公开(公告)号：US20250029811A1

公开(公告)日：2025-01-23

申请号：US18907436

申请日：2024-10-04

Applicant: ASML Netherlands B.V.

Inventor： Arthur Eduard OVERLACK ,  Ronald KROON ,  Richard Michel VAN LEEUWEN ,  Andre Luis RODRIGUES MANSANO ,  Herre Tjerk STEENSTRA ,  Erwin Robert Alexander VISSER

IPC: H01J37/244 ,  H01J37/28

Abstract: The embodiments of the present disclosure provide a sensor substrate for a charged particle optical device and/or a charged particle assessment apparatus, the sensor substrate comprising: at least one distance sensor configured to generate a measurement signal representative of a distance between the distance sensor and a facing surface of a target; and at least one charged particle optical component.

公开(公告)号：US20240339291A1

公开(公告)日：2024-10-10

申请号：US18743049

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Herre Tjerk STEENSTRA ,  Marco Jan-Jaco WIELAND ,  Alexius Otto LOOIJE ,  Richard Michel VAN LEEUWEN ,  Erwin Robert Alexander VISSER ,  Andre Luis RODRIGUES MANSANO ,  Gretchen Renée VAN T VEEN ,  Duije SEEKLES ,  Roelof Albert MARISSEN

IPC: H01J37/244 ,  H01J37/09

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: The embodiments of the present disclosure provides a detector inspection device for interrogating at least part of a detector comprised in a charged particle-optical assessment apparatus, the detector inspection device comprising: a coupler configured to be positioned proximate to a detector element of a detector; and a device controller configured to apply a stimulating signal to the coupler to stimulate a response signal in the detector for interrogating at least part of the detector.