Non-volatile memory device and method of operating
    11.
    发明授权
    Non-volatile memory device and method of operating 有权
    非易失性存储器件及其操作方法

    公开(公告)号:US08982620B2

    公开(公告)日:2015-03-17

    申请号:US14044892

    申请日:2013-10-03

    CPC classification number: G11C16/22 G06F12/0246

    Abstract: A method of operating a non-volatile memory includes; during power-on, reading control information from an information block and lock information from an additional information block, then upon determining that a secure block should be locked, generating a lock enable signal that inhibits access to data stored in the secure block, and a read-only enable signal that prevents change in the data stored in the additional information block.

    Abstract translation: 一种操作非易失性存储器的方法包括: 在上电期间,从信息块读取控制信息并从附加信息块中锁定信息,然后在确定应该锁定安全块时,产生禁止访问存储在安全块中的数据的锁定使能信号,以及 只读使能信号,防止存储在附加信息块中的数据发生变化。

    Electronic device and operation control method of electronic device

    公开(公告)号:US10861387B2

    公开(公告)日:2020-12-08

    申请号:US16320568

    申请日:2017-07-26

    Abstract: Various embodiments of the present invention relate to an electronic device and an operation control method of the electronic device, and the electronic device comprises an organic light-emitting diode (OLED) display panel including a plurality of sub pixels, a memory, and a processor, wherein the processor can be configured so as to confirm accumulated image data for each sub pixel of the display panel while a plurality of frames are displayed on the panel, generate a compensation image for compensating for a residual image generated on the display panel on the basis of the accumulated image data of each sub pixel when an event for residual image compensation occurs, and display the generated compensation image on the display panel.

    Methods of forming gates of semiconductor devices
    16.
    发明授权
    Methods of forming gates of semiconductor devices 有权
    形成半导体器件栅极的方法

    公开(公告)号:US08962415B2

    公开(公告)日:2015-02-24

    申请号:US14264622

    申请日:2014-04-29

    Abstract: Methods of forming gates of semiconductor devices are provided. The methods may include forming a first recess in a first substrate region having a first conductivity type and forming a second recess in a second substrate region having a second conductivity type. The methods may also include forming a high-k layer in the first and second recesses. The methods may further include providing a first metal on the high-k layer in the first and second substrate regions, the first metal being provided within the second recess. The methods may additionally include removing at least portions of the first metal from the second recess while protecting materials within the first recess from removal. The methods may also include, after removing at least portions of the first metal from the second recess, providing a second metal within the second recess.

    Abstract translation: 提供了形成半导体器件的栅极的方法。 所述方法可以包括在具有第一导电类型的第一衬底区域中形成第一凹槽,并在具有第二导电类型的第二衬底区域中形成第二凹部。 所述方法还可以包括在第一和第二凹部中形成高k层。 所述方法还可以包括在第一和第二衬底区域中的高k层上提供第一金属,第一金属设置在第二凹槽内。 所述方法还可以包括从第二凹部移除第一金属的至少一部分,同时保护第一凹槽内的材料不被去除。 所述方法还可以包括在从第二凹部去除第一金属的至少一部分之后,在第二凹部内提供第二金属。

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