Invention Grant
- Patent Title: Laser apparatus and extreme ultraviolet light generation system
- Patent Title (中): 激光设备和极紫外光发生系统
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Application No.: US14454494Application Date: 2014-08-07
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Publication No.: US09184551B2Publication Date: 2015-11-10
- Inventor: Takashi Suganuma , Hidenobu Kameda , Masato Moriya , Osamu Wakabayashi
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2012-070161 20120326
- Main IPC: H01S3/10
- IPC: H01S3/10 ; H01S3/104 ; H01S3/13 ; H01S3/134 ; H01S3/23 ; H05G2/00 ; H01S3/0971 ; H01S3/00

Abstract:
A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.
Public/Granted literature
- US20140348188A1 LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM Public/Granted day:2014-11-27
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