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公开(公告)号：US09184551B2
公开(公告)日：2015-11-10
申请号：US14454494
申请日：2014-08-07
Applicant: GIGAPHOTON INC.
Inventor： Takashi Suganuma , Hidenobu Kameda , Masato Moriya , Osamu Wakabayashi
CPC classification number: H01S3/10 , H01S3/005 , H01S3/0971 , H01S3/10007 , H01S3/10023 , H01S3/1003 , H01S3/104 , H01S3/13 , H01S3/1301 , H01S3/1305 , H01S3/134 , H01S3/2308 , H01S3/2316 , H01S3/2325 , H01S3/2391 , H05G2/008
Abstract: A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.
Abstract translation: 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。
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公开(公告)号：US08957356B2
公开(公告)日：2015-02-17
申请号：US13662264
申请日：2012-10-26
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya , Osamu Wakabayashi
CPC classification number: G01J1/4257 , G01J1/0429 , G01J1/429 , G01J1/44 , G01J9/00 , G03F7/70258 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.
Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。
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公开(公告)号：US11841267B2
公开(公告)日：2023-12-12
申请号：US17113759
申请日：2020-12-07
Applicant: Gigaphoton Inc.
Inventor： Yosuke Watanabe , Masato Moriya
CPC classification number: G01J1/0414 , G01J1/0429 , G01J1/4257 , G02B27/283 , H01S3/0014 , H01S3/225
Abstract: An energy measuring apparatus according to one aspect of the present disclosure includes a first beam splitter, a second beam splitter, a third beam splitter, and a fourth beam splitter, which sequentially reflect part of a main beam and input the beam to an energy sensor. The first beam splitter, the second beam splitter, the third beam splitter, and the fourth beam splitter are each arranged to have such an incident angle and a folding direction of an optical path as to suppress a change in detection value of the energy sensor due to a change in incident angle and a change in polarization purity of the main beam.
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公开(公告)号：US09882343B2
公开(公告)日：2018-01-30
申请号：US15486323
申请日：2017-04-13
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya , Takeshi Ohta , Keisuke Ishida , Takashi Kusama
CPC classification number: H01S3/13 , G01J1/0425 , G01J1/0474 , G01J3/28 , G01J9/0246 , G01J2009/0257 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0811 , H01S3/0823 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/2251 , H01S3/2256
Abstract: A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.
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公开(公告)号：US09667019B2
公开(公告)日：2017-05-30
申请号：US14748332
申请日：2015-06-24
Applicant: GIGAPHOTON INC.
Inventor： Masato Moriya , Takashi Suganuma , Osamu Wakabayashi
CPC classification number: H01S3/0064 , H01S3/005 , H01S3/2232 , H01S3/2316 , H01S2301/02 , H05G2/008
Abstract: There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.
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Patent Agency Ranking
公开(公告)号：US09271382B2
公开(公告)日：2016-02-23
申请号：US14215492
申请日：2014-03-17
Applicant: GIGAPHOTON INC.
Inventor： Masato Moriya , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/0078 , H01S3/10023 , H01S3/1003 , H01S3/10069 , H01S3/1306 , H01S3/2232 , H01S3/2316 , H01S2301/02
Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element.
Abstract translation: 激光装置可以包括配置成输出脉冲激光束的主振荡器，设置在脉冲激光束的光路中的放大器，配置在脉冲激光束的光路中的波长选择元件， 选择波长比其他波长的光的透射率高的透射率，以及配置为改变波长选择元件的选择波长的控制器。
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17.发明申请公开(公告)号：US20140166046A1
公开(公告)日：2014-06-19
申请号：US13964816
申请日：2013-08-12
Applicant: GIGAPHOTON INC.
Inventor： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
CPC classification number: B08B7/00 , B08B7/0035 , B08B13/00
Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
Abstract translation: 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
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公开(公告)号：US11808629B2
公开(公告)日：2023-11-07
申请号：US17818202
申请日：2022-08-08
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya
Abstract: A sensor degradation evaluation method according to an aspect of the present disclosure includes an evaluation step of evaluating degradation of at least one of a sensor for coarse measurement that receives interference fringes produced by a spectrometer for coarse measurement and a sensor for fine measurement that receives interference fringes produced by a spectrometer for fine measurement, and the evaluation step includes causing a plurality of kinds of laser light having wavelengths different from one another to be sequentially incident on the spectrometer for coarse measurement and the spectrometer for fine measurement and acquiring a coarse-measurement wavelength and a fine-measurement wavelength on a wavelength basis from a plurality of the received interference fringes, acquiring a degradation parameter on a wavelength basis from the coarse-measurement wavelength and the fine-measurement wavelength on a wavelength basis, and comparing the degradation parameter on a wavelength basis with a threshold.
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公开(公告)号：US09841684B2
公开(公告)日：2017-12-12
申请号：US14629282
申请日：2015-02-23
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi Tanaka , Akihiko Kurosu , Hiroyuki Masuda , Hideyuki Ochiai , Osamu Wakabayashi , Masato Moriya
IPC: G03F7/20 , H01L21/268 , H01L21/67 , H01L21/66
CPC classification number: G03F7/70483 , G03F7/70041 , G03F7/70058 , G03F7/70358 , H01L21/268 , H01L21/67115 , H01L21/67253 , H01L22/10 , H01L22/26
Abstract: A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.
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公开(公告)号：US09574935B2
公开(公告)日：2017-02-21
申请号：US15224894
申请日：2016-08-01
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya , Osamu Wakabayashi
CPC classification number: G01J1/4257 , G01J1/0429 , G01J1/429 , G01J1/44 , G01J9/00 , G03F7/70258 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.
Abstract translation: 一种用于产生极紫外光的系统可以包括：室，被配置成将目标材料供应到所述室中的目标供应装置，被配置为输出激光束以照射所述目标材料的激光装置;波前调整器， 所述激光束，被配置为聚焦由所述目标材料反射的激光束的成像光学系统;被配置为捕获由所述成像光学系统聚焦的所述激光束的图像的图像检测器;以及控制器，被配置为基于 捕获的图像。
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