公开(公告)号：US10971701B2

公开(公告)日：2021-04-06

申请号：US16695211

申请日：2019-11-26

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho Jung ,  Chaun-Gi Choi ,  Young-Sik Yoon ,  Joo-Hee Jeon ,  Hye-Young Park

IPC: H01L51/52 ,  H01L51/56 ,  H01L51/00 ,  H01L27/32

Abstract: A transparent organic light emitting display device may include a transparent base substrate, a semiconductor device disposed on the transparent base substrate, a display structure electrically connected to the semiconductor device, and a protection layer including a blue dye disposed on the display structure. The protection layer may improve the transparency of the transparent base substrate by calibrating discoloration of the transparent base substrate. Thus, the transparent display device including the protection layer may ensure an enhanced transparency. Further, the transparent display device may have an enhanced mechanical strength and an increased heat resistance because of the transparent base substrate.

公开(公告)号：US20200251679A1

公开(公告)日：2020-08-06

申请号：US16726074

申请日：2019-12-23

Applicant: Samsung Display Co., Ltd.

Inventor： Seung Hwa Ha ,  Seung-Ho Jung ,  Kyu Young Kim

IPC: H01L51/52 ,  H01L27/32

Abstract: A flexible display device including a display panel, a cover window disposed on the display panel, and a first adhesive layer disposed between the display panel and the cover window, in which the first adhesive layer includes a first pressure sensitive adhesive layer, a second pressure sensitive adhesive layer, and a first elastomer layer disposed between the first pressure sensitive adhesive layer and the second pressure sensitive adhesive layer.

公开(公告)号：US09564605B2

公开(公告)日：2017-02-07

申请号：US14678572

申请日：2015-04-03

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho Jung ,  Chaun-Gi Choi ,  Young-Sik Yoon ,  Joo-Hee Jeon

IPC: H01L29/08 ,  H01L35/24 ,  H01L51/00 ,  H01L27/32

CPC classification number: H01L51/0097 ,  H01L27/3246 ,  H01L27/326 ,  H01L51/0096 ,  H01L2227/323 ,  H01L2251/5323 ,  Y02E10/549 ,  Y02P70/521

Abstract: A transparent display device including a polymer substrate having colored particles distributed therein, a pixel circuit on the polymer substrate, a first electrode electrically connected to the pixel circuit, a display layer on the first electrode, and a second electrode facing the first electrode and covering the display layer.

Abstract translation: 一种透明显示装置，包括具有分散在其中的着色颗粒的聚合物基板，聚合物基板上的像素电路，电连接到像素电路的第一电极，第一电极上的显示层和面对第一电极的第二电极和覆盖物 显示层。

公开(公告)号：US09406785B2

公开(公告)日：2016-08-02

申请号：US14521043

申请日：2014-10-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Doo Hyoung Lee ,  Bo Sung Kim ,  Chan Woo Yang ,  Seung-Ho Jung ,  Yeon Taek Jeong ,  June Whan Choi ,  Tae-Young Choi

IPC: H01L21/441 ,  H01L21/02 ,  H01L21/385 ,  H01L29/66 ,  H01L29/786 ,  H01L21/477

CPC classification number: H01L29/66969 ,  H01L21/02565 ,  H01L21/02614 ,  H01L21/385 ,  H01L21/441 ,  H01L21/477 ,  H01L29/7869

Abstract: A thin film transistor includes a substrate, an oxide semiconductor layer that is disposed on the substrate, a gate electrode that overlaps with the oxide semiconductor layer, a gate insulating layer that is disposed between the oxide semiconductor layer and the gate electrode, and a source electrode and a drain electrode that at least partially overlap with the oxide semiconductor layer and are spaced from each other. The gate insulating layer includes an oxide including a first material. The oxide semiconductor layer includes an oxide which includes a same material as the first material and a second material, and the source electrode and the drain electrode include an oxide that includes a same material as the second material and a third material, and a grain boundary is not formed on an interface between at least one of the gate insulating layer and the oxide semiconductor layer or between the oxide semiconductor layer, and the source electrode and the drain electrode.

Abstract translation: 薄膜晶体管包括衬底，设置在衬底上的氧化物半导体层，与氧化物半导体层重叠的栅电极，设置在氧化物半导体层和栅电极之间的栅极绝缘层，以及源极 电极和与氧化物半导体层至少部分重叠并且彼此间隔开的漏电极。 栅极绝缘层包括包含第一材料的氧化物。 氧化物半导体层包括与第一材料相同的材料和第二材料的氧化物，源电极和漏极包括包含与第二材料相同的材料的氧化物和第三材料，以及晶界 不形成在栅极绝缘层和氧化物半导体层中的至少一个之间或氧化物半导体层以及源电极和漏电极之间的界面上。

公开(公告)号：US09012994B2

公开(公告)日：2015-04-21

申请号：US14012580

申请日：2013-08-28

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho Jung ,  Young Joo Choi ,  Joon Geol Kim ,  Kang Moon Jo ,  Sho Yeon Kim ,  Byung Hwan Chu ,  Woo Geun Lee ,  Woo-Seok Jeon

IPC: H01L27/12

CPC classification number: H01L27/124 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1248 ,  H01L27/1259 ,  H01L27/1262 ,  H01L27/1288

Abstract: A thin film transistor array panel is disclosed. The thin film transistor array panel may include a gate line disposed on a substrate and including a gate electrode, a semiconductor layer including an oxide semiconductor disposed on the substrate, a data wiring layer disposed on the substrate and including a data line crossing the gate line, a source electrode connected to the data line and a drain electrode facing the source electrode, a polymer layer covering the source electrode and the drain electrode, and a passivation layer disposed on the polymer layer. The data wiring layer may include copper or a copper alloy and the polymer layer may include fluorocarbon.

Abstract translation: 公开了薄膜晶体管阵列面板。 薄膜晶体管阵列面板可以包括设置在基板上并包括栅电极的栅极线，包括设置在基板上的氧化物半导体的半导体层，设置在基板上的数据布线层，并且包括与栅极线交叉的数据线 连接到数据线的源电极和面对源电极的漏电极，覆盖源电极和漏电极的聚合物层和设置在聚合物层上的钝化层。 数据布线层可以包括铜或铜合金，并且聚合物层可以包括碳氟化合物。

公开(公告)号：US08895977B2

公开(公告)日：2014-11-25

申请号：US13673195

申请日：2012-11-09

Applicant: Samsung Display Co., Ltd.

Inventor： Doo Hyoung Lee ,  Bo Sung Kim ,  Chan Woo Yang ,  Seung-Ho Jung ,  Yeon Taek Jeong ,  June Whan Choi ,  Tae-Young Choi

IPC: H01L21/786 ,  H01L29/786 ,  H01L21/385

CPC classification number: H01L29/66969 ,  H01L21/02565 ,  H01L21/02614 ,  H01L21/385 ,  H01L21/441 ,  H01L21/477 ,  H01L29/7869

Abstract: A thin film transistor includes a substrate, an oxide semiconductor layer that is disposed on the substrate, a gate electrode that overlaps with the oxide semiconductor layer, a gate insulating layer that is disposed between the oxide semiconductor layer and the gate electrode, and a source electrode and a drain electrode that at least partially overlap with the oxide semiconductor layer and are spaced from each other. The gate insulating layer includes an oxide including a first material. The oxide semiconductor layer includes an oxide which includes a same material as the first material and a second material, and the source electrode and the drain electrode include an oxide that includes a same material as the second material and a third material, and a grain boundary is not formed on an interface between at least one of the gate insulating layer and the oxide semiconductor layer or between the oxide semiconductor layer, and the source electrode and the drain electrode.

Abstract translation: 薄膜晶体管包括衬底，设置在衬底上的氧化物半导体层，与氧化物半导体层重叠的栅电极，设置在氧化物半导体层和栅电极之间的栅极绝缘层，以及源极 电极和与氧化物半导体层至少部分重叠并且彼此间隔开的漏电极。 栅极绝缘层包括包含第一材料的氧化物。 氧化物半导体层包括与第一材料相同的材料和第二材料的氧化物，源电极和漏极包括包含与第二材料相同的材料的氧化物和第三材料，以及晶界 不形成在栅极绝缘层和氧化物半导体层中的至少一个之间或氧化物半导体层以及源电极和漏电极之间的界面上。

公开(公告)号：US08853687B2

公开(公告)日：2014-10-07

申请号：US13679910

申请日：2012-11-16

Applicant: Samsung Display Co., Ltd.

Inventor： Doo Hyoung Lee ,  Chan Woo Yang ,  Seung-Ho Jung ,  Doo Na Kim ,  Bo Sung Kim ,  Eun Hye Park

IPC: H01L29/10 ,  H01L29/12 ,  H01L29/786 ,  H01L29/66 ,  H01B1/06

CPC classification number: H01L29/66969 ,  H01B1/06 ,  H01L21/02565 ,  H01L21/02628 ,  H01L29/7869

Abstract: A thin film transistor substrate according to an exemplary embodiment of the present invention includes a semiconductor layer including metal disposed on an insulating substrate, a gate electrode overlapping the semiconductor layer, and a source electrode and a drain electrode overlapping the semiconductor layer, wherein the metal in the semiconductor layer comprises indium (In), zinc (Zn), and tin (Sn), and a molar ratio ( R , R ⁡ [ mol ⁢ ⁢ % ] = [ In ] [ In + Zn + Sn ] × 100 ) of indium (In) to the metals in the semiconductor layer is less than about 20%, and more specifically, the molar ratio (R, ( R , R ⁡ [ mol ⁢ ⁢ % ] = [ In ] [ In + Zn + Sn ] / 100 ) of indium (In) of the metals in the semiconductor layer is about 5% to about 13%.

Abstract translation: 根据本发明的示例性实施例的薄膜晶体管基板包括：半导体层，包括设置在绝缘基板上的金属，与半导体层重叠的栅极电极以及与半导体层重叠的源电极和漏电极，其中金属 在半导体层中包含铟（In），锌（Zn）和锡（Sn），摩尔比（R，R⁡[mol⁢％] = [In] [In + Zn + Sn]×100） 对于半导体层中的金属，铟（In）的含量小于约20％，更具体地，摩尔比（R，（R，R⁡[mol⁢％] = [In] [In + Zn + Sn 半导体层中的金属的In（In）的比例为约5％〜13％。

公开(公告)号：US20130320327A1

公开(公告)日：2013-12-05

申请号：US13673195

申请日：2012-11-09

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Doo Hyoung LEE ,  Bo Sung Kim ,  Chan Woo Yang ,  Seung-Ho Jung ,  Yeon Taek Jeong ,  June Whan Choi ,  Tae-Young Choi

IPC: H01L29/786 ,  H01L21/385

CPC classification number: H01L29/66969 ,  H01L21/02565 ,  H01L21/02614 ,  H01L21/385 ,  H01L21/441 ,  H01L21/477 ,  H01L29/7869

Abstract: A thin film transistor includes a substrate, an oxide semiconductor layer that is disposed on the substrate, a gate electrode that overlaps with the oxide semiconductor layer, a gate insulating layer that is disposed between the oxide semiconductor layer and the gate electrode, and a source electrode and a drain electrode that at least partially overlap with the oxide semiconductor layer and are spaced from each other. The gate insulating layer includes an oxide including a first material. The oxide semiconductor layer includes an oxide which includes a same material as the first material and a second material, and the source electrode and the drain electrode include an oxide that includes a same material as the second material and a third material, and a grain boundary is not formed on an interface between at least one of the gate insulating layer and the oxide semiconductor layer or between the oxide semiconductor layer, and the source electrode and the drain electrode.

公开(公告)号：US11626461B2

公开(公告)日：2023-04-11

申请号：US17338577

申请日：2021-06-03

Applicant: Samsung Display Co., Ltd.

Inventor： Hye-Hyang Park ,  Joo-Hee Jeon ,  Seung-Ho Jung ,  Chaun-Gi Choi ,  Hyeon-Sik Kim ,  Hui-Won Yang ,  Eun-Young Lee

IPC: H01L27/32 ,  H01L51/00 ,  H01L51/52 ,  H01L29/786 ,  H01L27/12 ,  H01L29/51

Abstract: A display device may include a light emitting element, a buffer layer, a gate insulation layer, and a switching element. A refractive index of the gate insulation layer may be equal to a refractive index of the buffer layer. The switching element may be electrically connected to the light emitting element and may include an active layer and a gate electrode. The active layer may be positioned between the buffer layer and the gate insulation layer and may directly contact at least one of the buffer layer and the gate insulation layer. The gate insulation layer may be positioned between the active layer and the gate electrode and may directly contact at least one of the active layer and the gate electrode.

公开(公告)号：US11619968B2

公开(公告)日：2023-04-04

申请号：US17526919

申请日：2021-11-15

Applicant: Samsung Display Co., Ltd.

Inventor： Sangjae Kim ,  Seung-Ho Jung ,  In-Woo Jeong ,  Seunghwa Ha

IPC: G06F1/16 ,  H01L27/32

Abstract: A display device includes a first non-folding area, a second non-folding area, and a folding area, which are disposed in a first direction includes a display panel including first to third pixel areas, which are spaced apart from each other on a plane defined in the first direction and a second direction crossing the first direction and a window layer disposed on the display panel. The window layer includes a first rigid part, a second rigid part, and a first soft part, a first interface and a second interface overlaps at least one area of first to third pixel areas on the plane, and an absolute value of a difference in refractive index between the first rigid part and the first soft part is 0.02 or less, and an absolute value of a difference in refractive index between the second rigid part and the first soft part is 0.02 or less.