Array substrate and method of manufacturing the same

    公开(公告)号:US09837477B2

    公开(公告)日:2017-12-05

    申请号:US15122172

    申请日:2015-09-25

    Abstract: Embodiments of the invention provide an array substrate and a method of manufacturing the same. The method comprises: forming a gate electrode pattern, a gate insulation layer, an active layer pattern and an etching stopping layer on a substrate; forming a photoresist layer on the etching stopping layer; performing a single patterning process on the photoresist layer, such that photoresist in the first region is partially etched off, photoresist in the second region is completely etched off, and photoresist in the third region is completely remained; and performing a single etching process, such that residual photoresist in the first region and a portion of the etching stopping layer in the first region are etched off, and at the same time, a portion of the etching stopping layer and a portion of the gate insulation layer in the second region are etched off.

    ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
    15.
    发明申请
    ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE 审中-公开
    阵列基板,其制造方法和显示装置

    公开(公告)号:US20160197128A1

    公开(公告)日:2016-07-07

    申请号:US14891796

    申请日:2015-04-16

    Abstract: An array substrate, a manufacturing method thereof and a display device are disclosed. The array substrate includes a substrate (10) and first thin-film transistors (TFTs) (21) and first electrodes (40) formed on the substrate (10). The first TFT (21) includes a gate electrode (200), an active layer (202), a source electrode (205) and a drain electrode (204). The first electrode (40) is electrically connected with the drain electrode (204) of the first TFT (21), at least covers an area of the active layer (202) of the first TFT, not overlapped with the source electrode (205) and the drain electrode (204), and can absorb ultraviolet (UV) light. The array substrate can solve the problem of reducing the display performance of the display device as the performances degrade and even fail due to UV irradiation of the TFTs.

    Abstract translation: 公开了阵列基板,其制造方法和显示装置。 阵列基板包括基板(10)和形成在基板(10)上的第一薄膜晶体管(TFT)(21)和第一电极(40)。 第一TFT(21)包括栅电极(200),有源层(202),源电极(205)和漏电极(204)。 第一电极(40)与第一TFT(21)的漏电极(204)电连接,至少覆盖与源电极(205)不重叠的第一TFT的有源层(202)的区域, 和漏电极(204),并且可以吸收紫外线(UV)光。 阵列基板可以解决由于TFT的UV照射而导致的性能劣化甚至失败的情况下降低显示装置的显示性能的问题。

    Flat panel detector and medical image detection device

    公开(公告)号:US11594653B2

    公开(公告)日:2023-02-28

    申请号:US17356194

    申请日:2021-06-23

    Abstract: The present disclosure provides a flat panel detector and a medical image detection device. The flat panel detector includes a base substrate, wherein the base substrate is divided into a plurality of detection units, each detection unit includes a first absorbing layer and a second absorbing layer, both of which are arranged on the base substrate in a laminating manner, the second absorbing layer is located on one side, away from the base substrate, of the first absorbing layer, and an energy level of rays absorbed by the second absorbing layer is smaller than that of rays absorbed by the first absorbing layer; a voltage supply electrode structure; and an output circuit, electrically connected to the voltage supply electrode structure and configured to output a first detection signal of the first absorbing layer and a second detection signal of the second absorbing layer.

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