公开(公告)号：US20150136995A1

公开(公告)日：2015-05-21

申请号：US14541233

申请日：2014-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Willem Henk URBANUS

IPC: G21K1/02 ,  G21K5/04 ,  H01J37/30

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to a collimator electrode stack (70), comprising: at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160).The invention further relates to a method of operating a charged particle beam generator.

Abstract translation: 本发明涉及一种准直电极堆叠（70），包括：用于沿着光轴（A）准直带电粒子束的至少三个准直器电极（71-80），其中每个准直器电极包括具有电极孔 允许通过所述带电粒子束，其中所述电极体沿着与所述光轴基本平行的轴向方向（Z）间隔开，并且其中所述电极孔沿着所述光轴同轴对准; 以及设置在每对相邻的准直器电极之间并由电绝缘材料制成的多个间隔结构（89），用于沿着轴向将准直器电极定位在预定距离。 每个准直器电极（71-80）电连接到单独的电压输出（151-160）。 本发明还涉及一种操作带电粒子束发生器的方法。

公开(公告)号：US20140264086A1

公开(公告)日：2014-09-18

申请号：US14287234

申请日：2014-05-27

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Teunis VAN DE PEUT ,  Marco Jan-Jaco WIELAND

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70475 ,  G06T1/20 ,  G06T1/60 ,  H01J37/045 ,  H01J37/3002 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/3175 ,  H01J2237/31761 ,  H01J2237/31764 ,  H04N1/405

Abstract: A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing the wafer, the electron optical column including a beamlet blanker array for switching the beamlets on or off, a data path for transmitting beamlet control data for control of the switching of the beamlets, and a wafer positioning system for moving the wafer under the electron optical column in a scan direction. The wafer positioning system is provided with synchronization signals from the data path to align the wafer with the electron beams from the electron-optical column. The data path further comprises one or more processing units for generating the beamlet control data and one or more transmission channels for transmitting the beamlet control data to the beamlet blanker array.

Abstract translation: 一种用于根据图案数据曝光晶片的带电粒子光刻系统。 该系统包括用于产生用于暴露晶片的多个电子子束的电子光学柱，该电子光学柱包括用于开启或关闭子束的子束遮蔽器阵列，用于发射用于控制切换的子束控制数据的数据路径 子束，以及用于在扫描方向上移动电子光学柱下的晶片的晶片定位系统。 晶圆定位系统具有来自数据通路的同步信号，以将晶片与来自电子 - 光学柱的电子束对准。 数据路径还包括用于产生子束控制数据的一个或多个处理单元和用于将子束控制数据发送到子束消隐器阵列的一个或多个传输信道。

公开(公告)号：US20140042334A1

公开(公告)日：2014-02-13

申请号：US13935602

申请日：2013-07-05

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00

Abstract: The invention relates to a method of exposing a target by means of a plurality of beamlets. First, a plurality of beamlets is provided. The beamlets are arranged in an array. Furthermore, a target to be exposed is provided. Subsequently, relative movement in a first direction between the plurality of beamlets and the target is created. Finally, the plurality of beamlets is moved in a second direction, such that each beamlet exposes a plurality of scan lines on the target. The relative movement in the first direction and the movement of the plurality of beamlets in the second direction are such that the distance between adjacent scan lines exposed by the plurality of beamlets is smaller than a projection pitch Pproj,X in the first direction between beamlets of the plurality of beamlets in the array.

Abstract translation: 本发明涉及通过多个子束曝光目标的方法。 首先，提供多个子束。 子束排列成阵列。 此外，提供要暴露的目标。 随后，产生在多个子束与目标之间的第一方向的相对运动。 最后，多个子束在第二方向上移动，使得每个子束在目标上露出多条扫描线。 第一方向上的相对移动和多个子束在第二方向上的移动使得由多个子束暴露的相邻扫描线之间的距离小于第一方向上的投影间距Pproj，X在子束之间的第一方向上 阵列中的多个子束。

公开(公告)号：US20140014850A1

公开(公告)日：2014-01-16

申请号：US13937321

申请日：2013-07-09

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Remco JAGER ,  Alexander Hendrik Vincent VAN VEEN ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.