Multi-beam system for high throughput EBI
    171.
    发明授权
    Multi-beam system for high throughput EBI 有权
    用于高通量EBI的多光束系统

    公开(公告)号:US09035249B1

    公开(公告)日:2015-05-19

    申请号:US14174651

    申请日:2014-02-06

    Abstract: A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

    Abstract translation: 描述了构造成对样本进行成像的扫描带电粒子束装置。 扫描带电粒子束装置包括带电粒子源,用于影响带电粒子的聚光透镜,具有至少两个孔径孔的孔板,以产生至少两个带电粒子的主子束,至少两个偏转器,其中, 至少两个偏转器是多极偏转器,具有8或更高的极数的多极偏转器,物镜,其中物镜是延迟场复合透镜,梁分离器,被配置为将至少两个初级 来自至少两个信号子束的子束,光束弯曲器或被配置为偏转所述至少两个信号子束的偏转器或反射镜,其中所述光束弯曲器是具有至少两个弯曲电极的半球形光束弯曲器或光束弯曲器,并且至少 两个检测元件。

    Charged particle beam system aperture
    172.
    发明授权
    Charged particle beam system aperture 有权
    带电粒子束系统孔径

    公开(公告)号:US08907296B2

    公开(公告)日:2014-12-09

    申请号:US13669626

    申请日:2012-11-06

    Applicant: FEI Company

    CPC classification number: G21K1/00 H01J37/09 H01J2237/045 H01J2237/0453

    Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.

    Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中,其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。

    ADJUSTABLE MASS RESOLVING APERTURE
    173.
    发明申请
    ADJUSTABLE MASS RESOLVING APERTURE 有权
    可调节质量的解决方案

    公开(公告)号:US20140261173A1

    公开(公告)日:2014-09-18

    申请号:US14217064

    申请日:2014-03-17

    Inventor: GLENN E. LANE

    Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ions species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (“CPC”) superconductor, or boson energy transmission system.

    Abstract translation: 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径,该离子注入系统在离子束中基于质量比(和/或质量与电荷比)不理想地选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径,该质量分辨孔径被分段,可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭等离子体通道(“CPC”)超导体或玻色子能量传输系统对带电粒子的流过滤。

    Electron beam writing apparatus and electron beam writing method
    174.
    发明授权
    Electron beam writing apparatus and electron beam writing method 有权
    电子束写入装置和电子束写入方法

    公开(公告)号:US08816276B2

    公开(公告)日:2014-08-26

    申请号:US13768327

    申请日:2013-02-15

    CPC classification number: H01J37/3007 H01J37/09 H01J2237/12 H01J2237/31776

    Abstract: An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, wherein a shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a negative voltage constantly to the electrostatic lens.

    Abstract translation: 一种电子束写入装置,包括放置样品的XY平台,电子光学柱,发射设置在光学柱中的电子束的电子枪,设置有沿着电子束轴向排列的电极的静电透镜, 在光学柱中,其中屏蔽板设置在XY台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。 静电透镜设置在屏蔽板的正上方,以改变电子束的焦点位置。 电压供给装置将恒定的负电压施加到静电透镜。

    Charged particle radiation device
    175.
    发明授权
    Charged particle radiation device 有权
    带电粒子辐射装置

    公开(公告)号:US08729467B2

    公开(公告)日:2014-05-20

    申请号:US13500592

    申请日:2010-10-06

    Abstract: Provided is a charged particle radiation device enabling suppression of both inclination and vertical vibration of a charged particle optical lens barrel, with a simple configuration. A charged particle radiation device according to the present invention includes a vibration damping member (19) including viscoelastic material sheets (16A and 16B) sandwiched by support plates (17A and 17B), and is configured so that a plane including a sheet surface of each viscoelastic material sheet is not perpendicular to a center axis of the charged particle optical lens barrel.

    Abstract translation: 提供一种能够以简单的结构抑制带电粒子光学镜片镜筒的倾斜和垂直振动的带电粒子辐射装置。 根据本发明的带电粒子辐射装置包括一个包括被支撑板(17A和17B)夹在中间的粘弹性材料片(16A和16B)的振动阻尼件(19​​),并被构造成使得包括每个 粘弹性材料片不垂直于带电粒子光学镜片镜筒的中心轴线。

    Charged particle source with integrated electrostatic energy filter
    176.
    发明授权
    Charged particle source with integrated electrostatic energy filter 有权
    带集成静电能量滤波器的带电粒子源

    公开(公告)号:US08710452B2

    公开(公告)日:2014-04-29

    申请号:US13294067

    申请日:2011-11-10

    Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

    Abstract translation: 具有集成能量滤波器的带电粒子滤波器,其中带电粒子发射器,聚焦电极和偏转电极绕直线布置。 在使用大多数能量过滤器具有高度弯曲的光轴的情况下,因此使用具有难以制造的形式的部件,根据本发明的源使用围绕直线光轴的电极。 带电粒子的束可以在能量选择狭缝处偏离显示出可观的能量分散的轴线,而不引入无法校正的彗差或像散,只要其中一些形成为120°/ 60°/ 120°/ 60° °。 这样的电极可以通过陶瓷的胶合或钎焊而彼此附接,然后可以通过例如火花腐蚀形成一系列高度同心的孔。

    Accelerator having a multi-channel micro-collimator
    177.
    发明授权
    Accelerator having a multi-channel micro-collimator 有权
    具有多通道微型准直器的加速器

    公开(公告)号:US08648315B1

    公开(公告)日:2014-02-11

    申请号:US13585822

    申请日:2012-08-14

    CPC classification number: H01J37/3174 B82Y10/00 B82Y40/00 H01J37/08 H01J37/09

    Abstract: An ion accelerator includes a plasma ion source and a micro-collimator. The micro-collimator has a plurality of channels. The length-to-width ratio of each channel is greater than five, and the channel width is less than one micron. The ion source is coupled to the micro-collimator such that ions from the ion source pass into the channels, and then through the plurality of channels. In one specific example, the ion source produces cold ions that have only a small amount of lateral momentum. Each channel is an individually gated acceleration channel that is formed into a solid dielectric material. Ions are accelerated down the acceleration channel. The ion accelerator forms a part of an ionjet head of a Direct Write On Wafer (DWOW) printing system. The DWOW printing system is useful in semiconductor processing in that it can direct write an image onto a 300 mm diameter wafer in one minute.

    Abstract translation: 离子加速器包括等离子体离子源和微型准直器。 微型准直仪具有多个通道。 每个通道的长宽比大于5,通道宽度小于1微米。 离子源耦合到微型准直器,使得离子源的离子进入通道,然后通过多个通道。 在一个具体实例中,离子源产生仅具有少量横向动量的冷离子。 每个通道是形成为固体电介质材料的独立门控加速通道。 离子加速通道加速。 离子加速器形成直接写入晶片(DWOW)打印系统的离子喷墨头的一部分。 DWOW打印系统在半导体处理中是有用的,因为它可以在一分钟内直接将图像写入到300mm直径的晶片上。

    Method and system of performing three-dimensional imaging using an electron microscope
    178.
    发明授权
    Method and system of performing three-dimensional imaging using an electron microscope 有权
    使用电子显微镜进行三维成像的方法和系统

    公开(公告)号:US08642959B2

    公开(公告)日:2014-02-04

    申请号:US11926791

    申请日:2007-10-29

    Applicant: Shixin Wang

    Inventor: Shixin Wang

    Abstract: A method and electron microscope system of performing three-dimensional imaging using an electron microscope. At least some of the illustrative embodiments are methods comprising generating an electron beam, and creating a hollow-cone electron beam (by passing the electron beam through an annular aperture), focusing the hollow-cone electron beam to form a probe, scanning a specimen using the probe; and performing three-dimensional imaging based on the scanning.

    Abstract translation: 使用电子显微镜进行三维成像的方法和电子显微镜系统。 至少一些说明性实施例是包括产生电子束并产生中空锥形电子束(通过使电子束通过环形孔)的方法,聚焦中空锥形电子束以形成探针,扫描样品 使用探针; 并基于扫描进行三维成像。

    Blocking member for use in the diffraction plane of a TEM
    179.
    发明授权
    Blocking member for use in the diffraction plane of a TEM 有权
    用于TEM衍射平面的阻挡构件

    公开(公告)号:US08637821B2

    公开(公告)日:2014-01-28

    申请号:US13168415

    申请日:2011-06-24

    Abstract: The invention relates to a blocking member to be placed in the diffraction plane of a TEM. It resembles the knife edge used for single sideband imaging, but blocks only electrons deflected over a small angle. As a result the Contrast Transfer Function of the TEM according to this invention will equal that of a single sideband microscope at low frequencies and that of a normal microscope for high frequencies. Preferable the highest frequency blocked by the blocking member is such that a microscope without the blocking member would show a CTF of 0.5.

    Abstract translation: 本发明涉及一种放置在TEM衍射平面中的阻挡构件。 它类似于用于单边带成像的刀刃,但仅阻挡在小角度偏转的电子。 结果,根据本发明的TEM的对比度传递函数将等于低频下的单边带显微镜的对比度传递函数,而与正常显微镜在低频下相同。 优选地,阻挡构件阻挡的最高频率使得没有阻挡构件的显微镜将显示为0.5的CTF。

    Scanning electron microscope and inspection method using same
    180.
    发明授权
    Scanning electron microscope and inspection method using same 失效
    扫描电子显微镜及使用相同的检查方法

    公开(公告)号:US08637820B2

    公开(公告)日:2014-01-28

    申请号:US13521254

    申请日:2011-02-18

    Abstract: Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.

    Abstract translation: 提供了一种具有最小像差的高分辨率扫描电子显微镜,并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中,电磁偏转器(201)设置在磁性透镜(207)的上方,并且设置使电子加速或减速的控制电极(202)重叠(以使得高度位置重叠 相对于垂直方向)与电磁偏转器(201)。 在宽场极化中,电极被加速,并且在倾斜的波束形成中,电子被减速。

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