公开(公告)号：US20250123210A1

公开(公告)日：2025-04-17

申请号：US18810435

申请日：2024-08-20

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Yanir HAINICK ,  Yonatan OREN ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/95 ,  G03F7/00 ,  H01L21/66

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US11275027B2

公开(公告)日：2022-03-15

申请号：US16792937

申请日：2020-02-18

Applicant: NOVA LTD

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US20240068964A1

公开(公告)日：2024-02-29

申请号：US18260036

申请日：2021-12-30

Applicant: NOVA LTD.

Inventor： Shahar Gov ,  Daniel Kandel ,  Heath POIS ,  Parker Lund ,  Michal Haim YACHINI ,  Vladimir Machavariani

IPC: G01N23/20

CPC classification number: G01N23/20

Abstract: A method, a system, and a non-transitory computer readable medium for evaluating x-ray signals. The method may include calculating an estimated field for each of multiple non-perturbed objects, the multiple non-perturbed objects represent perturbances of the perturbed object; the perturbances are of an order of a wavelength of the non-diffused x-ray signals; and evaluating the non-diffused x-ray signals based on the field of the multiple non-perturbed objects.

公开(公告)号：US20220326159A1

公开(公告)日：2022-10-13

申请号：US17694782

申请日：2022-03-15

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Yanir HAINICK ,  Yonatan OREN ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US12066385B2

公开(公告)日：2024-08-20

申请号：US17694782

申请日：2022-03-15

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/95 ,  G03F7/00 ,  H01L21/66

CPC classification number: G01N21/65 ,  G01B11/0666 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/658 ,  G01N21/9501 ,  G03F7/70625 ,  H01L22/12 ,  G01B2210/56

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US11710616B2

公开(公告)日：2023-07-25

申请号：US17722421

申请日：2022-04-18

Applicant: NOVA LTD

Inventor： Vladimir Machavariani ,  Michael Shifrin ,  Daniel Kandel ,  Victor Kucherov ,  Igor Ziselman ,  Ronen Urenski ,  Matthew Sendelbach

IPC: H01J37/26 ,  G06T7/00 ,  G06T7/60 ,  H01J37/22 ,  G06T15/20 ,  G06T7/246

CPC classification number: H01J37/26 ,  G06T7/0006 ,  G06T7/0008 ,  G06T7/251 ,  G06T7/60 ,  G06T15/205 ,  H01J37/222 ,  G06T2207/10061 ,  G06T2207/20076 ,  H01J2237/221 ,  H01J2237/24592

Abstract: A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.

公开(公告)号：US11450541B2

公开(公告)日：2022-09-20

申请号：US16650405

申请日：2018-08-29

Applicant: NOVA LTD.

Inventor： Vladimir Machavariani ,  Michael Shifrin ,  Daniel Kandel ,  Victor Kucherov ,  Igor Ziselman ,  Ronen Urenski ,  Matthew Sendelbach

IPC: H01L21/67 ,  G01B15/02 ,  G05B13/04 ,  G01N23/04 ,  G01N23/06

Abstract: A metrology method for use in determining one or more parameters of a patterned structure, the method including providing raw measured TEM image data, TEMmeas, data indicative of a TEM measurement mode, and predetermined simulated TEM image data including data indicative of one or more simulated TEM images of a structure similar to the patterned structure under measurements and a simulated weight map including weights assigned to different regions in the simulated TEM image corresponding to different features of the patterned structure, performing a fitting procedure between the raw measured TEM image data and the predetermined simulated TEM image data and determining one or more parameters of the structure from the simulated TEM image data corresponding to a best fit condition.

公开(公告)号：US11309162B2

公开(公告)日：2022-04-19

申请号：US17170938

申请日：2021-02-09

Applicant: NOVA LTD.

Inventor： Vladimir Machavariani ,  Michael Shifrin ,  Daniel Kandel ,  Victor Kucherov ,  Igor Ziselman ,  Ronen Urenski ,  Matthew Sendelbach

IPC: H01J37/26 ,  G06T7/00 ,  G06T7/60 ,  H01J37/22 ,  G06T15/20 ,  G06T17/05 ,  G06T7/246 ,  G06T19/00

Abstract: A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.