公开(公告)号：US20180120041A1

公开(公告)日：2018-05-03

申请号：US15857055

申请日：2017-12-28

Applicant: Gigaphoton Inc.

Inventor： Yasufumi KAWASUJI ,  Masazumi KOMORI ,  Osamu WAKABAYASHI

IPC: F28F27/02 ,  H05G2/00

CPC classification number: F28F27/02 ,  F28F27/00 ,  F28F2250/08 ,  G05D23/1917 ,  G21K1/062 ,  H05G2/008

Abstract: A device for controlling the temperature of cooling water includes a three-way valve having a first inlet, a second inlet, and an outlet; a first feed pipe; a second feed pipe; and a return pipe for connecting between an outlet of the temperature-control target and an inlet of the cooling water supply unit. The device also includes a return-side bypass pipe for connecting between the return pipe and the second inlet of the three-way valve; a pump provided on the second feed pipe for circulating the cooling water between the three-way valve and the temperature-control target; and a temperature measuring unit for measuring a temperature of the cooling water flowing in the second feed pipe. In addition, the device includes a controller for controlling the three-way valve and the pump in accordance with a detection result of the temperature measuring unit.

公开(公告)号：US20180026414A1

公开(公告)日：2018-01-25

申请号：US15720122

申请日：2017-09-29

Applicant: GIGAPHOTON INC.

Inventor： Akihiko KUROSU ,  Takashi MATSUNAGA ,  Hiroyuki MASUDA ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO ,  Takeshi OHTA

IPC: H01S3/036 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/097 ,  H01S3/225 ,  H01S3/08 ,  H01S3/041 ,  H01S3/13 ,  H01S3/134 ,  H01S3/03

CPC classification number: H01S3/036 ,  H01S3/03 ,  H01S3/0404 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1306 ,  H01S3/134 ,  H01S3/2258

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US20180019141A1

公开(公告)日：2018-01-18

申请号：US15678950

申请日：2017-08-16

Applicant: Kyushu University ,  Gigaphoton Inc.

Inventor： Tomoyuki OHKUBO ,  Hiroshi IKENOUE ,  Kouji KAKIZAKI ,  Yasuhiro KAMBA ,  Osamu WAKABAYASHI

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  H01L21/20 ,  H01L21/268 ,  H01L21/67276 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2383

Abstract: A laser system may serve as a light source of a laser annealing apparatus that irradiates a workpiece with a pulse laser beam. The laser system may include: a laser apparatus configured to generate the pulse laser beam; a time-domain pulse waveform changing apparatus configured to change time-domain pulse waveform of the pulse laser beam; and a controller configured to receive at least one parameter for generating the time-domain pulse waveform from the laser annealing apparatus and to control the time-domain pulse waveform changing apparatus.

公开(公告)号：US20180013258A1

公开(公告)日：2018-01-11

申请号：US15713761

申请日：2017-09-25

Applicant: Gigaphoton Inc.

Inventor： Hiroshi UMEDA ,  Takeshi ASAYAMA ,  Osamu WAKABAYASHI

IPC: H01S3/097 ,  H01L21/67 ,  H01S3/139 ,  B23K26/00 ,  H01L21/02 ,  H01S3/23 ,  H01S3/13 ,  H01S3/00 ,  H01S3/104 ,  H01S3/225

CPC classification number: H01S3/09702 ,  B23K26/00 ,  B23K26/0608 ,  H01L21/02686 ,  H01L21/67115 ,  H01S3/0057 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2383

Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.

公开(公告)号：US20170149198A1

公开(公告)日：2017-05-25

申请号：US15426155

申请日：2017-02-07

Applicant: GIGAPHOTON INC.

Inventor： Osamu WAKABAYASHI ,  Shinji OKAZAKI ,  Akiyoshi SUZUKI

IPC: H01S3/08 ,  H01S3/11 ,  G03F7/20 ,  H01S3/09

CPC classification number: H01S3/08009 ,  G02B17/0621 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70158 ,  G03F7/70558 ,  H01L21/027 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/08059 ,  H01S3/0903 ,  H01S3/11

Abstract: There is provided a light source system that may include a free electron laser apparatus, a light concentrating mirror, and a delaying optical system. The free electron laser apparatus may include an undulator, and may be configured to output a pulsed laser light beam toward an exposure apparatus. The light concentrating mirror may be configured to concentrate the pulsed laser light beam to enter the exposure apparatus. The delaying optical system may be provided in an optical path between the undulator and the light concentrating mirror, and may be configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam.

公开(公告)号：US20170063024A1

公开(公告)日：2017-03-02

申请号：US15350277

申请日：2016-11-14

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Takashi MATSUNAGA ,  Masaki ARAKAWA ,  Osamu WAKABAYASHI

IPC: H01S3/13 ,  H01L21/02 ,  H01L21/67 ,  H01S3/23 ,  H01S3/139

CPC classification number: H01S3/09702 ,  B23K26/00 ,  B23K26/0608 ,  H01L21/02686 ,  H01L21/67115 ,  H01S3/0057 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2383

Abstract: The laser system may include a first laser apparatus configured to emit a first pulse laser beam, a second laser apparatus configured to emit a second pulse laser beam, a timing detector, and a controller. The timing detector may be configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position. The controller may be configured to control a first trigger timing for the first laser apparatus to emit the first pulse laser beam and a second trigger timing for the second laser apparatus to emit the second pulse laser beam based on the first passage timing and the second passage timing.

Abstract translation: 激光系统可以包括被配置为发射第一脉冲激光束的第一激光装置，被配置为发射第二脉冲激光束的第二激光装置，定时检测器和控制器。 定时检测器可以被配置为检测第一脉冲激光束通过第一位置的第一通过定时和第二脉冲激光束通过第二位置的第二通过定时。 控制器可以被配置为控制第一激光装置发射第一脉冲激光束的第一触发时序和用于第二激光装置基于第一通过定时和第二通道发射第二脉冲激光束的第二触发时序 定时。

公开(公告)号：US20170053780A1

公开(公告)日：2017-02-23

申请号：US15346431

申请日：2016-11-08

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Osamu WAKABAYASHI

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H05G2/00 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.

Abstract translation: 目标供给装置可以设置有容纳作为目标材料的金属的罐，具有目标材料从罐输出的喷嘴孔的喷嘴，设置在用于将目标材料传导的连通部中的过滤器 所述罐到喷嘴孔，温度调节器，其构造成改变罐中的目标材料的温度;以及控制器，控制温度调节器以改变罐中的目标材料的温度，使得靶材料中的氧沉淀 作为金属氧化物。

公开(公告)号：US20160285222A1

公开(公告)日：2016-09-29

申请号：US15172757

申请日：2016-06-03

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Takayuki YABU ,  Osamu WAKABAYASHI ,  Seiji NOGIWA

IPC: H01S3/00 ,  H01S3/23 ,  H01S3/223 ,  H05G2/00

CPC classification number: H01S3/005 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2366 ,  H05G2/005 ,  H05G2/008

Abstract: There is provided a laser unit that may include a master oscillator, a laser amplifier, and an adjuster. The master oscillator may be configured to output a laser light beam. The laser amplifier may be disposed in a light path of the laser light beam outputted from the master oscillator. The adjuster may be disposed in the light path of the laser light beam, and may be configured to adjust a beam cross-sectional shape of the laser light beam amplified by the laser amplifier to be a substantially circular shape. The beam cross-sectional shape may be at a beam waist of the laser light beam or in the vicinity of the beam waist of the laser light beam, and may be in a plane orthogonal to a light path axis.

Abstract translation: 提供了可以包括主振荡器，激光放大器和调节器的激光单元。 主振荡器可以被配置为输出激光束。 激光放大器可以设置在从主振荡器输出的激光束的光路中。 调整器可以设置在激光束的光路中，并且可以被配置为将由激光放大器放大的激光束的光束横截面形状调整为大致圆形。 光束横截面形状可以在激光束的束腰处或激光束的束腰附近，并且可以在与光路轴线正交的平面中。

公开(公告)号：US20160255707A1

公开(公告)日：2016-09-01

申请号：US15151025

申请日：2016-05-10

Applicant: Gigaphoton Inc.

Inventor： Atsushi UEDA ,  Takayuki YABU ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE ,  Takashi SAITO

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.

Abstract translation: 极紫外光发生装置可以包括：腔室; 目标供给单元，被配置为朝向所述室内的预定区域输出目标; 第一气体供给单元，被配置为沿着朝向目标供给单元和预定区域之间的目标的轨迹的第一方向吹出气体; 以及配置成将脉冲激光束集中到所述预定区域的聚焦光学系统。

公开(公告)号：US20160234920A1

公开(公告)日：2016-08-11

申请号：US15017000

申请日：2014-09-17

Applicant: Gigaphoton Inc.

Inventor： Toru SUZUKI ,  Tamotsu ABE ,  Osamu WAKABAYASHI ,  Tatsuya YANAGIDA

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

Abstract translation: 极紫外光发生装置可以包括：包括供给目标物的等离子体产生区域的室，该目标变成等离子体，使得在室内产生极紫外光; 目标供给部，被配置为通过将所述目标作为液滴输出到所述室中来将所述目标供给到所述等离子体产生区域; 液滴检测器，其被配置为检测从所述目标供给部件行进到所述等离子体产生区域的液滴; 被配置为捕获在所述室中包含所述等离子体产生区域的成像区域的图像的成像部件; 以及控制器，被配置为基于液滴检测器检测到液滴的检测定时来控制成像部分捕获成像区域的图像的成像定时。