公开(公告)号：US20230236512A1

公开(公告)日：2023-07-27

申请号：US18118695

申请日：2023-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Youping ZHANG ,  Maxime Philippe Frederic Genin ,  Cong Wu ,  Jing Su ,  Weixuan Hu ,  Yi Zou

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70675

Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.

公开(公告)号：US11635699B2

公开(公告)日：2023-04-25

申请号：US17312709

申请日：2019-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Youping Zhang ,  Maxime Philippe Frederic Genin ,  Cong Wu ,  Jing Su ,  Weixuan Hu ,  Yi Zou

IPC: G03F7/20

Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.

公开(公告)号：US12038694B2

公开(公告)日：2024-07-16

申请号：US18118695

申请日：2023-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Youping Zhang ,  Maxime Philippe Frederic Genin ,  Cong Wu ,  Jing Su ,  Weixuan Hu ,  Yi Zou

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70675

Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.