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公开(公告)号：US10908517B2
公开(公告)日：2021-02-02
申请号：US16615810
申请日：2018-04-18
Applicant: ASML Netherlands B.V.
Inventor： Jean-Philippe Xavier Van Damme , Laurentius Johannes Adrianus Van Bokhoven , Petrus Franciscus Van Gils , Gerben Pieterse
Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.
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2.发明授权公开(公告)号：US10409174B2
公开(公告)日：2019-09-10
申请号：US15317386
申请日：2015-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Aart Adrianus Van Beuzekom , Jozef Augustinus Maria Alberti , Hubert Marie Segers , Ronald Van Der Ham , Francis Fahrni , Ruud Olieslagers , Gerben Pieterse , Cornelius Maria Rops , Pepijn Van Den Eijnden , Paul Van Dongen , Bas Willems
Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
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公开(公告)号：US09785055B2
公开(公告)日：2017-10-10
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US12072636B2
公开(公告)日：2024-08-27
申请号：US17641206
申请日：2020-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Wilhelmus Polet , Koen Steffens , Ronald Van Der Ham , Gerben Pieterse , Erik Henricus Egidius Catharina Eummelen , Francis Fahrni
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70733 , G03F7/70991
Abstract: A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.
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5.发明授权公开(公告)号：US11300890B2
公开(公告)日：2022-04-12
申请号：US16722924
申请日：2019-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC: G03F7/20
Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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Patent Agency Ranking
6.发明授权公开(公告)号：US10520837B2
公开(公告)日：2019-12-31
申请号：US15932215
申请日：2018-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC: G03F7/20
Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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7.发明申请公开(公告)号：US20190391499A1
公开(公告)日：2019-12-26
申请号：US16564969
申请日：2019-09-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Aart Adrianus VAN BEUZEKOM , Jozef Augustinus Maria Alberti , Hubert Marie Segers , Ronald Van Der Ham , Francis Fahrni , Ruud Olieslagers , Gerben Pieterse , Cornelius Maria Rops , Pepijn Van Den Eijnden , Paul Van Dongen , Bas Willems
Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.
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公开(公告)号：US10324384B2
公开(公告)日：2019-06-18
申请号：US15320300
申请日：2015-06-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Gerben Pieterse , Theodorus Wilhelmus Polet , Johannes Jacobus Matheus Baselmans , Willem Jan Bouman , Theodorus Marinus Modderman , Cornelius Maria Rops , Bart Smeets , Koen Steffens , Ronald Van Der Ham
IPC: G03F7/20
Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.
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公开(公告)号：US10481502B2
公开(公告)日：2019-11-19
申请号：US15918478
申请日：2018-03-12
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US20150131064A1
公开(公告)日：2015-05-14
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
Abstract translation: 一种用于支撑物体的物体表，具有支撑体的物体表，用于保持物体的物体保持器，邻近物体保持器的边缘的开口以及经由通道与开口流体连通的通道，其中通道 由与限定通道的第二材料不同的第一材料限定。
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