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公开(公告)号：US09268238B2
公开(公告)日：2016-02-23
申请号：US14690032
申请日：2015-04-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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公开(公告)号：US11960213B2
公开(公告)日：2024-04-16
申请号：US18299534
申请日：2023-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: G03F7/00 , B05D3/06 , B05D5/00 , B22F7/06 , B22F10/00 , B22F10/20 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , B22F10/25 , B22F10/28 , B22F10/66
CPC classification number: G03F7/70341 , B05D3/06 , B05D5/00 , B22F7/062 , B22F10/00 , B22F10/20 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708 , B22F10/25 , B22F10/28 , B22F10/66
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US10591828B2
公开(公告)日：2020-03-17
申请号：US16270958
申请日：2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US20180348650A1
公开(公告)日：2018-12-06
申请号：US15856133
申请日：2017-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas TEN KATE , Raymond Wilhelmus Louis Lafarre
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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公开(公告)号：US20180162040A1
公开(公告)日：2018-06-14
申请号：US15865242
申请日：2018-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Johan Frederik Dijksman , Sander Frederik Wuister , Ivar Schram , Raymond Wilhelmus Louis Lafarre
CPC classification number: B29C59/002 , B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
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Patent Agency Ranking
公开(公告)号：US09857696B2
公开(公告)日：2018-01-02
申请号：US15273416
申请日：2016-09-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
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公开(公告)号：US09823589B2
公开(公告)日：2017-11-21
申请号：US15078814
申请日：2016-03-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US09678445B2
公开(公告)日：2017-06-13
申请号：US15233775
申请日：2016-08-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
IPC: G03B27/52 , G03B27/42 , G03F7/20 , H01L21/687 , C23C16/44
CPC classification number: G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
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公开(公告)号：US20170090304A1
公开(公告)日：2017-03-30
申请号：US15297001
申请日：2016-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johanne De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70733
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10654217B2
公开(公告)日：2020-05-19
申请号：US15865242
申请日：2018-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Johan Frederik Dijksman , Sander Frederik Wuister , Ivar Schram , Raymond Wilhelmus Louis Lafarre
Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
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