ion beam axis; a flexible bellows connecting an opening in the substrate chamber and an opening in the vacuum chamber, both openings co-axially aligned with the ion beam axis, the bellows providing a vacuum seal between the substrate chamber and the vacuum chamber; and a hollow foreign material shield open at a top proximate to the vacuum chamber and a bottom proximate to the substrate chamber, the foreign material shield located between the ion beam axis and the flexible bellows, the top and bottom of the foreign material shield co-axially aligned with the ion beam axis.

Abstract translation: 一种减少离子束系统和离子束系统中的衬底的异物污染的方法。 该系统包括：具有离子束轴的真空室; 基板室可绕倾斜轴线自由倾斜，倾斜轴线与离子束轴线正交并与其相交; 连接基板室中的开口和真空室中的开口的柔性波纹管，两个开口与离子束轴线同轴对准，波纹管在基板室和真空室之间提供真空密封; 以及在靠近真空室的顶部开口的中空异物屏蔽件和靠近基板室的底部，位于离子束轴线和柔性波纹管之间的异物屏蔽层，异物屏蔽层的顶部和底部， 与离子束轴线轴向对准。

公开(公告)号：US20050274910A1

公开(公告)日：2005-12-15

申请号：US10710051

申请日：2004-06-15

Applicant: Tushar Desai ,  Ellis Hayford ,  Nicholas Mone

Inventor： Tushar Desai ,  Ellis Hayford ,  Nicholas Mone

IPC: H01J37/02 ,  H01J37/317

CPC classification number: H01J37/02 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/16 ,  H01J2237/31701

Abstract: A method of reducing foreign material contamination of a substrate in an ion beam system and an ion beam system. The system, including: a vacuum chamber having an ion beam axis; a substrate chamber free to tilt about a tilt axis, the tilt axis orthogonal to and intersecting the ion beam axis; a flexible bellows connecting an opening in the substrate chamber and an opening in the vacuum chamber, both openings co-axially aligned with the ion beam axis, the bellows providing a vacuum seal between the substrate chamber and the vacuum chamber; and a hollow foreign material shield open at a top proximate to the vacuum chamber and a bottom proximate to the substrate chamber, the foreign material shield located between the ion beam axis and the flexible bellows, the top and bottom of the foreign material shield co-axially aligned with the ion beam axis.

Abstract translation: 一种减少离子束系统和离子束系统中的衬底的异物污染的方法。 该系统包括：具有离子束轴的真空室; 基板室可绕倾斜轴线自由倾斜，倾斜轴线与离子束轴线正交并与其相交; 连接基板室中的开口和真空室中的开口的柔性波纹管，两个开口与离子束轴线同轴对准，波纹管在基板室和真空室之间提供真空密封; 以及在靠近真空室的顶部开口的中空异物屏蔽件和靠近基板室的底部，位于离子束轴线和柔性波纹管之间的异物屏蔽层，异物屏蔽层的顶部和底部， 与离子束轴线轴向对准。

公开(公告)号：US06452173B1

公开(公告)日：2002-09-17

申请号：US09315717

申请日：1999-05-20

Applicant: Masamichi Oi

Inventor： Masamichi Oi

IPC: H01J3700

CPC classification number: H01J37/141 ,  H01J2237/026

Abstract: A magnetism preventive cylinder is provided at a focused ion beam irradiating lens barrel tip, and an electricity preventive cylinder is mounted at an electron beam irradiating lens barrel tip. Also, the magnetism preventive cylinder is provided at the electron beam irradiating lens barrel tip in place of electricity preventive cylinder. The magnetism preventive cylinder at the focused ion beam irradiating lens barrel tip prevents a focused ion beam from being affected by a magnetic field from a focused ion beam. The electricity preventive cylinder at the electron beam irradiating lens barrel tip prevents against a magnetic field from the electron beam irradiating lens barrel tip.

Abstract translation: 在聚焦离子束照射透镜镜筒尖端处设置防磁圆筒，并且在电子束照射透镜镜筒尖端处安装防电缸。 另外，在电子束照射透镜筒端部设置防磁圆筒来代替防电压缸。 聚焦离子束照射透镜镜筒尖端处的防磁圆筒防止聚焦离子束受聚焦离子束的磁场的影响。 电子束照射透镜镜筒尖端处的防电压筒防止来自电子束照射透镜镜筒尖端的磁场。

公开(公告)号：US5591971A

公开(公告)日：1997-01-07

申请号：US529675

申请日：1995-09-18

Applicant: Arie Shahar ,  Nira Schwartz ,  Richard W. Woods

Inventor： Arie Shahar ,  Nira Schwartz ,  Richard W. Woods

IPC: H01J37/28 ,  H01J37/256 ,  G01N23/225

CPC classification number: H01J37/28 ,  H01J2237/026

Abstract: An electrically conductive, shielding mesh structure (320) is interposed between a scanning electron microscope (10) and a sample (110) being examined. This shield prevent electrical field (325) leakage from the microscope from reaching the sample (110) where it would otherwise interact with various sample compositions or structures unpredictably, causing uncertainty in the working and focal distances. The mesh (320) can be electrically biased and electrical field gradients can be introduced by applying different voltages to different wires (360, 510) in the mesh. Alternatively, the mesh (320) can operate magnetically and adjustable magnetic and electric fields and fields gradients can be utilized to maximize collection efficiency and minimize distortion of scanned image. The absence of the perturbing leakage field (325) at the sample enables the use of an optical autofocus system (630,640, 690, 700, 730, and 750), resulting in a high sample throughput rate. The components which comprise the autofocus system are symmetrically arranged to prevent astigmatic distortion of the electron beam. These components can be electrically biased, thus enhancing efficiency of the microscope's x-ray and electron detectors (170, 240, and 250).

Abstract translation: 在扫描电子显微镜（10）和正在检查的样品（110）之间插入导电屏蔽网状结构（320）。 该屏蔽防止电场（325）从显微镜泄漏到达样品（110），否则其将以不可预测的方式与各种样品组合物或结构相互作用，导致工作和焦距的不确定性。 网格（320）可以被电偏置，并且可以通过对网格中的不同的线（360,510）施加不同的电压来引入电场梯度。 或者，网格（320）可以磁性地操作，并且可以利用可调节的磁场和电场以及场梯度来最大化收集效率并最小化扫描图像的失真。 样品处的扰动泄漏场（325）不存在可以使用光学自动对焦系统（630,640,690,700,730和750），导致高的样品通过率。 构成自动对焦系统的部件对称地排列以防止电子束的象散变形。 这些组件可以被电偏置，从而提高显微镜的X射线和电子检测器（170,240和250）的效率。