公开(公告)号：US20240119215A1

公开(公告)日：2024-04-11

申请号：US18545662

申请日：2023-12-19

Applicant: ROHM CO., LTD.

Inventor： Kenichi YOSHIMURA ,  Hiromitsu KIMURA ,  Tomokazu OKADA ,  Yuji KUROTSUCHI

IPC: G06F30/3953 ,  G06F30/38 ,  G06F30/392

CPC classification number: G06F30/3953 ,  G06F30/38 ,  G06F30/392 ,  G06F2111/20

Abstract: For example, an I/O circuit is formed by freely combining a plurality of kinds of standard cells included in a cell library. The plurality of kinds of standard cells include at least first standard cells and a second standard cell. The first standard cells include first protection elements and a first power line formed in a region over the first protection elements to conduct to the first protection elements. The second standard cell includes a second protection element formed in a layout identical with that of the first protection elements, and a second power line formed in a region over the second protection element to conduct to the second protection element while being isolated from the first power line.

公开(公告)号：US20240088830A1

公开(公告)日：2024-03-14

申请号：US18476856

申请日：2023-09-28

Applicant: Huawei Digital Power Technologies Co., Ltd.

Inventor： Guilei GU

IPC: H02S40/34 ,  G06F30/13 ,  G06V30/422 ,  H01G9/20 ,  H01L31/05

CPC classification number: H02S40/34 ,  G06F30/13 ,  G06V30/422 ,  H01G9/2068 ,  H01L31/0504 ,  G06F2111/20

Abstract: This application discloses a method, an apparatus, and a system for obtaining electronic layout applied to photovoltaic array in the field of equipment installation management. According to the method, the electronic device identifies each first area in a target picture to obtain position information and a module identifier of at least one photovoltaic module in each first area, and may directly obtain an electronic layout based on the position information and the module identifier of each photovoltaic module. In this way, a product identifier of each converter does not need to be manually obtained, and a photovoltaic module does not need to be manually added to the electronic layout. This reduces labor time consumption and improves efficiency of obtaining the electronic layout.

公开(公告)号：US20240086605A1

公开(公告)日：2024-03-14

申请号：US18518167

申请日：2023-11-22

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Kenan Yu ,  Qingwen Deng

IPC: G06F30/3312 ,  G06F30/327 ,  G06F30/392 ,  G06F30/394

CPC classification number: G06F30/3312 ,  G06F30/327 ,  G06F30/392 ,  G06F30/394 ,  G06F2111/20

Abstract: A method for providing an IC design is disclosed. The method includes receiving and synthesizing a behavioral description of an IC design; generating, based on the synthesized behavioral description, a layout for the IC design; performing at least a timing analysis on the layout; accessing, based on the timing analysis, a first cell library including a plurality of transistor-based cells, each having one or more transistors and associated with a respective first delay value; accessing, based on the timing analysis, a second cell library including a plurality of non-transistor-based cells, each having no transistor and associated with a respective second delay value; and updating the layout by at least one of inserting one or more of the plurality of transistor-based cells or inserting one or more of the plurality of non-transistor-based cells.

公开(公告)号：US20240054275A1

公开(公告)日：2024-02-15

申请号：US18227576

申请日：2023-07-28

Applicant: HUA HONG SEMICONDUCTOR (WUXI) LIMITED ,  SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING CORPORATION

Inventor： Wanjun DENG ,  Xiaoliang Jin ,  Jiaji Feng

IPC: G06F30/398

CPC classification number: G06F30/398 ,  G06F2111/20

Abstract: The present disclosure discloses a special cell general database, a method for establishing the special cell general database and a pattern correction method. The pattern correction method includes: providing a to-be-corrected layout including a to-be-corrected region and a to-be-corrected special cell structure region; acquiring a to-be-corrected minimum repeating cell pattern in the to-be-corrected special cell structure region; providing a special cell general database; acquiring an information of a cell correction pattern corresponding to the to-be-corrected minimum repeating cell pattern in the special cell general database; performing an optical proximity correction on the to-be-corrected region to acquire an information of a second correction pattern; acquiring a correction layout according to the information of the second correction pattern and the information of the cell correction pattern. The present disclosure can improve a correction efficiency of the pattern correction method.

公开(公告)号：US20240046019A1

公开(公告)日：2024-02-08

申请号：US17427096

申请日：2021-07-16

Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.

Inventor： Siyang Liu ,  Zui Wang

IPC: G06F30/392

CPC classification number: G06F30/392 ,  G06F2111/20

Abstract: The present application provides a method and a device for designing a gate driving circuit, a controller, and a storage medium. The method includes: acquiring size information of a target panel and determining location information of a target area according to the size information of the target panel; calling and combining size information of a standard panel, characteristic label information of a plurality of standard devices, and an architecture type identifier acquired to determine characteristic label information of at least one target device, in order to generate a target gate driving circuit in the target area.

公开(公告)号：US11861282B2

公开(公告)日：2024-01-02

申请号：US18065275

申请日：2022-12-13

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Po-Hsiang Huang ,  Fong-Yuan Chang ,  Clement Hsingjen Wann ,  Chih-Hsin Ko ,  Sheng-Hsiung Chen ,  Li-Chun Tien ,  Chia-Ming Hsu

IPC: G06F30/3312 ,  G06F30/367 ,  G06F30/392 ,  G06F30/398 ,  H01L21/8238 ,  H01L27/092 ,  H01L29/66 ,  H01L29/78 ,  G06F111/20

CPC classification number: G06F30/392 ,  G06F30/3312 ,  G06F30/367 ,  G06F30/398 ,  H01L21/823821 ,  H01L27/0924 ,  H01L29/66795 ,  H01L29/785 ,  G06F2111/20

Abstract: A method of manufacturing an IC structure includes forming a first plurality of fins extending in a first direction on a substrate, a second plurality of fins extending adjacent to the first plurality of fins, a third plurality of fins extending adjacent to the second plurality of fins, and a fourth plurality of fins extending adjacent to the third plurality of fins. Each fin of the first and fourth pluralities of fins includes one of an n-type or p-type fin, each fin of the second and third pluralities of fins includes the other of the n-type or p-type fin, each of the first and third pluralities of fins includes a first total number of fins, and each of the second and fourth pluralities of fins includes a second total number of fins fewer than the first total number of fins.

公开(公告)号：US11853349B2

公开(公告)日：2023-12-26

申请号：US17331587

申请日：2021-05-26

Applicant: DEZIGNED. LLC

Inventor： Erik Marshall Luthy

IPC: G06F16/532 ,  G06F16/538 ,  G06N20/00 ,  G06F111/20 ,  G06F30/13 ,  G06F111/18

CPC classification number: G06F16/532 ,  G06F16/538 ,  G06N20/00 ,  G06F30/13 ,  G06F2111/18 ,  G06F2111/20

Abstract: Systems and methods for an interior design toolset are provided. The method includes receiving a search query for a first design product from a user; searching a database based on the search query using an artificial intelligence search to identify particular design products related to the first design product; searching the database to identify suggested design products based on data extracted from images of a project area; receiving user input selecting design products from 1) the particular design products and 2) the suggested design products; and displaying three dimensional (3D) models of the selected design products in a projection of the project area.

公开(公告)号：US11851810B2

公开(公告)日：2023-12-26

申请号：US17177086

申请日：2021-02-16

Applicant: Levi Strauss & Co.

Inventor： Christopher Schultz ,  Jennifer Schultz ,  Benjamin Bell ,  Ozgur Taylan Kuzucu ,  Debdulal Mahanty

IPC: D06M10/00 ,  D06C23/02 ,  A41H3/08 ,  A41H43/00 ,  A41D1/06 ,  A41D27/08 ,  D03D1/00 ,  G06Q30/0601 ,  G05B19/4097 ,  D06C23/00 ,  G06Q10/0631 ,  G06F30/00 ,  A41D27/00 ,  G06F3/01 ,  G06T19/00 ,  G06T19/20 ,  G06F3/0482 ,  G06F3/04845 ,  G06T3/00 ,  B23K26/352 ,  G06F30/20 ,  G06F30/12 ,  G06F30/17 ,  A41H3/00 ,  G06F113/12 ,  G06F111/20

CPC classification number: D06M10/005 ,  A41D1/06 ,  A41D27/00 ,  A41D27/08 ,  A41H3/007 ,  A41H3/08 ,  A41H43/00 ,  B23K26/352 ,  D03D1/00 ,  D06C23/00 ,  D06C23/02 ,  G05B19/4097 ,  G06F3/011 ,  G06F3/0482 ,  G06F3/04845 ,  G06F30/00 ,  G06F30/12 ,  G06F30/17 ,  G06F30/20 ,  G06Q10/06315 ,  G06Q30/0621 ,  G06Q30/0643 ,  G06T3/005 ,  G06T19/006 ,  G06T19/20 ,  A41D2500/20 ,  D06C2700/31 ,  D10B2201/02 ,  D10B2501/04 ,  D10B2501/06 ,  G05B2219/35008 ,  G05B2219/35012 ,  G05B2219/45222 ,  G06F2111/20 ,  G06F2113/12 ,  G06T2207/10024 ,  G06T2207/20221 ,  G06T2210/16

Abstract: A system allows a user to create new designs for apparel and preview these designs before manufacture. Software and lasers are used in finishing apparel to produce a desired wear pattern or other design. Users may communicate with other users on how wear patterns should be applied onto base garments and make changes to the wear patterns or other garment features, while sharing with other users their progress.

公开(公告)号：US20230394184A1

公开(公告)日：2023-12-07

申请号：US17833424

申请日：2022-06-06

Applicant: Siemens Industry Software Inc.

Inventor： Shantanu Pagar

IPC: G06F30/12

CPC classification number: G06F30/12 ,  G06F2111/20

Abstract: A method and system for scattering geometric components in a three-dimensional space are disclosed. A method includes determining geometric components needed for assembling a CAD model of a product, and determining a scatter plane for scattering the geometric components in the three-dimensional space in the CAD environment. The method includes computing a two-dimensional projection of the geometric components. The method also includes determining a position of each of the geometric components based on the two-dimensional projection of the geometric components. The method includes placing each of the geometric components in the scatter plane based on the position of said each geometric component.

公开(公告)号：US20230376643A1

公开(公告)日：2023-11-23

申请号：US18138871

申请日：2023-04-25

Applicant: Nuvolo Technologies Corporation

Inventor： Khoa Nguyen Van Ho ,  Tao Ye ,  Tejas Yadav

IPC: G06F30/13 ,  G06F30/17

CPC classification number: G06F30/13 ,  G06F30/17 ,  G06F2111/20

Abstract: Systems and techniques for auditing computer-aided design documents are described. A described technique includes receiving a computer-aided design document for import to a space management program; determining whether the computer-aided design document violates a rule set, wherein the rule set is configured to detect issues that inhibit importation of data from the computer-aided design document to the space management program; selectively modifying the computer-aided design document by resolving a violation of the rule set; and providing the modified computer-aided design document to the space management program.