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11.发明申请LIGHT MODULATION METHOD, LIGHT MODULATION PROGRAM, LIGHT MODULATION DEVICE, AND ILLUMINATION DEVICE 审中-公开光调制方法，光调制程序，调光装置和照明装置公开(公告)号：US20150185523A1
公开(公告)日：2015-07-02
申请号：US14416705
申请日：2013-07-09
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02F1/13306 , G02F1/1313 , G03H1/2294 , G03H2001/0224 , G03H2225/32
Abstract: A light modulation device includes a phase-modulation type spatial light modulator having a plurality of two-dimensionally arrayed pixels and modulating a phase of input light for each pixel with a modulation pattern, a modulation pattern setting unit setting a target modulation pattern for modulating the phase of the light, a correction coefficient setting unit setting a correction coefficient α of α≧1 according to pixel structure characteristics of the spatial light modulator and pattern characteristics of the target modulation pattern, and a modulation pattern correction unit determining a corrected modulation pattern to be presented on the plurality of pixels of the spatial light modulator by multiplying the target modulation pattern by the correction coefficient α.
Abstract translation: 光调制装置包括具有多个二维排列像素的相位调制型空间光调制器，并且以调制图案调制每个像素的输入光的相位;调制图案设定单元，设定用于调制 光的相位，校正系数设定单元，根据空间光调制器的像素结构特性和目标调制图案的图案特性，设定α≥1的校正系数α，以及将校正后的调制图案确定为 通过将目标调制图案乘以校正系数α而呈现在空间光调制器的多个像素上。
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公开(公告)号：US09007286B2
公开(公告)日：2015-04-14
申请号：US14045513
申请日：2013-10-03
Applicant: Hamamatsu Photonics K.K.
Inventor： Naoya Matsumoto , Norihiro Fukuchi , Takashi Inoue , Yasunori Igasaki
IPC: G09G3/36 , G02F1/133 , G09G3/20 , G02F1/1362
CPC classification number: G02F1/13318 , G02F1/136277 , G02F2203/50 , G09G3/2092 , G09G3/3611 , G09G2300/0491 , G09G2320/02 , G09G2320/0285
Abstract: The present invention relates to a phase modulating apparatus capable of highly accurately and easily correcting the phase modulation characteristic of a reflective electric address spatial light modulator even when a condition of input light is changed. In the LCOS phase modulating apparatus, an input unit inputs the condition of the input light, and a processing unit sets an input value for each pixel. A correction value deriving unit determines a correction condition according to the condition of the input light. A control input value converting unit converts the input value set for each pixel into a corrected input value based on the correction condition. An LUT processing unit converts the corrected input value into a voltage value, and drives each pixel by using a drive voltage equivalent to the converted voltage value.
Abstract translation: 本发明涉及即使当输入光的条件改变时也能高精度地且容易地校正反射式电地址空间光调制器的相位调制特性的相位调制装置。 在LCOS相位调制装置中，输入单元输入输入光的条件，并且处理单元设置每个像素的输入值。 校正值导出单元根据输入光的条件来确定校正条件。 控制输入值转换单元基于校正条件将针对每个像素设置的输入值转换为校正输入值。 LUT处理单元将校正的输入值转换为电压值，并且通过使用与转换的电压值相当的驱动电压驱动每个像素。
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公开(公告)号：US09001411B2
公开(公告)日：2015-04-07
申请号：US13871396
申请日：2013-04-26
Applicant: Hamamatsu Photonics K.K.
Inventor： Naoya Matsumoto , Taro Ando , Takashi Inoue , Yoshiyuki Ohtake
CPC classification number: G02B26/06 , G02B21/086 , G02B26/0808 , G02B27/4205 , G02F2203/12
Abstract: A light control device 1 includes a light source 10, a prism 20, a spatial light modulator 30, a drive unit 31, a control unit 32, a lens 41, an aperture 42, and a lens 43. The spatial light modulator 30 is a phase modulating spatial light modulator, includes a plurality of two-dimensionally arrayed pixels, is capable of phase modulation in each of these pixels in a range of 4π or more, and presents a phase pattern to modulate the phase of light in each of the pixels. This phase pattern is produced by superimposing a blazed grating pattern for light diffraction and a phase pattern having a predetermined phase modulation distribution, and with a phase modulation range of 2π or more.
Abstract translation: 光控制装置1包括光源10，棱镜20，空间光调制器30，驱动单元31，控制单元32，透镜41，孔42和透镜43.空间光调制器30是 包括多个二维阵列像素的相位调制空间光调制器能够在4＆pgr的范围内的这些像素中的每一个相位调制; 或更多，并且呈现相位图案以调制每个像素中的光的相位。 该相位图案通过叠加用于光衍射的闪耀光栅图案和具有预定相位调制分布的相位图案，并且相位调制范围为2＆amp; pgr; 或者更多。
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14.发明授权公开(公告)号：US11960317B2
公开(公告)日：2024-04-16
申请号：US16276767
申请日：2019-02-15
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Koji Takahashi , Koyo Watanabe , Takashi Inoue
CPC classification number: G06F1/022 , G01J5/0831 , G03H1/16 , G03H1/2294 , G06F17/10 , G06G7/19 , G01J2003/1282 , G03H2223/23
Abstract: An intensity spectrum designing unit of a data generating device includes an initial value setting unit that sets a plurality of objects of a first generation of an intensity spectrum function A(ω) and a phase spectrum function Ψ(ω), an evaluation value calculating unit that calculates an evaluation value for each of a plurality of objects of an n-th generation, an object selecting unit that selects two or more objects used for generating a plurality of objects of an (n+1)-th generation among objects of the n-th generation on the basis of superiority of the evaluation value, and a next-generation generating unit that generates a plurality of objects of the (n+1)-th generation on the basis of the selected two or more objects. The evaluation value calculating unit, the object selecting unit, and the next-generation generating unit repeat processes while 1 is added to n until a predetermined condition is satisfied.
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公开(公告)号：US10218141B2
公开(公告)日：2019-02-26
申请号：US15573935
申请日：2016-05-11
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Koyo Watanabe , Takashi Inoue , Koji Takahashi
Abstract: An iterative Fourier transform unit in a modulation pattern calculation apparatus performs a Fourier transform on a waveform function including an intensity spectrum function and a phase spectrum function, performs a replacement of a temporal intensity waveform function based on a desired waveform after the Fourier transform, and then performs an inverse Fourier transform. The iterative Fourier transform unit performs the replacement using a result of multiplying a function representing the desired waveform by a coefficient, and the coefficient has a value in which a difference between the function after the multiplication and the temporal intensity waveform function after the Fourier transform is smaller than a difference before the multiplication of the coefficient.
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Patent Agency Ranking
公开(公告)号：US10192502B2
公开(公告)日：2019-01-29
申请号：US14885718
申请日：2015-10-16
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Norihiro Fukuchi , Yuji Kobayashi , Tsutomu Hara
Abstract: In an apparatus for modulating light, an spatial light modulator includes a plurality of pixels and configured to modulate input light in response to a drive voltage for each of the pixels. An input value setting unit is configured to set an input value for the each of pixels. The input value is a digital value, an entire gray level of the digital value is “N”, and “N” is a natural number. A converting unit is configured to convert the input value to a control value. A control value is a digital value, an entire gray level of the control value is “M”, and “M” is a natural number greater than “N”. A driving unit is configured to convert the control value to a voltage value and drive the each of the pixels in response to the drive voltage corresponding to the voltage value.
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公开(公告)号：US10067401B2
公开(公告)日：2018-09-04
申请号：US14395167
申请日：2013-04-18
Applicant: Hamamatsu Photonics K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02F1/29 , G02B21/16 , G02B26/06 , G02B26/0825 , G02B26/0875 , G02B27/0927 , G02B27/0938 , G02B27/56 , G02F2001/294
Abstract: A beam expander includes a first lens unit including one of an SLM or a VFL, a second lens unit being optically coupled to the first lens unit and including one of an SLM or a VFL, and a control unit controlling focal lengths of the first and second lens units. A distance between the first and second lens units is invariable. The control unit controls the focal lengths of the first and second lens units such that a light diameter D1 of light input to the first lens unit and a light diameter D2 of light output from the second lens unit are different from each other.
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18.发明授权Adjustment method for adaptive optics system, adaptive optics system, and storage medium storing program for adaptive optics system 有权自适应光学系统的调整方法，自适应光学系统和自适应光学系统的存储介质存储程序公开(公告)号：US09594245B2
公开(公告)日：2017-03-14
申请号：US14895588
申请日：2014-05-29
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Hongxin Huang , Takashi Inoue
CPC classification number: G02B27/0068 , G01J9/00 , G01M11/02 , G02B26/06 , G02F1/01 , G02F1/13 , G02F2203/18
Abstract: An adaptive optics system includes a spatial light modulator configured to spatially modulate a phase of an optical image incident on a modulation surface and a wavefront sensor including a lens array having a plurality of two-dimensionally arranged lenses and an optical detection element for detecting a light intensity distribution including converging spots formed by the lens array and configured to receive the optical image after the modulation from the spatial light modulator, and compensates for wavefront distribution by controlling a phase pattern displayed in the spatial light modulator based on a wavefront shape of the optical image obtained from the light intensity distribution, wherein a correspondence relation between the modulation surface and the wavefront sensor is adjusted.
Abstract translation: 自适应光学系统包括：空间光调制器，被配置为空间调制入射在调制表面上的光学图像的相位;以及波前传感器，包括具有多个二维排列的透镜的透镜阵列和用于检测光的光学检测元件 强度分布，包括由透镜阵列形成的会聚点，并被配置为从空间光调制器接收调制后的光学图像，并且通过基于光学器件的波前形状控制在空间光调制器中显示的相位图案来补偿波前分布 从光强分布获得的图像，其中调整表面和波前传感器之间的对应关系被调整。
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19.发明授权Aberration-correcting method, laser processing method using said aberration-correcting method, laser irradiation method using said aberration-correction method, aberration-correction device and aberration-correcting program 有权畸变校正方法，使用所述像差校正方法的激光加工方法，使用所述像差校正方法的激光照射方法，像差校正装置和像差校正程序公开(公告)号：US09415461B2
公开(公告)日：2016-08-16
申请号：US13963299
申请日：2013-08-09
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Haruyasu Ito , Naoya Matsumoto , Takashi Inoue
IPC: B23K26/06 , B23K26/364 , H01L21/78 , G02F1/01 , B23K26/00 , B23K26/36 , B23K26/03 , B23K26/38 , G02B27/00 , B23K26/40 , G02B5/32
CPC classification number: G02B27/0025 , B23K26/00 , B23K26/03 , B23K26/032 , B23K26/06 , B23K26/064 , B23K26/36 , B23K26/364 , B23K26/38 , B23K26/40 , B23K26/53 , B23K26/57 , B23K2101/40 , B23K2103/50 , G02B5/1876 , G02B5/32 , G02B21/0032 , G02B21/02 , G02B21/06 , G02B21/361 , G02B27/0068 , G02F1/01 , G02F2203/18
Abstract: In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as Δs.
Abstract translation: 在根据本发明实施例的像差校正方法中，在将激光束聚焦在透明介质60的内部的激光照射装置1的像差校正方法中，校正激光束的像差，使得 激光束的焦点位于介质内发生的像差范围内。 该像差范围不小于介质60的入射面的n×d且不大于n×d +Δs，条件是介质60的折射率被定义为n，从 将透镜50的焦点的介质60定义为d，将由介质60引起的像差定义为Δs。
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公开(公告)号：US20150049376A1
公开(公告)日：2015-02-19
申请号：US14395148
申请日：2013-04-18
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02B27/0927 , G02B21/16 , G02B26/06 , G02B27/0938 , G02F1/19 , G02F2203/50
Abstract: A beam shaping device includes a first phase modulation unit including a phase-modulation type SLM, and displaying a first phase pattern for modulating a phase of input light, a second phase modulation unit including a phase-modulation type SLM, being optically coupled to the first phase modulation unit, and displaying a second phase pattern for further modulating a phase of light phase-modulated by the first phase modulation unit, and a control unit providing the first and second phase patterns to the first and second phase modulation units, respectively. The first and second phase patterns are phase patterns for approximating an intensity distribution and a phase distribution of light output from the second phase modulation unit, to predetermined distributions.
Abstract translation: 光束整形装置包括：第一相位调制单元，包括相位调制型SLM，并显示用于调制输入光相位的第一相位图案;第二相位调制单元，包括相位调制型SLM，光学耦合到 第一相位调制单元，以及显示第二相位图案，用于进一步调制由第一相位调制单元相位调制的光的相位;以及控制单元，分别将第一和第二相位图案提供给第一和第二相位调制单元。 第一和第二相位图案是用于近似从第二相位调制单元输出的光的强度分布和相位分布到预定分布的相位图。
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