公开(公告)号：US20020011574A1

公开(公告)日：2002-01-31

申请号：US09912365

申请日：2001-07-26

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Tetsuro Nakasugi

IPC: G21K005/10 ,  H01J037/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/087 ,  H01J37/3174 ,  H01J2237/31776

Abstract: Two or more-staged masks are prepared for a charged beam generating source. One mask has first aperture sections having rectangular apertures arranged into a lattice form, and electrodes which deflects a beam at respective first aperture sections. The other mask has a second aperture section having basic figure apertures for shaping the beam which passes or passed through the first aperture sections. Layout data of a semiconductor apparatus are divided into sizes of the basic figures which take reduction in exposure into consideration so as to be classified according to the basic figures. The beam which is shaped into a form of an overlapped portion of the divided layouts and the classified basic figure is emitted onto a sample.

Abstract translation: 为带电束产生源准备了两个或多个阶段的掩模。 一个掩模具有布置成格子形状的矩形孔的第一孔径部分和在相应的第一孔径部分偏转梁的电极。 另一个掩模具有第二孔径部分，其具有用于使通过或穿过第一孔部分的梁的成形的基本图形孔。 将半导体装置的布局数据分为基准图的尺寸，这些尺寸考虑到曝光量的降低，以便根据基本图形进行分类。 成形为分割布置的重叠部分的形式的光束和分类的基本图形被发射到样品上。

公开(公告)号：US20020000524A1

公开(公告)日：2002-01-03

申请号：US09828300

申请日：2001-04-06

Applicant: Nikon Corporation

Inventor： Kazuaki Suzuki ,  Mikio Ushijima

IPC: G21K005/10 ,  H01J037/08

CPC classification number: G03F7/70775 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7026 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/31794

Abstract: Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position relative to the projection-lens system, with consequent errors in image focus, rotation and magnification. Apparatus and methods are disclosed for monitoring changes in axial height position of the reticle, to facilitate making compensatory changes. Representative apparatus include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy. Reticle-position data can be used to regulate one or more parameters of exposure and/or axial position of the reticle or wafer.

Abstract translation: 由于其缺乏可观的厚度，用于带电粒子束（CPB）微光刻的掩模版易于弯曲和弯曲，导致相对于投影透镜系统的标线轴高度位置不稳定，导致图像聚焦的误差， 旋转和放大倍数。 公开了用于监测标线的轴向高度位置变化的装置和方法，以便于进行补偿性变化。 代表性装置包括用于检测掩模版的轴向高度位置的装置。 该装置产生一个或多个光束（IR到可见）以倾斜的入射角撞击光罩，检测从标线片表面反射的光，并且检测由高度检测器接收的反射光的横向偏移。 因此，准确地检测到掩模版焦点。 可以使用多个检测光束，从而能够高精度地检测光罩的轴向高度位置和倾斜度。 标线片位置数据可用于调节掩模版或晶片的曝光和/或轴向位置的一个或多个参数。

公开(公告)号：US20010054700A1

公开(公告)日：2001-12-27

申请号：US09879940

申请日：2001-06-14

Applicant: ASAHI KOGAKU KOGYO KABUSHIKI KAISHA

Inventor： Takashi Iizuka

IPC: G21K005/10 ,  H01J037/08

CPC classification number: G03F7/70691 ,  G21K5/10

Abstract: A laser imaging apparatus for forming an image on a surface of a substrate is provided with a laser source that emits a laser beam, a table mounting the substrate, the table being movable in a first direction within a predetermined plane, a scanning optical system which receives and deflects the laser beam emitted by the laser source to form a scanning beam spot on the substrate, the scanning beam spot scanning in a second direction that is perpendicular to the first direction, and a mechanism that moves the scanning optical system in the second direction.

Abstract translation: 一种用于在基板的表面上形成图像的激光成像装置设置有发射激光束的激光源，安装基板的工作台，能够在预定平面内沿第一方向移动的扫描光学系统， 接收并偏转由激光源发射的激光束，以在基板上形成扫描光束点，沿与第一方向垂直的第二方向扫描光束点扫描，以及使第二扫描光学系统移动的机构 方向。

公开(公告)号：US20010038954A1

公开(公告)日：2001-11-08

申请号：US09893151

申请日：2001-06-26

Applicant: METRON TECHNOLOGY

Inventor： Eryn Smith

IPC: G03F009/00 ,  G03C005/00 ,  G21K005/10 ,  H01J037/08 ,  C23C016/00

CPC classification number: G03F1/30 ,  G03F1/72

Abstract: A method and apparatus for correcting phase shift defects in a photomask is provided by scanning the photomask for the defect and determining locations of at least one defect. Following the determination of the location of a defect, the defect is three-dimensionally analyzed producing three-dimensional results. Utilizing the three-dimensional results, a focus ion beam (FIB) is directed onto the defect to eliminate the defect. The FIB is controlled by an etch map which is generated based on the three-dimensional results. To provide further precision to the repairing of the photomask, test patterns of the FIB are generated and three-dimensionally analyzed. The three-dimensional test pattern results are further utilized in generating the etch map to provide greater control to the FIB.

Abstract translation: 通过扫描用于缺陷的光掩模和确定至少一个缺陷的位置来提供用于校正光掩模中的相移缺陷的方法和装置。 在确定缺陷的位置之后，三维分析缺陷产生三维结果。 利用三维结果，聚焦离子束（FIB）被引导到缺陷上以消除缺陷。 FIB由基于三维结果生成的蚀刻图控制。 为了进一步提高光掩模的修复精度，生成FIB的测试图案并对其进行三维分析。 三维测试图案结果进一步用于生成蚀刻图以提供对FIB的更大控制。

公开(公告)号：US20010030295A1

公开(公告)日：2001-10-18

申请号：US09853448

申请日：2001-05-10

Inventor： Richard A. Holl

IPC: G21K005/10 ,  H01J037/08

CPC classification number: B01F7/008 ,  B01F7/005 ,  B01F13/0001 ,  B01F15/00714 ,  B01F15/00909 ,  B01F2013/1086 ,  B01J19/082 ,  B01J19/10 ,  B01J19/122 ,  B01J19/125 ,  B01J19/126 ,  B01J19/127 ,  B01J19/18 ,  B01J19/1887 ,  B01J2208/00 ,  B01J2219/00094 ,  B01J2219/00141 ,  B01J2219/00146 ,  B01J2219/00164 ,  B01J2219/00166 ,  B01J2219/00168 ,  B01J2219/0888 ,  B01J2219/1227 ,  B01J2219/182 ,  B01J2219/1943 ,  B22F2998/00 ,  B29B7/401 ,  B29B7/90 ,  B29C47/0009 ,  B29C47/50 ,  B29K2021/00 ,  B29K2105/16 ,  B29K2503/04 ,  C02F1/30 ,  C02F1/302 ,  C02F1/32 ,  C02F1/36 ,  C08K3/01 ,  F28D11/02 ,  C22C32/0094

Abstract: A window allows the introduction of radiation energy into an annular processing chamber filled with a material to be processed. The chamber is formed from coaxial cylinder members rapidly rotating relative to one another. The chamber can be thin enough so that it is short compared to the penetration depth of the radiation through the material, providing even exposure of the material to the radiation. Also, eddies created in the material by the relative rotation enhances the even exposure. When the material inside the annular processing chamber is opaque, resulting in an insignificant penetration depth, the eddies still insure that the material is evenly exposed to the irradiation.

Abstract translation: 窗口允许将辐射能量引入填充有待处理材料的环形处理室中。 腔室由相对于彼此快速旋转的同轴圆柱体构件形成。 该室可以足够薄，使得其与通过材料的辐射的穿透深度相比较短，从而提供材料对辐射的均匀曝光。 此外，通过相对旋转在材料中创建的涡流增强了均匀曝光。 当环形处理室内部的材料不透明时，导致渗透深度不明显，涡流仍然确保材料均匀地暴露于辐射。

公开(公告)号：US20010028046A1

公开(公告)日：2001-10-11

申请号：US09824880

申请日：2001-04-04

Inventor： Shinichi Hamaguchi ,  Takeshi Haraguchi ,  Hiroshi Yasuda

IPC: G21K005/10 ,  H01J037/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/1205

Abstract: An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.

Abstract translation: 用于曝光晶片的电子束曝光装置包括：可操作以彼此独立地会聚多个电子束的多轴电子透镜; 以及透镜强度调节器，其包括设置为基本上平行于所述多轴电子透镜的基板，以及透镜强度调节单元，其可操作以调节施加到通过所述多轴电子透镜的电子束的多轴电子透镜的透镜强度 镜头开口。

公开(公告)号：US20010025932A1

公开(公告)日：2001-10-04

申请号：US09820257

申请日：2001-03-28

Applicant: Nikon Corporation

Inventor： Mamoru Nakasuji

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26 ,  G21K005/10 ,  H01J037/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0458 ,  H01J2237/202

Abstract: Charged-particle-beam (CPB) microlithography apparatus are disclosed that do not require installation in a magnetically shielded room, and that exhibit improved attenuation of the incursion of magnetic fields, originating in linear motors used to drive motions of the reticle and substrate stages, to the charged particle beam. The illumination-optical and projection-optical systems are enclosed in respective columns made of a thick ferromagnetic material. The reticle and substrate chambers are similarly constructed. Consequently, there is very low incursion of external magnetic fields to the beam in the columns. The reticle and substrate chambers include partition shields, each having a multi-layer construction with alternating layers of ferromagnetic material sandwiched with layers of non-magnetic material, attached via non-magnetic material to the respective chambers. The partition shields prevent magnetic fields from the respective linear motors from reaching the beam inside the columns.

Abstract translation: 公开了带电粒子束（CPB）微光刻设备，其不需要安装在磁屏蔽室中，并且显示出来源于用于驱动标线片和衬底台的运动的线性电动机的磁场侵入的改善的衰减， 到带电粒子束。 照明光学和投影光学系统被包围在由厚铁磁材料制成的各个列中。 类似地构造掩模版和衬底室。 因此，外部磁场对列中的梁的侵入非常低。 标线板和衬底室包括分隔屏蔽，每个隔板具有多层结构，其中夹有非磁性材料层的铁磁材料的交替层，通过非磁性材料附着到各个室。 隔板防止各线性电机的磁场到达列内的梁。

公开(公告)号：US20010021476A1

公开(公告)日：2001-09-13

申请号：US09761810

申请日：2001-01-16

Inventor： Fritz Gans ,  Uwe Griesinger ,  Rainer Pforr

IPC: G03B027/42 ,  G03F009/00 ,  G21K005/10 ,  H01J037/08

CPC classification number: G03F1/30 ,  G03F1/32 ,  G03F1/34

Abstract: The phase mask is provided for illuminating a photo-sensitive layer in a photolithography process for producing integrated circuits with a predetermined pattern of optically transmissive regions. The phase mask is configured, in zones in which the distances between neighboring regions in at least one geometrical direction are less than a predetermined limiting distance, in each case as an alternating phase mask. The zones with isolated contact windows are in each case configured as a halftone phase mask or a chromeless phase mask.

Abstract translation: 提供相位掩模用于在用于制造具有预定图案的光学透射区域的集成电路的光刻工艺中照射光敏层。 相位掩模被配置为在至少一个几何方向上的相邻区域之间的距离小于预定的限制距离的区域中，在每个情况下，作为交替相位掩模。 具有隔离接触窗口的区域在每种情况下都配置为半色调相位掩模或无铬相位掩模。

公开(公告)号：US20010013581A1

公开(公告)日：2001-08-16

申请号：US09826913

申请日：2001-04-06

Inventor： Akio Takemoto ,  Yoshihisa Ooaeh ,  Tomohiko Abe ,  Hiroshi Yasuda ,  Takamasa Satoh ,  Hideki Nasuno ,  Hidefumi Yabara ,  Kenichi Kawakami ,  Kiichi Sakamoto ,  Tomohiro Sakazaki ,  Isamu Seto ,  Masami Takigawa ,  Tatsuro Ohkawa

IPC: G21K005/10 ,  H01J037/08

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/024 ,  H01J2237/1502 ,  H01J2237/1504 ,  H01J2237/216 ,  H01J2237/30472

Abstract: A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

公开(公告)号：US20010013580A1

公开(公告)日：2001-08-16

申请号：US09777701

申请日：2001-02-07

Inventor： Edwin J. Buis ,  Noud J. Gilissen ,  Yim Bun P. Kwan ,  Paulus H.C.M. Schapendonk

IPC: G21K005/10 ,  H01J037/08

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70891 ,  H02K3/24 ,  H02K9/22 ,  H02K41/0356

Abstract: A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each channel being arranged such as to be substantially located in a portion of the cooling jacket adjacent to the coil., for use in a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a first object table for holding a mask; a second object table for holding a substrate; a projection system for imaging irradiated portions of the mask onto target portions of the substrate. The cooling jacket may be formed of a ceramic material and preferably is of a monolithic construction.

Abstract translation: 一种音圈电机，其用于与第一物体台或第二物体台相关联的定位装置中，其中线圈用与线圈热接触的冷却套冷却，冷却套包括至少一个通道，用于循环 冷却流体，所述或每个通道被布置成基本上位于与线圈相邻的冷却套管的一部分中，用于光刻投影设备，包括：辐射系统，用于提供投射射束; 用于保持掩模的第一物体表; 用于保持基板的第二物镜台; 投影系统，用于将掩模的照射部分成像到基板的目标部分上。 冷却套可以由陶瓷材料形成，并且优选地是整体结构。