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    Thin film transistor array panel and method for manufacturing the same
    2.
    发明授权
    Thin film transistor array panel and method for manufacturing the same 有权
    薄膜晶体管阵列面板及其制造方法

    公开(公告)号：US09012994B2

    公开(公告)日：2015-04-21

    申请号：US14012580

    申请日：2013-08-28

    Applicant: Samsung Display Co., Ltd.

    Inventor： Seung-Ho Jung ,  Young Joo Choi ,  Joon Geol Kim ,  Kang Moon Jo ,  Sho Yeon Kim ,  Byung Hwan Chu ,  Woo Geun Lee ,  Woo-Seok Jeon

    IPC: H01L27/12

    CPC classification number: H01L27/124 ,  H01L27/1214 ,  H01L27/1225 ,  H01L27/1248 ,  H01L27/1259 ,  H01L27/1262 ,  H01L27/1288

    Abstract: A thin film transistor array panel is disclosed. The thin film transistor array panel may include a gate line disposed on a substrate and including a gate electrode, a semiconductor layer including an oxide semiconductor disposed on the substrate, a data wiring layer disposed on the substrate and including a data line crossing the gate line, a source electrode connected to the data line and a drain electrode facing the source electrode, a polymer layer covering the source electrode and the drain electrode, and a passivation layer disposed on the polymer layer. The data wiring layer may include copper or a copper alloy and the polymer layer may include fluorocarbon.

    Abstract translation: 公开了薄膜晶体管阵列面板。 薄膜晶体管阵列面板可以包括设置在基板上并包括栅电极的栅极线，包括设置在基板上的氧化物半导体的半导体层，设置在基板上的数据布线层，并且包括与栅极线交叉的数据线 连接到数据线的源电极和面对源电极的漏电极，覆盖源电极和漏电极的聚合物层和设置在聚合物层上的钝化层。 数据布线层可以包括铜或铜合金，并且聚合物层可以包括碳氟化合物。

    Display device with a storage capacitor including multiple dielectric constant layers
    3.
    发明授权
    Display device with a storage capacitor including multiple dielectric constant layers 有权

    公开(公告)号：US10825880B2

    公开(公告)日：2020-11-03

    申请号：US16143934

    申请日：2018-09-27

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jin Ho Hwang ,  Byeong-Beom Kim ,  Chul Min Bae ,  Woo-Seok Jeon

    IPC: H01L27/32 ,  G09G3/32 ,  G09G3/3225 ,  G09G3/3233

    Abstract: A display device includes: a substrate; a semiconductor on the substrate and including a driving channel; a first insulating layer on the semiconductor; a driving gate electrode on the first insulating layer and overlapping the driving channel; a second insulating layer on the driving gate electrode and the first insulating layer and including first and second dielectric constant layers, the second dielectric constant layer having a dielectric constant that is greater than that of the first dielectric constant layer; a storage electrode on the second insulating layer; a passivation layer covering the storage electrode and the second insulating layer; a pixel electrode on the passivation layer; an emission member on the pixel electrode; and a common electrode on the emission member, wherein the storage electrode overlaps the driving gate electrode, and wherein the storage electrode, the driving gate electrode and the second insulating layer therebetween form a storage capacitor.

    Organic light emitting display device having high dielectric constant insulation layer
    4.
    发明授权
    Organic light emitting display device having high dielectric constant insulation layer 有权

    公开(公告)号：US10573701B2

    公开(公告)日：2020-02-25

    申请号：US16185492

    申请日：2018-11-09

    Applicant: Samsung Display Co., Ltd.

    Inventor： Woo-Seok Jeon ,  Byeong-Beom Kim ,  Chulmin Bae ,  Jinho Hwang

    IPC: H01L27/32 ,  H01L27/12

    Abstract: An organic light emitting display device includes a substrate, an active layer, a gate electrode, a first high dielectric constant (hereinafter “high-k”) insulation structure, source and drain electrodes, and a light emitting structure. The active layer is disposed on the substrate. The gate electrode is disposed on the active layer. The first high-k insulation structure is disposed on the gate electrode and includes a carbon-doped first high-k insulation layer and a first ammonia layer on the carbon-doped first high-k insulation layer. The source and drain electrodes are disposed on the first high-k insulation structure and constitute a semiconductor element together with the active layer and the gate electrode. The light emitting structure is disposed on the source and drain electrodes.

    Method of a fabricating display substrate and method of fabricating a display device using the same
    5.
    发明授权
    Method of a fabricating display substrate and method of fabricating a display device using the same 有权
    制造显示基板的方法和使用其制造显示装置的方法

    公开(公告)号：US09166203B2

    公开(公告)日：2015-10-20

    申请号：US14299168

    申请日：2014-06-09

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Woo-Seok Jeon

    IPC: H01L21/00 ,  H01L51/56 ,  H01L27/32 ,  H01L27/12 ,  H01L21/4763 ,  H01L29/66 ,  H01L21/033

    CPC classification number: H01L51/56 ,  H01L21/0337 ,  H01L21/32139 ,  H01L21/467 ,  H01L21/47635 ,  H01L27/1288 ,  H01L27/3232 ,  H01L29/66765 ,  H01L29/66969 ,  H01L2227/323

    Abstract: A method of fabricating a display substrate includes forming a gate electrode on a substrate, forming a gate insulating layer to cover the gate electrode, forming an active layer on the gate insulating layer, forming a metal layer on the active layer, forming a first mask pattern on the metal layer to face a first region of the active layer, forming a second mask pattern on the metal layer to face a second region and a third region of the active layer, etching the metal layer and the active layer using the first and second mask patterns as an etch mask to form a metal pattern and an active pattern, removing the first mask pattern, and etching the metal pattern using the second mask pattern as an etch mask to form a source electrode and a drain electrode.

    Abstract translation: 制造显示基板的方法包括在基板上形成栅电极，形成栅极绝缘层以覆盖栅电极，在栅极绝缘层上形成有源层，在有源层上形成金属层，形成第一掩模 在所述金属层上面对所述有源层的第一区域，在所述金属层上形成面对所述有源层的第二区域和第三区域的第二掩模图案，使用所述第一和第二区域蚀刻所述金属层和所述有源层， 第二掩模图案作为蚀刻掩模以形成金属图案和活性图案，去除第一掩模图案，并且使用第二掩模图案蚀刻金属图案作为蚀刻掩模以形成源电极和漏电极。

    Method of manufacturing photo sensor
    6.
    发明授权
    Method of manufacturing photo sensor 有权

    公开(公告)号：US11502216B2

    公开(公告)日：2022-11-15

    申请号：US16887290

    申请日：2020-05-29

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Woo-Seok Jeon ,  Kwang Hyun Kim ,  Heon Sik Ha

    IPC: H01L31/18 ,  H01L27/146 ,  H01L31/0224 ,  H01L31/105

    Abstract: A method of manufacturing a photo sensor includes forming a first conductive layer on a substrate, the first conductive layer including a metal layer and a transparent conductive oxide layer formed on the metal layer, forming a photoconductive layer on the first conductive layer, forming a second conductive layer on the photoconductive layer, forming a first photoresist pattern on the second conductive layer, etching the second conductive layer using the first photoresist pattern as an etch mask to form a second electrode, deforming the first photoresist pattern to form a second photoresist pattern, and etching the photoconductive layer and the first conductive layer using the second photoresist pattern to form a photoconductive pattern and a first electrode, respectively.

    Method for forming light emitting element pattern and display device using the same
    8.
    发明授权
    Method for forming light emitting element pattern and display device using the same 有权

    公开(公告)号：US11094760B2

    公开(公告)日：2021-08-17

    申请号：US16536104

    申请日：2019-08-08

    Applicant: Samsung Display Co., Ltd.

    Inventor： Woo-Seok Jeon

    IPC: H01L27/32 ,  H01L51/00 ,  H01L51/56 ,  H01L51/52

    Abstract: A method for forming a light emitting element pattern according to an embodiment of the inventive concept includes forming a pattern layer having an opening on a target material, forming a light emitting element pattern on the target material in correspondence to the opening, and removing the pattern layer. Here, the pattern layer includes a first pattern layer disposed on the target material, a second pattern layer disposed on the first pattern layer, and a third pattern layer disposed on the second pattern layer. The second pattern layer has an undercut portion recessed from edges of the third pattern layer.

    METHOD OF A FABRICATING DISPLAY SUBSTRATE AND METHOD OF FABRICATING A DISPLAY DEVICE USING THE SAME
    10.
    发明申请
    METHOD OF A FABRICATING DISPLAY SUBSTRATE AND METHOD OF FABRICATING A DISPLAY DEVICE USING THE SAME 有权
    制造显示器基板的方法和使用其制造显示器件的方法

    公开(公告)号：US20150171377A1

    公开(公告)日：2015-06-18

    申请号：US14299168

    申请日：2014-06-09

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Woo-Seok Jeon

    IPC: H01L51/56 ,  H01L21/033 ,  H01L21/4763 ,  H01L29/66 ,  H01L27/32 ,  H01L27/12

    CPC classification number: H01L51/56 ,  H01L21/0337 ,  H01L21/32139 ,  H01L21/467 ,  H01L21/47635 ,  H01L27/1288 ,  H01L27/3232 ,  H01L29/66765 ,  H01L29/66969 ,  H01L2227/323

    Abstract: A method of fabricating a display substrate includes forming a gate electrode on a substrate, forming a gate insulating layer to cover the gate electrode, forming an active layer on the gate insulating layer, forming a metal layer on the active layer, forming a first mask pattern on the metal layer to face a first region of the active layer, forming a second mask pattern on the metal layer to face a second region and a third region of the active layer, etching the metal layer and the active layer using the first and second mask patterns as an etch mask to form a metal pattern and an active pattern, removing the first mask pattern, and etching the metal pattern using the second mask pattern as an etch mask to form a source electrode and a drain electrode.

    Abstract translation: 制造显示基板的方法包括在基板上形成栅电极，形成栅极绝缘层以覆盖栅电极，在栅极绝缘层上形成有源层，在有源层上形成金属层，形成第一掩模 在所述金属层上面对所述有源层的第一区域，在所述金属层上形成面对所述有源层的第二区域和第三区域的第二掩模图案，使用所述第一和第二区域蚀刻所述金属层和所述有源层， 第二掩模图案作为蚀刻掩模以形成金属图案和活性图案，去除第一掩模图案，并且使用第二掩模图案蚀刻金属图案作为蚀刻掩模以形成源电极和漏电极。

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