公开(公告)号：US09841684B2

公开(公告)日：2017-12-12

申请号：US14629282

申请日：2015-02-23

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi Tanaka ,  Akihiko Kurosu ,  Hiroyuki Masuda ,  Hideyuki Ochiai ,  Osamu Wakabayashi ,  Masato Moriya

IPC: G03F7/20 ,  H01L21/268 ,  H01L21/67 ,  H01L21/66

CPC classification number: G03F7/70483 ,  G03F7/70041 ,  G03F7/70058 ,  G03F7/70358 ,  H01L21/268 ,  H01L21/67115 ,  H01L21/67253 ,  H01L22/10 ,  H01L22/26

Abstract: A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.