公开(公告)号：US20240339290A1

公开(公告)日：2024-10-10

申请号：US18748694

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER

IPC: H01J37/20 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/20228

Abstract: Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.

公开(公告)号：US20240264099A1

公开(公告)日：2024-08-08

申请号：US18639657

申请日：2024-04-18

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/50

Abstract: The present application discloses detector assembly for a charged particle assessment apparatus, the detector assembly comprising a plurality of electrode elements, each electrode element having a major surface configured to be exposed to signal particles emitted from a sample, wherein between adjacent electrode elements is a recess that is recessed relative to the major surfaces of the electrode elements, and wherein at least one of the electrode elements is a detection element configured to detect signal particles and the recess extends laterally behind the detection element. Charged particle assessment devices and apparatus, and corresponding methods are also provided.

公开(公告)号：US20240087842A1

公开(公告)日：2024-03-14

申请号：US18516020

申请日：2023-11-21

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A data processing device for detecting defects in sample images generated by a charged particle assessment system, the device comprising: an input module, a filter module, a reference image module and a comparator. The input module is configured to receive a sample image from the charged particle assessment system. The filter module is configured to apply a filter to the sample image to generate a filtered sample image. The reference image module is configured to provide a reference image based on one or more source images. The comparator is configured to compare the filtered sample image to the reference image so as to detect defects in the sample image.

公开(公告)号：US20230054632A1

公开(公告)日：2023-02-23

申请号：US17790713

申请日：2020-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

Abstract: A charged particle assessment tool including: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes, each capture electrode adjacent a respective one of the beam apertures, configured to capture charged particles emitted from the sample.

公开(公告)号：US20220392745A1

公开(公告)日：2022-12-08

申请号：US17891961

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/153

Abstract: A charged-particle assessment tool comprising a plurality of beam columns. Each beam column comprises: a charged-particle beam source configured to emit charged particles; a plurality of condenser lenses configured to form charged particles emitted from the charged-particle beam source into a plurality of charged-particle beams; and a plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. The beam columns are arranged adjacent one-another so as to project the charged particle beams onto adjacent regions of the sample.

公开(公告)号：US20250118528A1

公开(公告)日：2025-04-10

申请号：US18982902

申请日：2024-12-16

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER ,  Anagnostis TSIATMAS

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: An assessment method comprising: using an assessment apparatus to generate assessment signals representing a property of a surface of a sample; processing the assessment signals to identify candidate defects and outputting a candidate defect signal; monitoring the status of the assessment apparatus for error conditions and generating a status signal indicating any error conditions during functioning of the assessment apparatus; and analysing the candidate defect signal to determine if the candidate defects are real defects; wherein analysis of a candidate defect is not completed if the status signal indicates that the assessment signal(s) and/or the candidate defect signal corresponding to the candidate defect would have been affected by an error condition.

公开(公告)号：US20250116587A1

公开(公告)日：2025-04-10

申请号：US18979967

申请日：2024-12-13

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: G01N7/16 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: The present disclosure relates to apparatus and methods for assessing samples using charged particles. In one arrangement, a degassing action is performed by exposing a target area of a sample with charged particles to stimulate degassing. A rate of degassing from the target area is measured during the degassing action. Initiation of an assessing of the sample is controlled based on a characteristic of the measured rate of degassing. The assessing of the sample comprising exposing the target area with charged particles and detecting signal charged particles from the target area.

公开(公告)号：US20250087444A1

公开(公告)日：2025-03-13

申请号：US18959531

申请日：2024-11-25

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle assessment apparatus for detecting defects in samples by scanning a charged particle beam across a sample; the apparatus comprising:
a detector unit configured to output a digital detection signal of pixel values in response to signal particles incident from the sample, the pixel values representing elongate pixels.

公开(公告)号：US20250014855A1

公开(公告)日：2025-01-09

申请号：US18890506

申请日：2024-09-19

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12

Abstract: A charged particle device projects charged-particle beams along beampaths towards a sample location. The device comprises: a charged-particle lens assembly for manipulating the beams and a controller. The lens assembly comprises plates each having an aperture array for passage of beampaths. The plates are at different plate locations along the beampaths. The controller controls the charged-particle device such that charged particles of the beams have different energy values at the different plate locations along the beampaths. The lens assembly comprises a corrector comprising an individual correctors configured to perform aberration correction at respective apertures independently of each other. The corrector is associated with the plate at the plate location at which the energy value is smallest, the strength of an electric field adjacent to the plate is greatest and/or a ratio of the energy value to strength of an electric field adjacent to the plate is smallest.

公开(公告)号：US20240339291A1

公开(公告)日：2024-10-10

申请号：US18743049

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Herre Tjerk STEENSTRA ,  Marco Jan-Jaco WIELAND ,  Alexius Otto LOOIJE ,  Richard Michel VAN LEEUWEN ,  Erwin Robert Alexander VISSER ,  Andre Luis RODRIGUES MANSANO ,  Gretchen Renée VAN T VEEN ,  Duije SEEKLES ,  Roelof Albert MARISSEN

IPC: H01J37/244 ,  H01J37/09

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: The embodiments of the present disclosure provides a detector inspection device for interrogating at least part of a detector comprised in a charged particle-optical assessment apparatus, the detector inspection device comprising: a coupler configured to be positioned proximate to a detector element of a detector; and a device controller configured to apply a stimulating signal to the coupler to stimulate a response signal in the detector for interrogating at least part of the detector.