公开(公告)号：US12152869B2

公开(公告)日：2024-11-26

申请号：US17453338

申请日：2021-11-02

Applicant: NOVA LTD.

Inventor： Boaz Brill ,  Boris Sherman ,  Igor Turovets

IPC: G01B11/02 ,  G01N21/95 ,  G03F7/00 ,  H01L21/66

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

公开(公告)号：US11143601B2

公开(公告)日：2021-10-12

申请号：US16558212

申请日：2019-09-02

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Oded Cohen ,  Igor Turovets

IPC: G01N21/956 ,  H01L21/66 ,  G03F7/20 ,  G01N21/88 ,  G01N21/95

Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.

公开(公告)号：US12165023B2

公开(公告)日：2024-12-10

申请号：US17904872

申请日：2021-02-23

Applicant: NOVA LTD. ,  INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Dexin Kong ,  Daniel Schmidt ,  Aron J. Cepler ,  Marjorie Cheng ,  Roy Koret ,  Igor Turovets

IPC: G06N20/00 ,  G01J3/28

Abstract: A method, a system, and a non-transitory computer readable medium for measuring a local critical dimension uniformity of an array of two-dimensional structural elements, the method may include obtaining an acquired optical spectrometry spectrum of the array; feeding the acquired optical spectrometry spectrum of the array to a trained machine learning process, wherein the trained machine learning process is trained to map an optical spectrometry spectrum to an average critical dimension (CD) and a local critical dimension uniformity (LCDU); and outputting, by the trained machine learning process, the average CD and the LCDU of the array.

公开(公告)号：US20220163320A1

公开(公告)日：2022-05-26

申请号：US17453338

申请日：2021-11-02

Applicant: NOVA LTD.

Inventor： Boaz Brill ,  Boris Sherman ,  Igor Turovets

IPC: G01B11/02 ,  G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

公开(公告)号：US11639901B2

公开(公告)日：2023-05-02

申请号：US17498013

申请日：2021-10-11

Applicant: NOVA LTD

Inventor： Gilad Barak ,  Oded Cohen ,  Igor Turovets

IPC: G01N21/956 ,  H01L21/66 ,  G03F7/20 ,  G01N21/88 ,  G01N21/95

Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure having a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.

公开(公告)号：US11335612B2

公开(公告)日：2022-05-17

申请号：US16488967

申请日：2018-02-27

Applicant: NOVA LTD.

Inventor： Igor Turovets

IPC: H01L21/66 ,  G01B11/06 ,  G01B11/26 ,  G01N21/47 ,  G01R31/28 ,  G11C29/38

Abstract: A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.