公开(公告)号：US20230205085A1

公开(公告)日：2023-06-29

申请号：US18173765

申请日：2023-02-23

Applicant: DONGJIN SEMICHEM CO., LTD.

Inventor： Hyoc Min YOUN ,  Tai Hoon YEO ,  Dong Myung KIM ,  Ah Rum PARK ,  Gun Seok JANG ,  Seok Hyun LEE ,  Nu Ri OH ,  In Ho SONG ,  Sun Hee LEE

IPC: G03F7/039 ,  G03F7/085 ,  C08G73/10

CPC classification number: G03F7/0392 ,  G03F7/085 ,  C08G73/10

Abstract: A positive photosensitive resin composition and, more specifically, a positive photosensitive resin composition includes an alkali-soluble polymer resin comprising a polyimide precursor comprising a specific chemical structure; a quinone diazide compound; and a solvent. The positive photosensitive resin composition is a suitable matter for next-generation flexible displays and semiconductor packages.

公开(公告)号：US20160291467A1

公开(公告)日：2016-10-06

申请号：US15085443

申请日：2016-03-30

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Masako SUGIHARA ,  Takashi NISHIMURA

IPC: G03F7/039 ,  G03F7/32 ,  G03F7/20 ,  C08F216/10 ,  G03F7/16

CPC classification number: C08F216/10 ,  C08F212/02 ,  C08F216/12 ,  C08F216/14 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0751 ,  G03F7/085

Abstract: A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Ri41 represents a hydrogen atom or a methyl group, Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom, Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, “p” represents an integer of 0 to 4, Z represents a divalent C3 to C20 hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—[(CH2)w—O]r— (Ia): wherein “w” and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.

Abstract translation: 式中，R 41表示氢原子或甲基，R 12表示可以被羟基，C 2〜C 7酰基或氢原子取代的C 1〜C 10烃基，R a 43各自独立地表示碳原子数1〜6的烷基 基团或C1〜C6烷氧基，“p”表示0〜4的整数，Z表示具有式（Ia）表示的基团的二价C 3〜C 20烃基，烃基中所含的亚甲基可以 由氧原子，硫原子或羰基取代，* - [（CH2）w-O] r-（Ia）：其中“w”和“r”各自独立地表示1〜10的整数，* 表示粘合位置。

公开(公告)号：US20160026080A1

公开(公告)日：2016-01-28

申请号：US14654313

申请日：2012-12-19

Applicant: IBF INDÚSTRIA BRASILEIRA DE FILMES S/A

Inventor： Andre Luiz ARIAS ,  Luiz Nei ARIAS ,  Marjorie ARIAS ,  Mario Italo PROVENZANO

IPC: G03F7/033 ,  B41N1/04 ,  G03F7/38 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/033 ,  B41N1/04 ,  G03C1/73 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/085 ,  G03F7/092 ,  G03F7/105 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/32 ,  G03F7/38

Abstract: Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process.

Abstract translation: 提供了一种对于印刷目的在电磁光谱范围内对辐射敏感的组合物，并且包括（a）一种或多种粘合剂聚合物; （b）烯属不饱和化合物; （c）一种或多种吸收所选光谱区域中的辐射的化合物; （d）敏化剂; （e）任选的光致凝缩器; （f）粘合促进剂; （g）染料; 和（h）任选的热聚合抑制剂。 还提供了包括辐射敏感组合物的印版，以及组合物的使用和图像显影方法。

公开(公告)号：US20150064626A1

公开(公告)日：2015-03-05

申请号：US14330272

申请日：2014-07-14

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Jun Hatakeyama ,  Koji Hasegawa

IPC: G03F7/039 ,  G03F7/20 ,  C08F220/18 ,  G03F7/38

CPC classification number: G03F7/039 ,  C08F220/18 ,  C08F220/22 ,  C08F220/30 ,  C08F220/62 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/085 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/38 ,  C08F2220/301 ,  C08F2220/382 ,  C08F2220/185

Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

Abstract translation: 提供了一种正性抗蚀剂组合物，其包含聚合物，其包含具有被酸不稳定基团取代的羧基和/或酚羟基的重复单元和叔丁基或叔戊基取代的羟基苯基甲基丙烯酸酯的重复单元，并且具有重均分子量 1,000-500,000。 抗蚀剂组合物具有抑制酸扩散和高分辨率的令人满意的效果，并且在曝光后形成良好轮廓和最小边缘粗糙度的图案。

公开(公告)号：US08778592B2

公开(公告)日：2014-07-15

申请号：US13404824

申请日：2012-02-24

Applicant: Jun Hatakeyama ,  Takeshi Nagata ,  Taku Morisawa

Inventor： Jun Hatakeyama ,  Takeshi Nagata ,  Taku Morisawa

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/26

CPC classification number: G03F7/0392 ,  G03F7/0397 ,  G03F7/085 ,  H01L21/265

Abstract: A positive resist composition based on a polymer comprising recurring units of (meth)acrylate having a cyclic acid labile group and a dihydroxynaphthalene novolak resin, and containing a photoacid generator is improved in resolution, step coverage and adhesion on a highly reflective stepped substrate, has high resolution, and forms a pattern of good profile and minimal edge roughness through exposure and development.

Abstract translation: 具有包含具有环酸不稳定基团的（甲基）丙烯酸酯和二羟基萘酚醛清漆树脂的重复单元并含有光酸产生剂的聚合物的正性抗蚀剂组合物在高反射性阶梯基材上的分辨率，台阶覆盖率和粘附性得到改善，具有 高分辨率，并且通过曝光和显影形成良好轮廓和最小边缘粗糙度的图案。

公开(公告)号：US08652756B2

公开(公告)日：2014-02-18

申请号：US13586602

申请日：2012-08-15

Applicant: Jun Hatakeyama ,  Daisuke Kori

Inventor： Jun Hatakeyama ,  Daisuke Kori

IPC: G03C1/00 ,  G03F1/00

CPC classification number: G03F1/00 ,  G03F7/0397 ,  G03F7/085 ,  G03F7/105

Abstract: A positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process.

Abstract translation: 一种正型抗蚀剂组合物，其包含作为其中所含的基础树脂的（A）重均分子量为1000〜500000的聚合物，其含有具有被酸取代的羧基的氢原子的结构的重复单元 具有环状结构的脂肪族基团和（B）取代或未取代的荧光素的酚醛清漆树脂，以及光酸产生剂。 可以提供具有适当吸收的正性抗蚀剂组合物，以在曝光后具有优异的图案轮廓的高反射性基板上形成图案，在非平面基板上粘附，注入特性，此外，此时的离子注入电阻 的离子注入; 并提供图案化工艺。

公开(公告)号：US08574816B2

公开(公告)日：2013-11-05

申请号：US13584463

申请日：2012-08-13

Applicant: Jun Hatakeyama ,  Daisuke Kori

Inventor： Jun Hatakeyama ,  Daisuke Kori

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/0397 ,  G03F7/085

Abstract: The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process.

Abstract translation: 本发明提供一种正型抗蚀剂组合物，其包含作为其中所含的基础树脂的（A）重均分子量为1000〜500000的聚合物，其含有具有取代基的羧基的氢原子的结构的重复单元 具有环状结构的酸不稳定基团和（B）取代或未取代的萘并噻吩的酚醛清漆树脂，另外还有光酸产生剂。 可以提供具有适当吸收的正性抗蚀剂组合物，以在高反射性基板上形成图案，在非平面基板上粘附和注入的优异特性，曝光后的良好图案轮廓，以及在 离子注入时间; 和图案化过程。

公开(公告)号：US20130280654A1

公开(公告)日：2013-10-24

申请号：US13922199

申请日：2013-06-19

Applicant: SUMITOMO BAKELITE CO., LTD.

Inventor： Hiromichi SUGIYAMA ,  Yasunori TAKAHASHI

IPC: G03F7/085

CPC classification number: G03F7/085 ,  C08G77/60 ,  C08L77/06 ,  C08L83/16 ,  C08L2203/20 ,  C09D177/06 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/0755 ,  G03F7/40 ,  C08L83/00

Abstract: A positive-type photosensitive resin composition includes (A) an alkali-soluble resin, (B) a photosensitizer, and (C) a silicon compound shown by the following general formula (1). R1 represents an alkylene group having 6 to 8 carbon atoms, and R2 represents an alkyl group having 1 to 10 carbon atoms. The positive-type photosensitive resin composition exhibits excellent storage stability, produces a film that exhibits excellent adhesion to a substrate during development, and produces a cured film that exhibits excellent adhesion to a substrate after humidification. (R2O)3—Si—R1—Si—(OR2)3  (1)

Abstract translation: 正型感光性树脂组合物包含（A）碱溶性树脂，（B）光敏剂，（C）由以下通式（1）表示的硅化合物。 R1表示碳原子数为6〜8的亚烷基，R2表示碳原子数1〜10的烷基。 正型感光性树脂组合物显示优异的保存稳定性，产生在显影期间表现出优异的与基材的粘附性的膜，并且产生在加湿后对基材表现出优异的粘附性的固化膜。 （R2O）3-Si-R1-Si-（OR2）3（1）

公开(公告)号：US20120115086A1

公开(公告)日：2012-05-10

申请号：US13382397

申请日：2010-07-07

Applicant: Atsushi Yasuda ,  Tomoya Oshikiri ,  Daisuke Matsumoto ,  Keisuke Katou ,  Shinichi Maeda

Inventor： Atsushi Yasuda ,  Tomoya Oshikiri ,  Daisuke Matsumoto ,  Keisuke Katou ,  Shinichi Maeda

IPC: G03F7/20 ,  G03F7/004 ,  C08F224/00

CPC classification number: C08F24/00 ,  C08F2/00 ,  C08F297/026 ,  C08F2500/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/085

Abstract: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

Abstract translation: 提供聚合物的制造方法。 聚合物改善共聚物的结构单元的含量比和分子量的变化，溶剂的溶解度以及使用这种聚合物的抗蚀剂组合物的灵敏度。 该方法包括聚合两种或更多种单体，同时加入聚合引发剂以获得聚合物，在初始聚合阶段中加入含有第一组合物单体的第一溶液，并在第二组合物单体或与其同时开始滴加含有第二组合物单体的第二溶液 喂养第一种方案。 第二组合物等于所得聚合物的目标组成比。 基于目标组成比和单体的反应性，预先计算第一组合物。 上述滴加速度设定为高。

公开(公告)号：US08163852B2

公开(公告)日：2012-04-24

申请号：US12319492

申请日：2009-01-08

Applicant: Takanori Yamagishi ,  Tomo Oikawa ,  Ichiro Kato ,  Kazuhiko Mizuno ,  Satoshi Yamaguchi

Inventor： Takanori Yamagishi ,  Tomo Oikawa ,  Ichiro Kato ,  Kazuhiko Mizuno ,  Satoshi Yamaguchi

IPC: C08F2/00

CPC classification number: G03F7/085 ,  G03F7/0397

Abstract: Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined, by gel permeation chromatography (GPC).

Abstract translation: 解决现有技术中的问题，提供了一种抗批聚物，反应堆对反应器和尺度尺度变化小的抗蚀剂聚合物，不含高聚物，溶解性和储存稳定性优异， 适用于精细图案形成及其制造方法。 本发明提供的抗蚀剂聚合物至少具有由酸分解成可溶于碱性显影剂的结构的重复单元和具有极性基团的重复单元以增强与基材的粘附性，其特征在于峰面积 的分子量为100,000以上的高分子量成分（高分子量）为0.1％以下，通过凝胶渗透色谱法（GPC）测定的分子量分布中的全部峰面积。