公开(公告)号：US20240363378A1

公开(公告)日：2024-10-31

申请号：US18140365

申请日：2023-04-27

Applicant: Applied Materials, Inc.

Inventor： Thomas ACKERMANN ,  Laura ESPOSITO ,  Emir SABANOVIC

IPC: H01L21/673 ,  C23C16/458 ,  C30B25/10 ,  C30B25/12

CPC classification number: H01L21/67306 ,  C23C16/4583 ,  C30B25/105 ,  C30B25/12

Abstract: Disclosed herein are a shaft for supporting a susceptor within an epitaxial growth apparatus, and an epitaxial growth apparatus having the same. In one example, the shaft for supporting a susceptor within an epitaxial growth apparatus includes a support column, a post, and a plurality of arms. The post is coupled with a support column. The post includes an infrared transmission reducing portion disposed proximately to the susceptor and having a lower transmissivity of infrared radiation than the support column. The plurality of arms extend radially from the support column and are configured to support the susceptor.