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    ELECTROSTATIC CHUCK AND WAFER PROCESSING APPARATUS
    1.
    发明申请
    ELECTROSTATIC CHUCK AND WAFER PROCESSING APPARATUS 审中-公开

    公开(公告)号：US20180040499A1

    公开(公告)日：2018-02-08

    申请号：US15788132

    申请日：2017-10-19

    申请人： TOTO LTD.

    发明人： Kazuki ANADA ,  Yuichi YOSHII ,  Takuma WADA

    IPC分类号： H01L21/683

    CPC分类号： H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68735

    摘要： According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate including a sealing ring provided at a peripheral edge portion of the ceramic dielectric substrate, and an electrode layer including a plurality of electrode components. An outer perimeter of the ceramic dielectric substrate is provided to cause a spacing between the outer perimeter of the ceramic dielectric substrate and an outer perimeter of the electrode layer to be uniform. The spacing between the outer perimeter of the electrode layer and the outer perimeter of the ceramic dielectric substrate is narrower than a spacing of the electrode components. A width of the sealing ring is not less than 0.3 millimeters and not more than 3 millimeters. A width where the electrode layer overlaps the sealing ring is not less than −0.7 millimeters and not more than 2 millimeters.

    METHOD OF MAKING A SEMICONDUCTOR MANUFACTURING APPARATUS MEMBER
    3.
    发明申请
    METHOD OF MAKING A SEMICONDUCTOR MANUFACTURING APPARATUS MEMBER 有权

    公开(公告)号：US20220139676A1

    公开(公告)日：2022-05-05

    申请号：US17533579

    申请日：2021-11-23

    申请人： TOTO LTD.

    发明人： Yasutaka NITTA ,  Takuma WADA

    IPC分类号： H01J37/32 ,  H01L21/67

    摘要： A method of making a semiconductor manufacturing apparatus member includes a step of preparing an aluminum base having an alumite layer having a porous columnar structure at an upper surface thereof. The alumite layer is an anodic oxidation film, and a Young's modulus of the alumite layer is between 90 GPa and 120 GPa. The method also includes a step of forming a particle-resistant layer on the alumite layer by aerosol deposition, in which an aerosol containing fine particles of a brittle material dispersed in a gas is ejected from a nozzle to impact against a surface of the alumite layer, wherein the particle-resistant layer includes a polycrystalline ceramic; and wherein, when the resulting semiconductor manufacturing apparatus member is exposed to a plasma in a reference plasma resistance test, the particle-resistant layer has an arithmetic average height Sa of 0.060 or less after the reference plasma test is completed.

    ELECTROSTATIC CHUCK
    4.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号：US20140071582A1

    公开(公告)日：2014-03-13

    申请号：US14021205

    申请日：2013-09-09

    申请人： TOTO LTD.

    发明人： Kazuki ANADA ,  Takuma WADA

    IPC分类号： H02N13/00

    CPC分类号： H02N13/00 ,  H01L21/6833

    摘要： To provide an electrostatic chuck, including: a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface on a side opposite the first major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body; and an electrode layer interposed between the first major surface and the second major surface of the ceramic dielectric substrate, the electrode layer being integrally sintered with the ceramic dielectric substrate, a temperature control plate provided on the second major surface side; and a heater provided between the electrode layer and the temperature control plate, and the first dielectric layer and the second dielectric layer of the ceramic dielectric substrate having an infrared spectral transmittance in terms of a thickness of 1 mm of not less than 20%.

    摘要翻译： 为了提供一种静电卡盘，其特征在于，包括：陶瓷电介质基板，其具有安装有被加工物的第一主面和与所述第一主面相反的一侧的第二主面，所述陶瓷电介质基板为多晶陶瓷烧结体 身体; 以及插入在所述陶瓷电介质基板的所述第一主表面和所述第二主表面之间的电极层，所述电极层与所述陶瓷电介质基板一体烧结，设置在所述第二主表面侧的温度控制板; 以及设置在电极层和温度控制板之间的加热器，陶瓷电介质基板的第一介质层和第二电介质层的厚度为1mm以上，红外光谱透射率为20％以上。

    ELECTROSTATIC CHUCK
    5.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号：US20140063681A1

    公开(公告)日：2014-03-06

    申请号：US14012003

    申请日：2013-08-28

    申请人： TOTO LTD.

    发明人： Kazuki ANADA ,  Takuma WADA

    IPC分类号： H01L21/683

    CPC分类号： H01L21/6833 ,  H01L21/68757

    摘要： To provide an electrostatic chuck, including: a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface on a side opposite the first major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body; and an electrode layer interposed between the first major surface and the second major surface of the ceramic dielectric substrate, the electrode layer being integrally sintered with the ceramic dielectric substrate, the ceramic dielectric substrate including a first dielectric layer between the electrode layer and the first major surface, and a second dielectric layer between the electrode layer and the second major surface, and at least the first dielectric layer of the ceramic dielectric substrate having an infrared spectral transmittance in terms of a thickness of 1 millimeter (mm) of not less than 20%.

    摘要翻译： 为了提供一种静电卡盘，其特征在于，包括：陶瓷电介质基板，其具有安装有被加工物的第一主面和与所述第一主面相反的一侧的第二主面，所述陶瓷电介质基板为多晶陶瓷烧结体 身体; 以及插入在所述陶瓷电介质基板的所述第一主表面和所述第二主表面之间的电极层，所述电极层与所述陶瓷电介质基板一体烧结，所述陶瓷电介质基板包括在所述电极层与所述第一主体之间的第一电介质层 表面和第二电介质层之间，并且至少陶瓷电介质基板的第一电介质层的厚度为1毫米（mm）的红外光谱透射率不小于20 ％。

    SEMICONDUCTOR MANUFACTURING APPARATUS
    6.
    发明公开
    SEMICONDUCTOR MANUFACTURING APPARATUS 审中-公开

    公开(公告)号：US20240331982A1

    公开(公告)日：2024-10-03

    申请号：US18738213

    申请日：2024-06-10

    申请人： TOTO LTD.

    发明人： Yasutaka NITTA ,  Takuma WADA ,  Ryoto TAKIZAWA

    IPC分类号： H01J37/32 ,  C23C16/458 ,  H01L21/67 ,  H01L21/683

    CPC分类号： H01J37/32477 ,  C23C16/4583 ,  H01J37/32715 ,  H01L21/67011 ,  H01L21/6831 ,  H01J2237/2007

    摘要： According to one embodiment, a semiconductor manufacturing apparatus member includes a base and a particle-resistant layer. The base includes a first surface, a second surface crossing the first surface, and an edge portion connecting the first surface and the second surface. The particle-resistant layer includes a polycrystalline ceramic and covering the first surface, the second surface, and the edge portion. The particle-resistant layer includes a first particle-resistant layer provided at the edge portion, and a second particle-resistant layer provided at the first surface. A particle resistance of the first particle-resistant layer is higher than a particle resistance of the second particle-resistant layer. A thickness of the first particle-resistant layer is thinner than a thickness of the second particle-resistant layer.

    ELECTROSTATIC CHUCK
    10.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号：US20140063682A1

    公开(公告)日：2014-03-06

    申请号：US14012058

    申请日：2013-08-28

    申请人： TOTO Ltd.

    发明人： Kazuki ANADA ,  Takuma WADA

    IPC分类号： H01L21/683

    CPC分类号： H01L21/6833 ,  H01L21/68757

    摘要： To provide an electrostatic chuck, including: a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface on a side opposite the first major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body; and an electrode layer interposed between the first major surface and the second major surface of the ceramic dielectric substrate, the electrode layer being integrally sintered with the ceramic dielectric substrate, and the electrode layer includes a first portion having conductivity, and a second portion that bonds the first dielectric layer and the second dielectric layer, and the mean grain size of crystals included in the second portion is smaller than the mean grain size of crystals included in the ceramic dielectric substrate.

    摘要翻译： 为了提供一种静电卡盘，其特征在于，包括：陶瓷电介质基板，其具有安装有被加工物的第一主面和与所述第一主面相反的一侧的第二主面，所述陶瓷电介质基板为多晶陶瓷烧结体 身体; 以及插入在所述陶瓷电介质基板的所述第一主表面和所述第二主表面之间的电极层，所述电极层与所述陶瓷电介质基板一体烧结，所述电极层包括具有导电性的第一部分， 第一介电层和第二介电层以及包含在第二部分中的晶体的平均晶粒尺寸小于包括在陶瓷电介质基板中的晶体的平均晶粒尺寸。