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公开(公告)号：US20240363378A1
公开(公告)日：2024-10-31
申请号：US18140365
申请日：2023-04-27
发明人： Thomas ACKERMANN , Laura ESPOSITO , Emir SABANOVIC
IPC分类号： H01L21/673 , C23C16/458 , C30B25/10 , C30B25/12
CPC分类号： H01L21/67306 , C23C16/4583 , C30B25/105 , C30B25/12
摘要： Disclosed herein are a shaft for supporting a susceptor within an epitaxial growth apparatus, and an epitaxial growth apparatus having the same. In one example, the shaft for supporting a susceptor within an epitaxial growth apparatus includes a support column, a post, and a plurality of arms. The post is coupled with a support column. The post includes an infrared transmission reducing portion disposed proximately to the susceptor and having a lower transmissivity of infrared radiation than the support column. The plurality of arms extend radially from the support column and are configured to support the susceptor.
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公开(公告)号：US20240355593A1
公开(公告)日：2024-10-24
申请号：US18136276
申请日：2023-04-18
发明人： Melvin Verbaas , Einosuke Tsuda
IPC分类号： H01J37/32 , C23C16/458 , C23C16/46 , C23C16/509 , C23C16/52 , H01L21/683
CPC分类号： H01J37/32715 , C23C16/4583 , C23C16/46 , C23C16/509 , C23C16/52 , H01J37/32568 , H01L21/6833 , H01J37/32082 , H01J2237/002 , H01J2237/2007
摘要： An electrostatic chuck (ESC) for holding a workpiece in a plasma processing chamber, where the ESC includes a monolithic insulating substrate with a top surface; a plurality of electrodes embedded in the insulating substrate, the plurality of electrodes being in a multipolar configuration to receive multiple DC bias signals from a first power supply circuit; and a radio frequency (RF) electrode embedded in the insulating substrate, the plurality of electrodes being located between the top surface and the RF electrode, the RF electrode including a contact node configured to be coupled to a second power supply circuit configured to generate an RF signal.
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公开(公告)号：US20240347372A1
公开(公告)日：2024-10-17
申请号：US18632421
申请日：2024-04-11
IPC分类号： H01L21/687 , C23C16/458 , C30B25/12
CPC分类号： H01L21/68785 , C23C16/4583 , H01L21/6875 , C30B25/12
摘要： Described herein are a susceptor, processing chambers having the same, and method for substrate processing using the same. In one example, a susceptor for supporting a substrate during processing is provided. The susceptor has a disk shaped body that includes a rim circumscribing an inner region. The inner region is recessed to form a recessed pocket that is configured to receive a substrate. A plurality of bumps extend radially into the inner region that are configured to contact an outer edge of the substrate when the substrate is disposed in the recessed pocket. A venting region is defined within the inner region. The venting region is defined by a plurality of vent holes formed through the body. The venting region terminates at a radius originating from a centerline of the body that is at least 4.0 millimeter less than a radius defining an inner wall of the rim.
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公开(公告)号：US12119173B2
公开(公告)日：2024-10-15
申请号：US17607599
申请日：2019-04-29
发明人： Henning Aust , Timo Adler , Clemens Pihan
IPC分类号： H01F7/02 , C23C14/50 , C23C14/56 , C23C16/458 , C23C16/54 , H01L21/677
CPC分类号： H01F7/0236 , C23C14/50 , C23C14/568 , C23C16/4587 , C23C16/54 , H01L21/67709 , H01L21/6776
摘要： A magnetic levitation system for transporting a carrier is described. The magnetic levitation system includes a base defining a transportation track, a carrier movable relative to the base along the transportation track, and a plurality of active magnetic bearings provided at the base and configured to face a guided structure of the carrier. The guided structure includes a first guided zone and a second guided zone configured to interact with the plurality of active magnetic bearings and a recessed zone. The recessed zone is arranged between the first guided zone and the second guided zone in a transport direction of the carrier and is recessed with respect to the first guided zone and the second guided zone.
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公开(公告)号：US12110590B2
公开(公告)日：2024-10-08
申请号：US18381534
申请日：2023-10-18
发明人： Shailendra Srivastava , Sai Susmita Addepalli , Nikhil Sudhindrarao Jorapur , Daemian Raj Benjamin Raj , Amit Kumar Bansal , Juan Carlos Rocha-Alvarez , Gregory Eugene Chichkanoff , Xinhai Han , Masaki Ogata , Kristopher Enslow , Wenjiao Wang
IPC分类号： C23C16/455 , C23C16/458 , C23C16/50 , H01J37/32
CPC分类号： C23C16/45565 , C23C16/45536 , C23C16/4583 , C23C16/50 , H01J37/3244 , H01J37/32458 , H01J2237/3321
摘要： A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to a processing volume of the process chamber. Further, the faceplate may be part of a lid assembly for the process chamber. The lid assembly may include a blocker plate facing the first surface of the faceplate. A distance between the blocker plate and the first surface is constant.
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公开(公告)号：US12110586B2
公开(公告)日：2024-10-08
申请号：US17426472
申请日：2020-01-30
发明人： Adrien Lavoie , Michael Philip Roberts , Chloe Baldasseroni , Richard Phillips , Ramesh Chandrasekharan
IPC分类号： C23C16/455 , C23C16/458
CPC分类号： C23C16/45525 , C23C16/45544 , C23C16/45565 , C23C16/458
摘要： A system to deposit a film on a substrate using atomic layer deposition includes a pedestal arranged in a processing chamber to support the substrate on a top surface of the pedestal when depositing the film on the substrate. A first annular recess in the pedestal extends downwardly from the top surface of the pedestal and radially inwardly from an outer edge of the pedestal towards an outer edge of the substrate. The first annular recess has an inner diameter that is greater than a diameter of the substrate. An annular ring is made of a dielectric material and is arranged around the substrate in the first annular recess. A second annular recess in the pedestal is located under the annular ring. The second annular recess has a height and extends radially inwardly from the outer edge of the pedestal towards the outer edge of the substrate.
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公开(公告)号：US20240331982A1
公开(公告)日：2024-10-03
申请号：US18738213
申请日：2024-06-10
申请人： TOTO LTD.
发明人： Yasutaka NITTA , Takuma WADA , Ryoto TAKIZAWA
IPC分类号： H01J37/32 , C23C16/458 , H01L21/67 , H01L21/683
CPC分类号： H01J37/32477 , C23C16/4583 , H01J37/32715 , H01L21/67011 , H01L21/6831 , H01J2237/2007
摘要： According to one embodiment, a semiconductor manufacturing apparatus member includes a base and a particle-resistant layer. The base includes a first surface, a second surface crossing the first surface, and an edge portion connecting the first surface and the second surface. The particle-resistant layer includes a polycrystalline ceramic and covering the first surface, the second surface, and the edge portion. The particle-resistant layer includes a first particle-resistant layer provided at the edge portion, and a second particle-resistant layer provided at the first surface. A particle resistance of the first particle-resistant layer is higher than a particle resistance of the second particle-resistant layer. A thickness of the first particle-resistant layer is thinner than a thickness of the second particle-resistant layer.
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公开(公告)号：US20240327987A1
公开(公告)日：2024-10-03
申请号：US18699313
申请日：2022-09-22
发明人： Weicong SONG , Wenjun XIE
IPC分类号： C23C16/458 , C23C14/50
CPC分类号： C23C16/4584 , C23C14/505 , C23C16/4586
摘要： A vapor deposition device capable of reciprocating rotation and lifting is disclosed. The vapor deposition device includes a vapor deposition cavity, a base station, a base shaft, a telescopic assembly, a passive lifting rotation member, a rotation mechanism, and a lifting mechanism. The rotation mechanism is fixedly connected with the telescopic assembly, and configured to drive the telescopic assembly to perform a reciprocating rotational motion, which in turn drives the base station, the base shaft, and the passive lifting rotation member to perform a reciprocating rotational motion in sequence. The lifting mechanism is rotatably and slidably connected with the passive lifting rotation member, and configured to drive the passive lifting rotation member to move up and down, which in turn drives the base shaft and the base station to move up and down. The telescopic assembly extends when the base station ascends and shortens when the base station descends.
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9.发明公开公开(公告)号：US20240327979A1
公开(公告)日：2024-10-03
申请号：US18573621
申请日：2021-07-28
发明人： Wolfgang BRAUN
IPC分类号： C23C16/448 , C23C16/458 , C23C16/48
CPC分类号： C23C16/4485 , C23C16/4583 , C23C16/48
摘要： The present invention is related to a method of coating a coating region (58) on a front surface (56) of a substrate (50) with a source material (40) thermally evaporated and/or sublimated from a source (30) by electromagnetic radiation (80). Further, the present invention is related to an apparatus (100) for a thermal evaporation system (200) for coating a coating region (58) on a front surface (56) of a substrate (50) with a source material (40) thermally evaporated and/or sublimated by electromagnetic radiation (80) from a source (30).
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公开(公告)号：US20240318314A1
公开(公告)日：2024-09-26
申请号：US18609067
申请日：2024-03-19
发明人： Yonjoo KANG , Yunjae Lee , Junhyung Kim , Youngbok Lee , Sangchul Han , Minsung Kim , Inhwan Park , Sangyeon Oh
IPC分类号： C23C16/458 , C23C16/46
CPC分类号： C23C16/4586 , C23C16/46
摘要： A substrate support device includes a chuck plate, a shaft connected to a center lower end of the chuck plate, a heater unit provided inside the chuck plate, an electrode unit provided inside the chuck plate, and provided on the heater unit, a jumper unit provided inside the chuck plate, arranged between the electrode unit and the heater unit, and electrically connected to the electrode unit to supply power to the electrode unit, and a power control unit, wherein the electrode unit includes a center electrode and a first electrode arranged in a ring shape around the center electrode, wherein the jumper unit includes a first jumper connected to the first electrode and a center jumper connected to the center electrode, and wherein the first jumper includes a first connection jumper, and a first inclined jumper electrically connecting the first jumper.
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