公开(公告)号：US10409174B2

公开(公告)日：2019-09-10

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus Van Beuzekom ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC: H01L21/52 ,  H01L21/67 ,  G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US10656536B2

公开(公告)日：2020-05-19

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Niek Elout De Kruijf ,  Mircea Dusa ,  Martijn Houben ,  Johannes Gerardus Maria Mulder ,  Thomas Poiesz ,  Marco Adrianus Peter Van Den Heuvel ,  Paul Van Dongen ,  Justin Johannes Hermanus Gerritzen ,  Antonie Hendrik Verweij ,  Abraham Alexander Soethoudt

IPC: B25B11/00 ,  G03F7/20 ,  H01L21/683

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20190391499A1

公开(公告)日：2019-12-26

申请号：US16564969

申请日：2019-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/52

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US11226568B2

公开(公告)日：2022-01-18

申请号：US16762589

申请日：2018-09-27

Applicant: ASML Netherlands B.V.

Inventor： Paul Van Dongen ,  Aart Adrianus Van Beuzekom

IPC: G03F7/20 ,  H01L21/673 ,  H01L21/687 ,  H01L21/677 ,  H01L21/027

Abstract: A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.

公开(公告)号：US10916453B2

公开(公告)日：2021-02-09

申请号：US16564969

申请日：2019-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus Van Beuzekom ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC: H01L21/67 ,  H01L21/52 ,  G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.