公开(公告)号：US11366398B2

公开(公告)日：2022-06-21

申请号：US17254357

申请日：2019-07-18

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Michael Chemama ,  Smadar Ferber ,  Yanir Hainick ,  Boris Levant ,  Ze'Ev Lindenfeld ,  Dror Shafir ,  Yuri Shirman ,  Elad Schleifer

IPC: G03F7/20 ,  G01B11/06

Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.

公开(公告)号：US11275027B2

公开(公告)日：2022-03-15

申请号：US16792937

申请日：2020-02-18

Applicant: NOVA LTD

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US12025560B2

公开(公告)日：2024-07-02

申请号：US17504547

申请日：2021-10-19

Applicant: NOVA LTD

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren

IPC: G01N21/65 ,  G01B11/06 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/95 ,  G03F7/00 ,  H01L21/66

CPC classification number: G01N21/65 ,  G01B11/0666 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/658 ,  G01N21/9501 ,  G03F7/70625 ,  H01L22/12 ,  G01B2210/56

Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.

公开(公告)号：US11150190B2

公开(公告)日：2021-10-19

申请号：US16945975

申请日：2020-08-03

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.

公开(公告)号：US12066385B2

公开(公告)日：2024-08-20

申请号：US17694782

申请日：2022-03-15

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren ,  Vladimir Machavariani

IPC: G01N21/65 ,  G01B11/06 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/95 ,  G03F7/00 ,  H01L21/66

CPC classification number: G01N21/65 ,  G01B11/0666 ,  G01L1/00 ,  G01L1/24 ,  G01N21/01 ,  G01N21/658 ,  G01N21/9501 ,  G03F7/70625 ,  H01L22/12 ,  G01B2210/56

Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.

公开(公告)号：US11946875B2

公开(公告)日：2024-04-02

申请号：US17935930

申请日：2022-09-27

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01N21/956 ,  G01N21/95 ,  G03F7/00

CPC classification number: G01N21/956 ,  G01N21/9501 ,  G03F7/70616 ,  G03F7/70625 ,  G01B2210/56

Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US11460415B2

公开(公告)日：2022-10-04

申请号：US16882784

申请日：2020-05-26

Applicant: NOVA LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01N21/956 ,  G01N21/95 ,  G03F7/20

Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.