Electrical device with teeth joining layers and method for making the same
    117.
    发明授权
    Electrical device with teeth joining layers and method for making the same 有权
    具有齿接合层的电气装置及其制造方法

    公开(公告)号:US08581105B2

    公开(公告)日:2013-11-12

    申请号:US13632742

    申请日:2012-10-01

    Abstract: A process of making an article of manufacture, the process including constructing an electrical device which implements circuitry having a portion in cavities, the portion defined by an epoxy dielectric material delivered with solid content sufficient that etching the epoxy forms cavities located in, and underneath an initial surface of, the dielectric material, sufficient that the etching of the epoxy uses non-homogeneity with the solid content in bringing about formation of the cavities and sufficient that the etching of the epoxy is such that a plurality of the cavities have a cross-sectional width that is greater than a maximum depth with respect to the initial surface, wherein the etching forms the cavities, and a conductive material, a portion of the conductive material in the cavities thereby forming teeth in the cavities, such that the conductive material forms the portion of the circuitry of the electrical device.

    Abstract translation: 一种制造制品的方法,该方法包括构造电气装置,该电气装置实现具有空腔中的一部分的电路,该部分由环氧介质材料限定,该固体含量足以使环氧树脂形成位于其中并位于 电介质材料的初始表面足以使环氧树脂的蚀刻在形成空腔时与固体含量不均匀,并且足以使环氧树脂的蚀刻使得多个空腔具有横截面, 相对于初始表面大于最大深度的截面宽度,其中蚀刻形成空腔,并且导电材料,空腔中的导电材料的一部分从而在空腔中形成齿,使得导电材料形成 电气设备的电路部分。

    Direct metallization of electrically non-conductive polyimide substrate surfaces
    120.
    发明授权
    Direct metallization of electrically non-conductive polyimide substrate surfaces 有权
    非导电聚酰亚胺基板表面的直接金属化

    公开(公告)号:US07815785B2

    公开(公告)日:2010-10-19

    申请号:US11756048

    申请日:2007-05-31

    Abstract: The present invention relates to an improved method for the direct metallization of non-conductive substrate surfaces, in particular polyimide surfaces, that is characterized by the process steps of etching the substrate surface with an acidic etching solution that contains peroxide; contacting the etched substrate surface with an acidic treatment solution that contains permanganate; activating the treated substrate surface in an acidic activation solution that contains peroxide; contacting the activated substrate surface with an acidic catalytic solution that contains at least a thiophene derivate and at least a sulfonic acid derivate; metallization of the thus treated substrate surface in an acidic galvanic metallization bath.

    Abstract translation: 本发明涉及用于直接金属化非导电衬底表面,特别是聚酰亚胺表面的改进方法,其特征在于用含有过氧化物的酸性蚀刻溶液蚀刻衬底表面的工艺步骤; 使蚀刻的基底表面与含有高锰酸盐的酸性处理溶液接触; 在含有过氧化物的酸性活化溶液中活化经处理的底物表面; 使活化的底物表面与至少含有噻吩衍生物和至少一种磺酸衍生物的酸性催化溶液接触; 这样处理的基底表面在酸性电镀金属浴中的金属化。

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