公开(公告)号：US08891729B2

公开(公告)日：2014-11-18

申请号：US13564800

申请日：2012-08-02

申请人： Yoshiki Matoba ,  Rintaro Nakatani ,  Tsuneo Sato

发明人： Yoshiki Matoba ,  Rintaro Nakatani ,  Tsuneo Sato

IPC分类号： G01N23/223 ,  G01N23/06

CPC分类号： G01N23/06 ,  G01N23/223 ,  G01N2223/076

摘要： An X-ray analyzer includes a transmission X-ray inspecting portion having a first X-ray source and a transmission X-ray detector for detecting a transmission X-ray that passed through a sample from the first X-ray source, and a fluorescent X-ray inspecting portion having a second X-ray source and a fluorescent X-ray detector for detecting a fluorescent X-ray output from the sample when the sample is irradiated with an X-ray from the second X-ray source. A movement mechanism moves a sample stage that supports the sample. A foreign matter position calculating unit calculates a position of foreign matter in the sample, and a movement mechanism control unit controls the movement mechanism so that the position of the foreign matter calculated by the foreign matter position calculating unit coincides with an optical axis of the second X-ray source.

摘要翻译： X射线分析仪包括具有第一X射线源的透射X射线检查部和用于检测通过来自第一X射线源的样品的透射X射线的透射X射线检测器， X射线检查部分具有第二X射线源和荧光X射线检测器，用于当从第二X射线源照射X射线时检测从样品输出的荧光X射线。 移动机构移动支持样品的样品台。 异物位置计算单元计算样品中的异物的位置，移动机构控制单元控制移动机构，使得由异物位置计算单元计算的异物的位置与第二个 X射线源。

公开(公告)号：US08822945B2

公开(公告)日：2014-09-02

申请号：US13065698

申请日：2011-03-28

申请人： Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

发明人： Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

IPC分类号： G01N23/225 ,  H01J49/42 ,  H01J3/26

CPC分类号： H01J37/08 ,  H01J37/265 ,  H01J2237/006 ,  H01J2237/0807 ,  H01J2237/0827

摘要： A focused ion beam apparatus includes a gas field ion gun unit having an emitter, an ion source gas supply unit for supplying different ion source gases to the emitter, a heater for heating the emitter, and an extraction electrode. A storage section stores, for each gas of a plurality of different types, set values of emitter temperature, gas pressure, extraction voltage to be applied to an extraction electrode, image contrast and image brightness. An input section selects and inputs one of the gas types. A control section reads, from the storage section, the set values of emitter temperature, gas pressure, extraction voltage, image contrast and image brightness, which correspond to the input gas type, and sets a heater, a gas control section, a voltage control section, and an adjustment section for the contrast and brightness of the image.

摘要翻译： 聚焦离子束装置包括具有发射极的气体场离子枪单元，用于向发射极供给不同离子源气体的离子源气体供给单元，用于加热发射极的加热器和提取电极。 对于多种不同类型的每种气体，存储部分存储要施加到提取电极的发射体温度，气体压力，提取电压的设定值，图像对比度和图像亮度。 输入部分选择并输入气体类型之一。 控制部从存储部读取与输入气体类型相对应的发射极温度，气体压力，提取电压，图像对比度和图像亮度的设定值，并且设定加热器，气体控制部，电压控制 部分和用于图像的对比度和亮度的调整部分。

公开(公告)号：US08703247B2

公开(公告)日：2014-04-22

申请号：US12693580

申请日：2010-01-26

申请人： Hidekazu Suzuki ,  Toshiaki Fujii ,  Mike Hassel-Shearer

发明人： Hidekazu Suzuki ,  Toshiaki Fujii ,  Mike Hassel-Shearer

IPC分类号： C23C14/00 ,  C23C14/02 ,  C23C14/04 ,  C23C14/12 ,  C23C14/14 ,  C23C14/20 ,  H05H1/00

CPC分类号： C23C16/047 ,  G01N1/286 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/30494 ,  H01J2237/31732 ,  H01J2237/31745

摘要： A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.

摘要翻译： 使用聚焦离子束装置，用聚焦离子束在其截面处理位置的表面上照射具有有机物的层或结构的样品，对样品进行的截面处理方法包括： 通过在存在源气体的情况下用聚焦离子束照射包括截面处理位置的样品的表面作为保护膜，在层的表面上形成保护膜或有机物的结构的成膜步骤; 以及横截面处理步骤，用于通过在保护膜形成步骤中以高于加速电压的电压照射具有聚焦离子束的由保护膜形成的横截面处理位置进行横截面处理。

公开(公告)号：US08601609B2

公开(公告)日：2013-12-03

申请号：US13409249

申请日：2012-03-01

申请人： Masatoshi Yasutake ,  Masafumi Watanabe

发明人： Masatoshi Yasutake ,  Masafumi Watanabe

IPC分类号： G01Q60/24 ,  G01Q60/22

CPC分类号： G01Q60/24 ,  G01Q60/22 ,  G01Q60/26

摘要： Provided is a friction force microscope that can measure a friction force by a cantilever in a quantitative manner. The friction force microscope includes a friction force calculating mechanism that calculates an effective probe height and a torsional spring constant of the cantilever from bending sensitivity determined from displacement information in a bending direction of the cantilever and torsional sensitivity determined from displacement information in a torsional direction of the cantilever, respectively, so as to use the calculated values for calculating the friction force.

摘要翻译： 提供了可以通过悬臂以定量的方式测量摩擦力的摩擦力显微镜。 摩擦力显微镜包括摩擦力计算机构，该摩擦力计算机构根据从悬臂的弯曲方向的位移信息确定的弯曲灵敏度来计算悬臂的有效探针高度和扭转弹簧常数，并且由扭转方向的位移信息确定的扭转灵敏度 分别使用计算值来计算摩擦力。

公开(公告)号：US08584261B2

公开(公告)日：2013-11-12

申请号：US13545197

申请日：2012-07-10

申请人： Masafumi Watanabe ,  Hiroumi Momota

发明人： Masafumi Watanabe ,  Hiroumi Momota

IPC分类号： G01Q70/16 ,  G01Q70/08 ,  G01Q60/22 ,  G01Q70/10 ,  G01Q60/38

CPC分类号： G01Q60/22 ,  G01Q60/38 ,  G01Q70/10

摘要： In a cantilever which is used in a scanning probe microscope or the like and has a trapezoidal cross-sectional shape formed through anisotropic etching in a silicon process, a cantilever spring constant is determined without measuring a thickness directly. A cantilever thickness is determined based on upper base and lower base lengths of the trapezoidal cross-sectional shape and geometric regularity of a surface generated by the anisotropic etching. Then, the cantilever spring constant is determined based on the cantilever thickness, a cantilever length, and a Young's modulus.

摘要翻译： 在扫描探针显微镜等中使用的具有通过硅工艺中的各向异性蚀刻形成的梯形截面形状的悬臂中，在不直接测量厚度的情况下确定悬臂弹簧常数。 基于梯形截面形状的上基底和下基底长度以及通过各向异性蚀刻产生的表面的几何规则度来确定悬臂厚度。 然后，基于悬臂厚度，悬臂长度和杨氏模量确定悬臂弹簧常数。

公开(公告)号：US20130175446A1

公开(公告)日：2013-07-11

申请号：US13706426

申请日：2012-12-06

申请人： SII NANOTECHNOLOGY INC.

发明人： Ikuko NAKATANI

IPC分类号： H01J37/26

CPC分类号： H01J37/261 ,  G01N1/28 ,  G01N1/286 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/20207 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Provided is a lamella preparation apparatus including an EB column (1), an FIB column (2), a reflected electron detector (5) for detecting charged particles released from a lamella (21), an input unit (10) for setting a first measurement region (41) on an upper side and a second measurement region (42) on a lower side of the lamella (21), and a calculation unit (15) for calculating a slant angle of the lamella (21) from a detected amount of the charged particles generated from the first measurement region (41) and a detected amount of the charged particles generated from the second measurement region (42) by irradiation of the electron beam (8) and a distance between the first measurement region (41) and the second measurement region (42).

摘要翻译： 提供一种薄片制备装置，包括EB柱（1），FIB柱（2），用于检测从薄片（21）释放的带电粒子的反射电子检测器（5），用于设置第一 计算单元（15），用于从所述薄片（21）的下侧的测量区域（41）和所述薄片（21）的下侧的第二测量区域（42） 由第一测量区域（41）产生的带电粒子和通过电子束（8）的照射从第二测量区域（42）产生的带电粒子的检测量和第一测量区域（41）之间的距离， 和第二测量区域（42）。

公开(公告)号：US08304721B2

公开(公告)日：2012-11-06

申请号：US12708896

申请日：2010-02-19

申请人： Kouji Iwasaki ,  Tatsuya Adachi

发明人： Kouji Iwasaki ,  Tatsuya Adachi

IPC分类号： H01L21/302 ,  H01L21/66 ,  H01J37/26 ,  H01J37/30

CPC分类号： G21K5/04 ,  G01N23/2202 ,  G21K5/10 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A micro cross-section processing method includes the steps of determining a linear cross-section estimated position including an observation object on a surface of the sample, irradiating the focused ion beam to the cross-section estimated position perpendicularly to or at a tilt angle to form a cross-section at a position in front of the cross-section estimated position, irradiating the focused ion beam to both ends of the cross-section to form side cuts extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam to a position on the surface of the cross-section and at a position deeper than the observation object to form a bottom cut extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam along from the side cuts to the cross-section estimated position to form wedges connecting to the bottom cut, and applying impact to a region in front of the cross-section estimated position of the sample to cleave the vicinity of the cross-section estimated position between the wedges and form a plane of cleavage.

摘要翻译： 微型横截面处理方法包括以下步骤：确定包括在样品表面上的观察对象的线性横截面估计位置，将聚焦离子束垂直于或以倾斜角照射到横截面估计位置， 在横截面估计位置前面的位置处形成横截面，将聚焦离子束照射到横截面的两端，以形成延伸到横截面估计位置后方的位置的侧切口 所述聚焦离子束到达所述横截面表面上的位置，并且位于比所述观察对象更深的位置，以形成延伸到所述横截面估计位置的后方的位置的底切口，从而沿着所述聚焦离子束照射 侧面切割到横截面估计位置以形成连接到底切口的楔形，并且对样品的横截面估计位置前面的区域施加冲击 以切割楔块之间的横截面估计位置附近并形成切割平面。

公开(公告)号：US08274049B2

公开(公告)日：2012-09-25

申请号：US13065238

申请日：2011-03-17

申请人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

发明人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

IPC分类号： H01L21/66

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/226 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

摘要翻译： 提供了一种样品处理和观察方法，包括将聚焦离子束照射到样品上以形成观察表面，向观察表面照射电子束以形成观察图像，除去与样品的观察表面相反的表面， 形成包括观察表面的薄片并获得薄片的透射观察图像。

公开(公告)号：US08257887B2

公开(公告)日：2012-09-04

申请号：US12733090

申请日：2008-08-06

申请人： Osamu Takaoka

发明人： Osamu Takaoka

IPC分类号： G03F1/72 ,  G03F1/74

CPC分类号： G03F1/74 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/31744

摘要： A photomask defect correction method for correcting a defect of a photomask. A defect in a portion of a photomask to be corrected is observed and information of the observed defect for performing correction of the defect is acquired. The observed defect is corrected in accordance with the acquired defect information by irradiating the observed defect with a focused ion beam from an ion beam irradiation system having a gas field ion source that generates rare gas ions for forming the focused ion beam.

摘要翻译： 一种用于校正光掩模缺陷的光掩模缺陷校正方法。 观察要校正的光掩模的一部分中的缺陷，并且获取用于执行缺陷校正的观察到的缺陷的信息。 通过用具有产生稀有气体离子的气体离子源的离子束照射系统的聚焦离子束照射观察到的缺陷，观察到的缺陷根据获取的缺陷信息进行校正，以形成聚焦离子束。

公开(公告)号：US07945965B2

公开(公告)日：2011-05-17

申请号：US12416634

申请日：2009-04-01

申请人： Naoya Watanabe ,  Masatsugu Shigeno ,  Masato Iyoki

发明人： Naoya Watanabe ,  Masatsugu Shigeno ,  Masato Iyoki

IPC分类号： H01J37/252

CPC分类号： G01Q20/04 ,  G01Q30/14

摘要： The sensor has the self-detecting probe including a body portion, an elongated belt-like flexible substrate, connecting members, a resinous portion, and external contacts formed at the ends of the flexible substrate brought out of liquid. The probe further includes a cantilever whose base end is supported to the body portion, a strain resistive element whose resistance value varies according to the amount of displacement of the cantilever, and interconnects electrically connected with the strain resistive element. A probe tip is formed at the front end of the cantilever. The flexible substrate has an interconnect pattern sandwiched between two insulating sheets. The flexible substrate supports the body portion while the cantilever protrudes outwardly. At least one end of the flexible substrate is brought out of liquid. The connecting members connect the interconnects with the interconnect pattern. The interconnects, connecting members, and the portions of the connecting members electrically connected with the interconnect pattern are coated with the resinous portion.

摘要翻译： 传感器具有包括主体部分，细长带状柔性基板，连接部件，树脂部分和形成在柔性基板的端部的外部触点的自检探测器。 探头还包括一个悬臂，其基端支撑在主体部分，一个应变阻力元件，其电阻值根据悬臂的位移量而变化，并且与应变电阻元件电连接。 探针尖端形成在悬臂的前端。 柔性基板具有夹在两个绝缘片之间的互连图案。 柔性基板支撑主体部分，而悬臂向外突出。 将柔性基板的至少一端从液体中取出。 连接构件将互连件与互连图案连接。 互连件，连接件以及与互连图形电连接的连接件的部分涂覆有树脂部分。