公开(公告)号：US20130280654A1

公开(公告)日：2013-10-24

申请号：US13922199

申请日：2013-06-19

Applicant: SUMITOMO BAKELITE CO., LTD.

Inventor： Hiromichi SUGIYAMA ,  Yasunori TAKAHASHI

IPC: G03F7/085

CPC classification number: G03F7/085 ,  C08G77/60 ,  C08L77/06 ,  C08L83/16 ,  C08L2203/20 ,  C09D177/06 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/0755 ,  G03F7/40 ,  C08L83/00

Abstract: A positive-type photosensitive resin composition includes (A) an alkali-soluble resin, (B) a photosensitizer, and (C) a silicon compound shown by the following general formula (1). R1 represents an alkylene group having 6 to 8 carbon atoms, and R2 represents an alkyl group having 1 to 10 carbon atoms. The positive-type photosensitive resin composition exhibits excellent storage stability, produces a film that exhibits excellent adhesion to a substrate during development, and produces a cured film that exhibits excellent adhesion to a substrate after humidification. (R2O)3—Si—R1—Si—(OR2)3  (1)

Abstract translation: 正型感光性树脂组合物包含（A）碱溶性树脂，（B）光敏剂，（C）由以下通式（1）表示的硅化合物。 R1表示碳原子数为6〜8的亚烷基，R2表示碳原子数1〜10的烷基。 正型感光性树脂组合物显示优异的保存稳定性，产生在显影期间表现出优异的与基材的粘附性的膜，并且产生在加湿后对基材表现出优异的粘附性的固化膜。 （R2O）3-Si-R1-Si-（OR2）3（1）