公开(公告)号：US20240412407A1

公开(公告)日：2024-12-12

申请号：US18437115

申请日：2024-02-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Junghee Cho ,  Yunje Cho ,  Kwangrak Kim ,  Jonghyeok Park

IPC: G06T7/73 ,  G06T7/00 ,  G06T7/246 ,  G06T7/60 ,  H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/22 ,  H01L21/68

Abstract: A semiconductor manufacturing device includes an electron beam source emitting; a plurality of condenser lenses disposed between a stage on which an object including structures is seated and the electron beam source; an objective lens disposed between the plurality of condenser lenses and the stage; an aperture disposed between the plurality of condenser lenses; and a controller configured to acquire a plurality of original images according to a working distance between the objective lens and the object, acquire a pattern image indicating the structures from the plurality of original images, a plurality of kernel images indicating distribution of an electron beam on the object, and a plurality of position vectors indicating a relative position of the structures in the plurality of kernel images, and adjust a position of the aperture based on a motion vector indicating movement of the plurality of position vectors according to the working distance.

公开(公告)号：US20240402104A1

公开(公告)日：2024-12-05

申请号：US18801091

申请日：2024-08-12

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Gero Storeck ,  David Disterheft ,  Holger Kierey

IPC: G01N23/2251 ,  H01J37/09 ,  H01J37/10

Abstract: A multi-beam particle microscope can reduce particle beam-induced traces on a sample at which a high voltage is present. The occurrence of additional residual gas in the sample chamber is reduced using a specific objective lens cable and/or a specific sample stage cable, which are specifically shielded.

公开(公告)号：US20240266140A1

公开(公告)日：2024-08-08

申请号：US18619397

申请日：2024-03-28

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Sho KAWATSU ,  Masateru SATO

IPC: H01J37/08 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/061

Abstract: An ion generation device includes an arc chamber including an internal space and including a front slit for extracting an ion beam from plasma generated in the internal space, a magnetic field generator that generates a magnetic field applied in an axial direction in the internal space, and a first cathode configured to supply a thermoelectron into the internal space. The first cathode includes a first cathode cap, a first heat source, and a first thermal shield including a first extension portion. A first tip portion, and a first tip opening, and a first opening width of the first tip opening in the radial direction is smaller than a maximum width of the first cathode cap in the radial direction.

公开(公告)号：US20240258065A1

公开(公告)日：2024-08-01

申请号：US18424034

申请日：2024-01-26

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Kai Wicker ,  Bjoern Gamm ,  Yauheni Novikau ,  Ralf Wolleschensky

IPC: H01J37/21 ,  G06T7/00 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/153 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/21 ,  G06T7/0002 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/222 ,  H01J37/28 ,  G06T2207/10148 ,  G06T2207/20221 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/24578

Abstract: Particle beam systems, for example electron beam microscopes, exhibit improved resolution in a first direction by manipulating a beam of charged particles so that the beam has a non-circular beam profile in a focal plane of an objective lens. Multiple images of a sample can be recorded at different orientations of the beam profile relative to the sample, and the recorded images can be synthesized using non-uniform spatial-frequency weights to obtain an image of the sample having improved resolution in any direction. The orientation of the beam profile can be adjusted to a target orientation depending on a structure on a sample prior to recording an image of the sample, thereby making it possible to achieve highest resolution in a selected direction of interest.

公开(公告)号：US12046443B2

公开(公告)日：2024-07-23

申请号：US17532358

申请日：2021-11-22

Applicant: Applied Materials, Inc.

Inventor： Klaus Becker ,  Luigi G. Amato ,  Elvis Gomez ,  David Burgdorf ,  Victor Theriault ,  Thomas Stewart

IPC: H01J37/08 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/3171

Abstract: A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.

公开(公告)号：US20240242927A1

公开(公告)日：2024-07-18

申请号：US18562345

申请日：2022-05-24

Applicant: National Institute of Advanced Industrial Science and Technology

Inventor： Toshihiko OGURA

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/24 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/09 ,  H01J37/28 ,  H01J37/24

Abstract: A sample holder for an impedance microscope according to an aspect includes: a first insulating film having a front surface and a back surface; a second insulating film having a front surface facing the back surface of the first insulating film and a back surface; a conductive film disposed on the front surface of the first insulating film; an electrode disposed to face the back surface of the second insulating film; and a conductive member fixed at a ground potential or a constant potential, in which the conductive member has an opening located between the first insulating film and the electrode.

公开(公告)号：US20240208762A1

公开(公告)日：2024-06-27

申请号：US18536792

申请日：2023-12-12

Applicant: JEOL Ltd.

Inventor： Tsutomu Negishi ,  Munehiro Kozuka

IPC: B65H35/00 ,  B65H59/06 ,  H01J37/09

CPC classification number: B65H35/002 ,  B65H59/06 ,  H01J37/09 ,  H01J37/3053

Abstract: There is provided a shield plate fabrication apparatus capable of fabricating a shield plate easily. The shield plate is included in a sample milling apparatus which mills a sample by shielding a part of the sample with the shield plate and irradiating the sample with a charged particle beam. The fabrication apparatus includes: a base plate holding shaft for rotatably holding a base plate and winding tape around the base plate; and a tension mechanism for applying tension to the tape while it is being wound around the base plate.

公开(公告)号：US12020894B2

公开(公告)日：2024-06-25

申请号：US17324301

申请日：2021-05-19

Applicant: JEOL Ltd.

Inventor： Shio En ,  Takashi Sato

IPC: H01J37/147 ,  B22F10/80 ,  B22F12/41 ,  B23K15/00 ,  B23K15/02 ,  B33Y30/00 ,  B33Y50/00 ,  H01J37/09

CPC classification number: H01J37/1474 ,  B22F10/80 ,  B22F12/41 ,  B23K15/002 ,  B23K15/0086 ,  B23K15/02 ,  B33Y30/00 ,  B33Y50/00 ,  H01J37/09

Abstract: A beam adjustment method includes: installing, on an irradiation surface to which an electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam, and installing, on a side of an electron gun further than the detection part, a shielding plate having opening holes through which the electron beam is passable. The method includes causing, upon performing beam diameter measurement processing, the electron beam to pass through the opening holes, and radiating the electron beam to the Faraday cup. In addition, the method includes radiating, upon performing normal processing, the electron beam to the shielding plate.

公开(公告)号：US20240136148A1

公开(公告)日：2024-04-25

申请号：US18461180

申请日：2023-09-04

Applicant: NuFlare Technology, Inc.

Inventor： Yasutaka SATO ,  Hironori MIZOGUCHI ,  Toru HINATA ,  Toshiki KIMURA ,  Kiminobu AKENO

IPC: H01J37/244 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/1501 ,  H01J2237/24564

Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.

公开(公告)号：US20230411109A1

公开(公告)日：2023-12-21

申请号：US17807362

申请日：2022-06-16

Applicant: FEI Company

Inventor： Sean M. Kellogg ,  Mostafa Maazouz ,  James B. McGinn

IPC: H01J37/09 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/09 ,  H01J37/244 ,  H01J37/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/0458

Abstract: Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.