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公开(公告)号：US11692953B2
公开(公告)日：2023-07-04
申请号：US17445721
申请日：2021-08-23
Applicant: NOVA LTD.
Inventor： Gilad Barak
IPC: G01N23/2055 , H01L21/66 , G06T7/00 , G06T5/00 , G01N23/201 , G01N23/20 , G01N23/207
CPC classification number: G01N23/2055 , G01N23/20 , G01N23/201 , G06T5/002 , G06T7/0004 , H01L22/12 , G01N23/207 , G01N2223/401 , G01N2223/6116 , G06T2207/10116 , G06T2207/20224 , G06T2207/30148
Abstract: A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.
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公开(公告)号：US20220326159A1
公开(公告)日：2022-10-13
申请号：US17694782
申请日：2022-03-15
Applicant: NOVA LTD.
Inventor： Gilad Barak , Yanir HAINICK , Yonatan OREN , Vladimir Machavariani
Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.
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公开(公告)号：US11150190B2
公开(公告)日：2021-10-19
申请号：US16945975
申请日：2020-08-03
Applicant: NOVA LTD.
Inventor： Gilad Barak , Yanir Hainick , Yonatan Oren
Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.
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公开(公告)号：US12196691B2
公开(公告)日：2025-01-14
申请号：US18346778
申请日：2023-07-03
Applicant: NOVA LTD.
Inventor： Gilad Barak
IPC: G01N23/20 , G01N23/201 , G01N23/2055 , G06T5/70 , G06T7/00 , H01L21/66 , G01N23/207
Abstract: A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.
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公开(公告)号：US12066385B2
公开(公告)日：2024-08-20
申请号：US17694782
申请日：2022-03-15
Applicant: NOVA LTD.
Inventor： Gilad Barak , Yanir Hainick , Yonatan Oren , Vladimir Machavariani
CPC classification number: G01N21/65 , G01B11/0666 , G01L1/00 , G01L1/24 , G01N21/01 , G01N21/658 , G01N21/9501 , G03F7/70625 , H01L22/12 , G01B2210/56
Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.
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Patent Agency Ranking
公开(公告)号：US11885737B2
公开(公告)日：2024-01-30
申请号：US17135924
申请日：2020-12-28
Applicant: NOVA LTD.
Inventor： Dror Shafir , Gilad Barak , Shay Wolfling , Michal Haim Yachini , Matthew Sendelbach , Cornel Bozdog
CPC classification number: G01N21/21 , G01N21/211 , G01N2021/4792 , G01N2201/061 , G01N2201/0683
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号：US11740183B2
公开(公告)日：2023-08-29
申请号：US17759031
申请日：2020-11-24
Applicant: NOVA LTD.
Inventor： Elad Schleifer , Yonatan Oren , Amir Shayari , Eyal Hollander , Valery Deich , Shimon Yalov , Gilad Barak
CPC classification number: G01N21/65 , G01J3/0205 , G01J3/027 , G01J3/4412 , G01N2201/0636 , G01N2201/06113
Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.
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公开(公告)号：US11415519B2
公开(公告)日：2022-08-16
申请号：US17020587
申请日：2020-09-14
Applicant: NOVA LTD.
Inventor： Eyal Hollander , Gilad Barak , Elad Schleifer , Yonatan Oren , Amir Shayari
Abstract: A method, a system, and a non-transitory computer readable medium for Raman spectroscopy. The method may include determining first acquisition parameters of a Raman spectroscope to provide a first acquisition set-up, the determining is based on at least one expected radiation pattern to be detected by a sensor of the Raman spectroscope as a result of an illumination of a first area of a sample, the first area comprises a first nano-scale structure, wherein at least a part of the at least one expected radiation pattern is indicative of at least one property of interest of the first nano-scale structure of the sample; wherein the first acquisition parameters belong to a group of acquisition parameters; setting the Raman spectroscope according to the first acquisition set-up; and acquiring at least one first Raman spectrum of the first nano-scale structure of the sample, while being set according to the first acquisition set-up
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公开(公告)号：US11143601B2
公开(公告)日：2021-10-12
申请号：US16558212
申请日：2019-09-02
Applicant: NOVA LTD.
Inventor： Gilad Barak , Oded Cohen , Igor Turovets
IPC: G01N21/956 , H01L21/66 , G03F7/20 , G01N21/88 , G01N21/95
Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.
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公开(公告)号：US20250116605A1
公开(公告)日：2025-04-10
申请号：US18920791
申请日：2024-10-18
Applicant: NOVA LTD.
Inventor： Eyal Hollander , Gilad Barak , Elad Schleifer , Yonatan OREN , Amir Shayari
Abstract: An optical measurement system, the optical measurement system comprises optics, wherein the optics include a collection path and an illumination path and an objective lens. The optics is configured to acquire Raman spectrums of one or more structural elements located at a measurement site of the sample while being set-up to apply one or more optics parameters that comprise an illumination angle out of a set of multiple illumination angles that correspond to a numerical aperture of the objective lens. Each of the one or more structural elements has a dimension that ranges between one tenth of nanometer to one hundred microns; an optical spectrometer; a Raman detector that is downstream to the optical spectrometer; and a control unit that is configured to determine an expected radiation pattern to be detected by the Raman detector when the optics are set-up to apply the one or more optics parameters.
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