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公开(公告)号：US12044979B2
公开(公告)日：2024-07-23
申请号：US18122655
申请日：2023-03-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Yichen Zhang , Sarathi Roy
CPC classification number: G03F7/705 , G03F7/70633 , G06F17/18 , G06F18/24
Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.
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公开(公告)号：US20240242930A1
公开(公告)日：2024-07-18
申请号：US18563841
申请日：2022-05-18
Applicant: ASML Netherlands B.V.
Inventor： Jan BEX , Nickolay STEPANENKO , Matthias OBERST , Harald Gert Helmut NEUBAUER , Thomas SCHWEIGER , Florian Alfons STIEGLITZ , Bernd Michael VOLLMER
IPC: H01J37/244 , G01T1/24 , G01T1/29
CPC classification number: H01J37/244 , G01T1/24 , G01T1/2928 , H01J2237/2441
Abstract: A charged particle detector may include a plurality of sensing elements formed in a substrate, wherein a sensing element of the plurality of sensing elements is formed of a first region on a first side of the substrate, and a second region on a second side of the substrate, the second side being opposite to the first side. The detector may also include a plurality of third regions formed on the second side of the substrate, the third regions including one or more circuit components. The detector may also include an array of fourth regions formed on the second side of the substrate, the array of fourth regions being between adjacent third regions.
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公开(公告)号：US20240241436A1
公开(公告)日：2024-07-18
申请号：US18289384
申请日：2022-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Xingyue PENG , Rafael C. HOWELL , Yen Wen LU , Xiaorui CHEN
Abstract: Methods and systems for determining a mask rule check violation (MRC) associated with a mask feature using a detector having geometric properties corresponding to the MRC. The detector (e.g., elliptical shaped) is configured to include a curved portion to detect a curvature violation, include an enclosed area (e.g., a fully enclosed area or a partially enclosed area having an opening), include a predefined orientation axis configured to guide relative positioning of the detector with a mask feature, and include a length to detect a critical dimension violation. The orientation axis of the detector is aligned with a normal axis at a location on the mask feature. Based on the orientation axis aligned with the normal axis of the mask feature, an MRC violation is determined corresponding to a region of the mask feature that intersects the enclosed area.
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公开(公告)号：US12038694B2
公开(公告)日：2024-07-16
申请号：US18118695
申请日：2023-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Youping Zhang , Maxime Philippe Frederic Genin , Cong Wu , Jing Su , Weixuan Hu , Yi Zou
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/70675
Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.
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公开(公告)号：US12019377B2
公开(公告)日：2024-06-25
申请号：US17299531
申请日：2019-12-04
Applicant: ASML Netherlands B.V.
Inventor： Maurits Van Der Schaar , Olger Victor Zwier , Patrick Warnaar
CPC classification number: G03F7/70633 , G01N21/4788 , G03F7/70683
Abstract: A target for determining a performance parameter of a lithographic process, the target comprising a first sub-target formed by at least two overlapping gratings, wherein the underlying grating of the first sub-target has a first pitch and the top lying grating of the first sub-target has a second pitch, at least a second sub-target formed by at least two overlapping gratings, wherein the underlying grating of the second sub-target has a third pitch and the top lying grating of the second sub-target has a fourth pitch.
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Patent Agency Ranking
公开(公告)号：US12013647B2
公开(公告)日：2024-06-18
申请号：US17419648
申请日：2019-12-24
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Marc Johannes Noot , Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Grzegorz Grzela , Timothy Dugan Davis , Olger Victor Zwier , Ralph Timotheus Huijgen , Peter David Engblom , Jan-Willem Gemmink
CPC classification number: G03F7/70633 , G01N21/47 , G06T7/0004 , G01N2021/4735 , G06T2207/30148
Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.
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公开(公告)号：US20240192608A1
公开(公告)日：2024-06-13
申请号：US18571913
申请日：2022-05-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Shikhar BHARDWAJ
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/7085 , G03F7/70875 , G03F7/70916
Abstract: A tool for assessing a hole property of one or more holes in a component of a lithographic apparatus, the tool including: an assessment substrate; a fluid supply configured to supply a jet of fluid from each of the one or more holes to a first surface of the assessment substrate, wherein the fluid is supplied at a fluid temperature such that the one or more jets of fluid cause local temperature variations in at least part of the assessment substrate; and an infrared sensor configured to sense a temperature distribution of the assessment substrate in dependence on the local temperature variations.
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公开(公告)号：US12007699B2
公开(公告)日：2024-06-11
申请号：US17787235
申请日：2020-11-13
Applicant: ASML Netherlands B.V.
Inventor： Sander Kerssemakers , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Henricus Gerardus Tegenbosch
CPC classification number: G03F7/70841 , G03F7/70033 , G03F7/70975 , H05G2/005 , H05G2/008
Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.
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公开(公告)号：US12007219B2
公开(公告)日：2024-06-11
申请号：US17282141
申请日：2019-09-09
Applicant: ASML Netherlands B.V.
Inventor： Erwin Van Dorp
CPC classification number: G01B11/0608 , G01B21/042 , G01C3/08
Abstract: The invention provides an apparatus configured for determining a distance of the apparatus to an object according to the principle of triangulation. The apparatus comprises a transmissive device with a predefined distance between a first surface and a second surface of the transmissive device, and a detector that is configured to receive at least a portion of a radiation beam after interaction with the transmissive device and the object. The first surface is arranged to reflect a first part of the radiation beam, and the second surface is arranged to reflect a second part of the radiation beam. The predefined distance is used for determining the distance of the apparatus to the object.
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公开(公告)号：US20240183655A1
公开(公告)日：2024-06-06
申请号：US18279030
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander VON FINCK , Simon HALM , Ingo Juergen MARKEL , Maciej NEUMANN-RÖBISCH
CPC classification number: G01B11/303 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N2021/4742 , G01N2021/4783 , G01N2021/8835 , G01N2021/8845 , G01N2021/8848 , G01N2201/0612 , G01N2201/062 , G01N2201/08
Abstract: A measuring apparatus has at least two radiation sources arranged to illuminate a measuring region of a surface of a sample, the at least two sources configured to illuminate the measuring region along at least two illumination beam paths at different angles of incidence relative to a surface normal of the surface, a detector device configured to detect at least two scattered radiation images of surface sections in the illuminated measuring region at a predetermined viewing angle relative to the surface normal of the surface, portions of the scattered radiation received by the detector device, which portions are formed in each case by the illumination in one of the illumination beam paths, in each case having a common spatial frequency, and an evaluation device configured to determine at least one roughness feature of the surface sections from the at least two scattered radiation images.
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