公开(公告)号：US07348567B1

公开(公告)日：2008-03-25

申请号：US11545975

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J37/04

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070235659A1

公开(公告)日：2007-10-11

申请号：US11689870

申请日：2007-03-22

Applicant: Asher Pearl

Inventor： Asher Pearl

IPC: G21K1/08

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method and apparatus for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法和装置。 由此，引入散焦，并将基于图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正散光的方法。 因此，对于在将信号改变为标示符时产生的一组帧来评估清晰度。

公开(公告)号：US07271396B2

公开(公告)日：2007-09-18

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20070200070A1

公开(公告)日：2007-08-30

申请号：US11364299

申请日：2006-02-28

Applicant: Rudolf Tromp

Inventor： Rudolf Tromp

IPC: H01J37/153 ,  G01N23/225 ,  G01N23/227 ,  H01J37/05 ,  H01J37/26 ,  H01J49/46

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/252 ,  H01J37/295 ,  H01J2237/055 ,  H01J2237/1534 ,  H01J2237/2538 ,  H01J2237/2544

Abstract: An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first magnetic deflector is also configured for projection of a first energy dispersed electron diffraction pattern in an exit plane of the first magnetic deflector. The instrument also has an electrostatic lens disposed in the exit plane of a first magnetic deflector, as well as a second magnetic deflector substantially identical to the first magnetic deflector. The second magnetic deflector is disposed for reception of the first energy dispersed electron diffraction pattern from the electrostatic lens. The second magnetic deflector is also configured for projection of a second non-dispersed electron diffraction pattern in a first exit plane of the second magnetic deflector. The instrument also has an electron mirror configured for correction of one or more aberrations in the second non-dispersed electron diffraction pattern. The electron mirror is disposed for reflection of the second non-dispersed electron diffraction pattern to the second magnetic deflector for projection of a second energy dispersed electron diffraction pattern in a second exit plane of the second magnetic deflector.

Abstract translation: 提供了一种像差校正显微镜仪器。 仪器具有设置用于接收第一非分散电子衍射图案的第一磁偏转器。 第一磁偏转器还被配置用于在第一磁偏转器的出射平面中投射第一能量分散电子衍射图案。 仪器还具有设置在第一磁偏转器的出射平面中的静电透镜以及与第一磁偏转器基本相同的第二磁偏转器。 第二磁偏转器被设置用于从静电透镜接收第一能量分散电子衍射图案。 第二磁偏转器还被配置用于在第二磁偏转器的第一出射平面中投射第二非分散电子衍射图案。 仪器还具有配置用于校正第二非分散电子衍射图案中的一个或多个像差的电子反射镜。 电子反射镜被设置用于将第二非分散电子衍射图案反射到第二磁偏转器，用于在第二磁偏转器的第二出射平面中投射第二能量分散电子衍射图案。

公开(公告)号：US20070164228A1

公开(公告)日：2007-07-19

申请号：US11568175

申请日：2005-06-20

Applicant: Juergen Frosien

Inventor： Juergen Frosien

IPC: H01J1/50

CPC classification number: H01J37/153 ,  H01J49/06 ,  H01J49/288 ,  H01J2237/057 ,  H01J2237/1534

Abstract: The present invention provides an aberration correction device (100). The aberration correction device comprises a Wien filter element (110), a quadrupole element (310) for compensating a focusing property of the Wien filter element (110), and at least one multipole element (410) for spherical aberration correction. The Wien filter element (110) and said quadrupole element (310) are adapted to generate, in combination, an astigmatic image. Furthermore, the at least one multipole element (410) is adapted to act essentially in a plane of sagittal or meridional focus of the astigmatic image. Thereby, chromatic aberration is reduced as well as spherical aberration can be corrected.

Abstract translation: 本发明提供一种像差校正装置（100）。 像差校正装置包括维恩滤波器元件（110），用于补偿维恩滤波器元件（110）的聚焦特性的四极元件（310）和用于球面像差校正的至少一个多极元件（410）。 维恩滤波器元件（110）和所述四极元件（310）适于组合地产生像散图像。 此外，至少一个多极元件（410）适于基本上在像散图像的矢状或子午焦点的平面中起作用。 从而，可以减小色差，并且可以校正球面像差。

公开(公告)号：US07244949B2

公开(公告)日：2007-07-17

申请号：US11366533

申请日：2006-03-03

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle

IPC: G21K5/10 ,  G21K7/00 ,  H01J37/28

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract translation: 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US20070158568A1

公开(公告)日：2007-07-12

申请号：US11645567

申请日：2006-12-27

Applicant: Taisuke Nakamura ,  Kuniyasu Nakamura

Inventor： Taisuke Nakamura ,  Kuniyasu Nakamura

IPC: G21K7/00

CPC classification number: H01J37/153 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/2802

Abstract: In the type of scanning transmission electron microscopes carrying an aberration corrector, a method of assuring more simplified and manipulatable adjustment of the corrector and a scanning transmission electron microscope having that function are provided. A Ronchigram image is acquired using a spherical standard specimen and parameters necessary for the adjustment are acquired from the thus obtained Ronchigram.

Abstract translation: 在携带像差校正器的扫描透射电子显微镜的类型中，提供了确保校正器的更简化和可操作调节的方法以及具有该功能的扫描透射电子显微镜。 使用球形标准样品获得Ronchigram图像，并且从由此获得的Ronchigram获得调整所需的参数。

公开(公告)号：US07211804B2

公开(公告)日：2007-05-01

申请号：US10990498

申请日：2004-11-18

Applicant: Takaho Yoshida ,  Takeshi Kawasaki

Inventor： Takaho Yoshida ,  Takeshi Kawasaki

IPC: G21K1/08 ,  G21K7/00

CPC classification number: H01J37/153

Abstract: The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus.An intermediate potential region different from the ground potential of an aberration corrector is provided in the space between the stages of multipole lenses constructing the aberration corrector to adjust a potential. Using this, when selecting an incident (outgoing) condition, an outgoing (incident) condition can be adjusted.

Abstract translation: 本发明提供一种像差校正器，其在装入的带电粒子束装置的设定光学条件之外的条件下起作用。 在构成像差校正器的多极透镜的阶段之间的空间中设置与像差校正器的接地电位不同的中间电位区域，以调整电位。 使用此方法，当选择事件（输出）条件时，可以调整输出（事件）条件。

公开(公告)号：US20070029509A1

公开(公告)日：2007-02-08

申请号：US11545976

申请日：2006-10-10

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: G21K5/10

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20070018112A1

公开(公告)日：2007-01-25

申请号：US11527206

申请日：2006-09-25

Applicant: Pieter Kruit

Inventor： Pieter Kruit

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.